US6522056B1ExpiredUtility

Method and apparatus for simultaneously depositing and observing materials on a target

Assignee: COINCIDENT BEAMS LICENSING CORPriority: Jul 2, 1999Filed: Jun 30, 2000Granted: Feb 18, 2003

Est. expiryJul 2, 2019(expired)· nominal 20-yr term from priority

Inventors:Michael Mauck

Y10S977/869G01N 23/04H01J 37/3007G21K 1/093H01J 37/3005Y10S977/89Y10S977/887Y10S977/881H01J 37/147

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137

Claims

Abstract

A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.

Claims

exact text as granted — not AI-modified

What is claimed is:

1. A method for joining at least two beams of charged particles, comprising:
(a) directing a first beam along a first axis into a field;
(b) directing a second beam along a second axis into said field; and
(c) turning said first and second beams, by interaction between said field and said first and second beams, into a third beam directed along a third axis.

2. The method of claim 1 wherein said field is a magnetic field having a geometric center thereto.

3. The method of claim 2 wherein said first beam is focused upon said geometric center.

4. The method of claim 3 wherein said second beam is focused upon said geometric center.

5. The method of claim 4 wherein said third beam is at least one of colinear and coaxial.

6. The method of claim 1 wherein said field is cylindrical magnetic field.

7. The method of claim 1 for joining at least two beams of charged particles, wherein said field is a magnetic field having a substantially symmetrical cylindrical form having a geometric center thereto upon which said beams are focused.

8. The method of claim 7 further comprising:
(a) said first beam including positively ionized particles;
(b) said second beam including negatively ionized particles;
(c) depositing said positively ionized particles from said first beam on a target;
(d) reflecting said negatively ionized particles from said second beam from said target to said magnetic field; and
(e) monitoring said negatively ionized particles reflected from said target.

9. The method of claim 8 wherein said monitoring includes monitoring the deposition of said ionized particles.

10. The method of claim 1 wherein said field is an electric field.

11. The method of claim 1 wherein said field is an electromagnetic field.

12. The method of claim 1 wherein said field is a magnetic field.

13. The method of claim 10 wherein at least one of said first beam and said second beam is focused at said electric field.

14. The method of claim 11 wherein at least one of said first beam and said second beam is focused at said electromagnetic field.

15. A method for separating at least two beams of charged particles, comprising:
(a) directing a first beam along a first axis into a field where said first beam includes mixed charged particles;
(b) focusing said first beam at said field;
(c) separating said mixed charged particles into at least a second beam and a third beam, by interaction between said field and said first beam.

16. The method of claim 15 wherein said field is a magnetic field having a geometric center thereto.

17. The method of claim 16 wherein said first beam is focused upon said geometric center.

18. The method of claim 17 , wherein said first beam has coaxial mixed charged particles.

19. The method of claim 17 , wherein said first beam has co-linear mixed charged particles.

20. The method of claim 10 wherein said mixed charged particles include at least one of:
(a) different charge-to-mass ratios;
(b) different charges; and
(c) different energies.

21. The method of claim 15 , wherein said field is cylindrical magnetic field.

22. The method of claim 15 , wherein said field is a magnetic field having a substantially symmetrical cylindrical form having a geometric center thereto upon which said beams are focused.

23. The method of claim 22 further comprising:
(a) said first beam includes mixed charged particles including different charge-to-mass ratios;
(b) at least one of said mixed charged particles being positive ionized particles and being deposited on a target;
(c) at least one of said mixed charged particles being electrons and being reflected from said target; and
(d) monitoring said electrons reflected from said target.

24. The method of claim 15 , wherein said field is an electric field.

25. The method of claim 15 , wherein said field is an electromagnetic field.

26. The method of claim 15 wherein said field is a magnetic field.

27. The method of claim 24 , wherein said first beam is focused at said electric field.

28. The method of claim 25 wherein said first beam is focused at said electromagnetic field.

29. A method for turning at least two beams of charged particles, comprising:
(a) directing a first beam along a first axis into a field where said first beam exits said field along a second axis; and
(b) directing a second beam along a third axis into said field where said second beam exists said field along a fourth axis, said third axis is at least one of colinear and coaxial with said second axis and said second beam along said third axis has a different direction of travel than said first beam along said second axis.

