Method and apparatus for cleaning disc drive components

Abstract

An apparatus adapted to clean an exposed surface of a microstructure device such as a disc or head for a disc drive. The apparatus includes a fixture with a mounting surface adapted to receive the microstructure device. A cleaning fluid covers the exposed surface. A slider bearing coupled to a resilient mount flies over the exposed surface. A cleaning line on the exposed surface adjacent the slider bearing is subject to flow of the cleaning fluid. The flow can be generated by relative motion between the device and the slider bearing or generated by a nozzle.

What is claimed is:  
     
       1. A method of cleaning particles from a boundary layer on an exposed surface of a microstructure device, comprising: 
       A. securing the microstructure device on a fixture with the exposed surface immersed in a cleaning fluid;  
       B. mounting a slider bearing on a resilient mounting over the exposed surface to form a gap between the slider bearing and the exposed surface; and  
       C. providing flow of the cleaning fluid through the gap along a cleaning line on the exposed surface adjacent the slider bearing to generate a turbulence in the boundary layer, dislodging the particles from the boundary layer.  
     
     
       2. The method of  claim 1 , further comprising: 
       D. moving the microstructure device relative to the slider bearing along a motion line that is generally perpendicular to the cleaning line.  
     
     
       3. The method of  claim 1  wherein the exposed surface is a sliding surface of a microstructure device for use in a disc drive. 
     
     
       4. The method of  claim 3  wherein the microstructure device comprises an array of disc drive heads on a substrate. 
     
     
       5. The method of  claim 3  wherein the resilient mounting is movable from a first position over the exposed surface to a second position away from the exposed surface. 
     
     
       6. The method of  claim 1  wherein the flow of the cleaning fluid is generated by relative motion between the slider bearing and the exposed surface. 
     
     
       7. A method of cleaning an exposed surface of a microstructure device, comprising: 
       A. securing the microstructure device on a fixture with the exposed surface immersed in a cleaning fluid;  
       B. mounting a slider bearing on a resilient mounting over the exposed surface;  
       C. providing flow of the cleaning fluid along a cleaning line on the exposed surface adjacent the slider bearing; and  
       D. generating the flow of the cleaning fluid by a pressurized nozzle disposed between the slider bearing and the exposed surface.  
     
     
       8. A method of cleaning an exposed surface of a microstructure device, comprising: 
       A. securing the microstructure device on a fixture with the exposed surface immersed in a cleaning fluid;  
       B. mounting a slider bearing on a resilient mounting over the exposed surface;  
       C. providing flow of the cleaning fluid along a cleaning line on the exposed surface adjacent the slider bearing; and  
       D. wherein the cleaning fluid is a liquid subjected to a static pressure during cleaning sufficient to prevent cavitation.  
     
     
       9. An apparatus adapted to clean particles from a boundary layer on an exposed surface of a microstructure device, comprising: 
       a fixture having a mounting surface adapted to secure the microstructure device;  
       a cleaning fluid covering the exposed surface;  
       a slider bearing disposed