30. The method of claim 29 , wherein said field is a magnetic field having a geometric center thereto.

31. The method of claim 30 wherein said first beam is focused upon said geometric center.

32. The method of claim 31 wherein said second beam is focused upon said geometric center.

33. The method of claim 32 , wherein said first and fourth axises are not coaxial.

34. The method of claim 32 , wherein said first and fourth axises are not colinear.

35. The method of claim 29 , wherein said second and third axises are coaxial.

36. The method of claim 29 , wherein said second and third axises are colinear.

37. The method of claim 29 , wherein said field is cylindrical magnetic field.

38. The method of claim 29 , wherein said field is a magnetic field having a substantially symmetrical cylindrical form having a geometric center thereto upon which said beams are focused.

39. The method of claim 29 , wherein said field is an electric field.

40. The method of claim 29 , wherein said field is an electromagnetic field.

41. The method of claim 29 wherein said field is a magnetic field.

42. The method of claim 39 , wherein said first beam is focused at said electric field.

43. The method of claim 40 , wherein said first beam is focused at said electric field.

44. An apparatus that joins at least two beams of charged particles, comprising:
(a) a field;
(b) a first beam directed along a first-axis into said field;
(c) a second beam directed along a second axis into said field; and
(d) whereby said first and second beams are combined, by interaction between said field and said first and second beams, into a third beam directed along a third axis.

45. The apparatus of claim 44 , wherein said field is a magnetic field having a geometric center thereto.

46. The apparatus of claim 45 , wherein said first beam is focused upon said geometric center.

47. The apparatus of claim 46 wherein said second beam is focused upon said geometric center.

48. The apparatus of claim 47 , wherein said third beam is at least one of colinear and coaxial.

49. The apparatus of claim 48 , wherein said magnetic field is cylindrical.

50. The apparatus of claim 44 wherein said field is a magnetic field having a substantially symmetrical cylindrical form having a geometric center thereto upon which said beams are focused.

51. The apparatus of claim 50 further comprising:
(a) said first beam including positively ionized particles deposited on a target;
(b) said second beam including electrons reflected from said target to said magnetic field; and
(c) a monitoring device to monitor said electrons reflected from said target.

52. The apparatus of claim 51 wherein said monitoring device is monitors the deposition of said ionized particles.

53. The apparatus of claim 44 wherein said first axis and second axis are approximately 127 degrees apart.

54. An apparatus to separate at least two beams of charged particles, comprising:
(a) a field;
(b) a first beam directed along a first axis into and focused at said field where said first beam includes mixed charged particles; and
(c) a second beam and a third beam provided, by interaction between said magnetic field and said first beam, from said first beam of mixed charged particles.

55. The apparatus of claim 54 , wherein said field is a magnetic field having a geometric center thereto.

56. The apparatus of claim 55 wherein said first beam is focused upon said geometric center.

57. The apparatus of claim 56 wherein said first beam has coaxial mixed charged particles.

58. The apparatus of claim 56 wherein said first beam has co-linear mixed charged particles.

59. The apparatus of claim 54 wherein said mixed charged particles include at least one of:
(a) different charge-to-mass ratios;
(b) different charges; and
(c) different energies.

60. The apparatus of claim 54 wherein said field is cylindrical magnetic field.

61. The apparatus of claim 54 , wherein said field is a magnetic field having a substantially symmetrical cylindrical form having a geometric center thereto upon which said beams are focused.

62. The apparatus of claim 61 further comprising:
(a) said first beam includes mixed charged particles including different charge-to-mass ratios;
(b) at least one of said mixed charged particles being positive ionized particles and being deposited on a target;
(c) at least one of said mixed charged particles being electrons and being reflected from said target; and
(d) a monitoring device that monitors said electrons reflected from said target.

63. The apparatus of claim 62 , wherein said monitoring device monitors the deposition of said positive ionized particles.

64. An apparatus that turns at least two beams of charged particles, comprising:
(a) a first beam directed along a first axis into a field where said first beam exits said field along a second axis; and
(b) a second beam directed along a third axis into said field where said second beam exists said field along a fourth axis, said third axis is at least one of colinear and coaxial with said second axis and said second beam along said third axis has a different direction of travel than said first beam along said second axis.

65. The apparatus of claim 64 , wherein said field is a magnetic field having a geometric center thereto.

66. The apparatus of claim 65 wherein said first beam is focused upon said geometric center.

67. The apparatus of claim 66 wherein said second beam is focused upon said geometric center.

68. The apparatus of claim 67 wherein said first and fourth axises are not coaxial.

69. The apparatus of claim 67 wherein said first and fourth axises are not colinear.

70. The apparatus of claim 64 , wherein said second and third axises are coaxial.

71. The apparatus of claim 64 wherein said second and third axises are colinear.

72. The apparatus of claim 64 wherein said field is cylindrical magnetic field.

73. The method of focusing at least two beams comprising:
(a) providing a first beam and a second beam that are coaxial with one another where the charge of said first beam is opposite from the charge of said second beam; and
(b) passing said first beam and said second beam through a lens such that said first beam and said second beam are focused at the same plane.

74. The method of claim 73 further comprising:
(a) directing said first beam along a first axis into a magnetic field; and
(b) directing said second beam along a second axis into said magnetic field where said first axis is different than said second axis.

75. The method of claim 74 further comprising turning said first and second beams, by interaction between said field and said first and second beams, into said coaxial first and second beams.

76. The method of claim 75 , wherein said magnetic field has a substantially symmetrical cylindrical form having a geometric center thereto upon which said first and second beams are focused.

77. The method of claim 75 , wherein said first beam includes particles of a first charge-to-mass ratio and said second beam includes particles of a second charge-to-mass ratio different from said first charge-to-mass ratio.

78. The method of claim 75 wherein said first beam and said second beam are focused simultaneously and coincidentally.

79. The method of claim 73 wherein said magnetic field is an electrostatic field provided by an electrostatic lens.

80. The method of claim 79 , wherein said electrostatic lens incorporates a telecentric stop.

81. The method of claim 73 wherein said focusing includes an electrostatic lens with a three-electrode unipotential lens.

82. The method of claim 81 wherein said unipotential lens has a center electrode having voltage thereon that accelerates positively charged particles and decelerates electrons.

83. The method of claim 82 , wherein said positive particles are accelerated by a voltage which is substantially 140 percent of said center electrode voltage, and said electrons have been accelerated by a voltage which is substantially 50 percent of said center electrode voltage.

84. An apparatus that focuses at least two beams comprising:
(a) a first beam and a second beam that are coaxial with one another where the charge of said first beam is opposite from the charge of said second beam directed toward a lens; and
(b) said lens focusing said first beam and said second beam such that said first beam and said second beam are focused at the same plane.

85. The apparatus of claim 84 further comprising:
(a) said first beam directed along a first axis into a magnetic field; and
(b) said second beam directed along a second axis into said magnetic field where said first axis is different than said second axis.

86. The apparatus of claim 85 further comprising turning said first and second beams, by interaction between said field and said first and second beams, into said coaxial first and second beams.

87. The method of claim 86 wherein said magnetic field has a substantially symmetrical cylindrical form having a geometric center thereto upon which said first and second beams are focused.

88. The apparatus of claim 86 wherein said first beam and said second beam are focused simultaneously and coincidentally.

89. The apparatus of claim 86 wherein said first beam includes particles of a first charge-to-mass ratio and said second beam includes particles of a second charge-to-mass ratio different from said first charge-to-mass ratio.

90. The apparatus of claim 84 , wherein said focusing includes an electrostatic field provided by an electrostatic lens.

91. The method of claim 90 wherein said electrostatic lens incorporates a telecentric stop.

92. The apparatus of claim 84 wherein said focusing includes an electrostatic lens with a three-electrode unipotential lens.

93. The apparatus of claim 92 , wherein said unipotential lens has a center electrode having voltage thereon that accelerates positively charged particles and decelerates electrons.

94. The apparatus of claim 93 , wherein said positive particles are accelerated by a voltage which is substantially 140 percent of said center electrode voltage, and said electrons have been accelerated by a voltage which is substantially 50 percent of said center electrode voltage.

95. A method of reducing aberrations in a beam of charged particles comprising the steps of:
(a) directing said beam along a first axis to a field where said beam leaves said field along a second axis that is not colinear with said first axis;
(b) directing said second axis toward a mirror;
(c) reflecting said beam from said mirror along a third axis; and
(d) directing said beam along said third axis to said field where said beam leaves said field along a fourth axis that is not colinear with said first axis.

96. The method of claim 95 wherein said second axis and said third axis are coaxial.

97. The method of claim 95 wherein said second axis and said third axis are colinear.

98. The method of claim 95 wherein said first axis and said fourth axis are at an obtuse angle with respect to each other.

99. The method of claim 98 wherein said obtuse angle is approximately 127 degrees.

100. The method of claim 95 , wherein said field is a substantially cylindrical symmetric magnetic field.

101. The method of claim 100 wherein said magnetic field has a geometric center thereto.

102. The method of claim 101 wherein said beam is focused at said geometric center.

103. The method of claim 102 wherein said mirror is an electrostatic mirror.

104. The method of claim 102 wherein spherical aberrations introduced by said mirror are reduced.

105. The method of claim 104 wherein chromatic aberrations introduced by said mirror are reduced.

106. The method of claim 102 wherein chromatic aberrations introduced by said mirror are reduced.

107. An apparatus that reduces aberrations in a beam of charged particles comprising:
(a) said beam directed along a first axis to a field where said beam leaves said field along a second axis that is not colinear with said first axis;
(b) said second axis directed toward a mirror;
(c) said beam directed from said mirror along a third axis; and
(d) said beam directed along said third axis to said field where said beam leaves said field along a fourth axis that is not colinear with said first axis.

108. The apparatus of claim 107 wherein said second axis and said third axis are coaxial.

109. The apparatus of claim 107 wherein said second axis and said third axis are colinear.

110. The apparatus of claim 107 wherein said first axis and said fourth axis are at an obtuse angle with respect to each other.

111. The apparatus of claim 110 wherein said obtuse angle is approximately 127 degrees.

112. The apparatus of claim 107 wherein said field is substantially cylindrical symmetric magnetic field.

113. The apparatus of claim 112 wherein said magnetic field has a geometric center thereto.

114. The apparatus of claim 113 wherein said beam is focused at said geometric center.

115. The apparatus of claim 107 wherein said mirror is an electrostatic mirror.

116. The apparatus of claim 107 wherein spherical aberrations introduced by said mirror are reduced.

117. The apparatus of claim 107 wherein chromatic aberrations introduced by said mirror are reduced.

118. The apparatus of claim 117 wherein chromatic aberrations introduced by said mirror are reduced.

119. A method for depositing particles on a target and monitoring said depositing, comprising:
(a) providing a first beam of ions;
(b) providing a second beam of electrons;
(c) combining said first beam and said second beam into a coaxial third beam by interaction between said field and said first and second beams;
(d) depositing said ions of said third beam on said target; and
(e) monitoring said depositing of step (d) with particles emanating from said target.

120. The method of claim 119 further comprising scanning said deposited ions with said electrons of said third beam.

121. The method of claim 119 further comprising reflecting said electrons from said target into said coaxial third beam.

122. The method of claim 121 further comprising said reflected electrons being separated from said coaxial third beam into a fourth beam by interaction with said field.

123. The method of claim 122 wherein said monitoring said depositing is using said electrons of said fourth beam.

124. The method of claim 123 wherein said monitoring includes providing a visual indication of said deposition of said ions.

125. The method of claim 119 wherein said depositing and monitoring are simultaneously performed.

126. The method of claim 119 wherein said field has a substantially symmetrical cylindrical form having a geometric center thereto upon which said first and second beams are focused.

127. The method of claim 126 wherein said first beam is provided by an ion source and focused by a first focusing lens upon said geometric center.

128. The method of claim 127 wherein said second beam is provided by an electron source and focused by a second focusing lens upon said geometric center.

129. An apparatus comprising:
(a) a lens focusing a beam of charged particles along a first axis upon a geometric center of a magnetic field;
(b) a magnetic field turning said beam along a second axis directed toward a mirror;
(c) said mirror arranged to reflect said beam along said second axis upon the geometric center of said magnetic field; and
(d) said magnetic field turning said beam along a third axis directed toward a lens.

130. The apparatus of claim 129 wherein said first axis and third axis are co-linear.

131. The apparatus of claim 130 wherein said first axis and said third axis are co-axial.

132. An apparatus comprising:
(a) a beam of charged particles directed along a first axis toward a first field and focused at said first field;
(b) said first field directing said beam along a second axis toward a lens where said first axis and said second axis are not colinear;
(c) said lens focusing directing said beam along a third axis toward a second field and focused at said second field; and
(d) said second field directing said beam along a fourth axis where said third axis and said fourth axis are not colinear.

133. The apparatus of claim 132 wherein said lens incorporates electrostatic deflection.

134. The apparatus of claim 132 wherein the angular relationship between said first axis and said fourth axis are at substantially a 127 degree relationship with respect to each other.

135. The apparatus of claim 132 wherein the first field is a magnetic field.

136. The apparatus of claim 135 wherein the first field is a magnetic field.

137. The apparatus of claim 136 wherein the angular relationship between said first axis and said fourth axis are at substantially a 127 degree relationship with respect to each other.

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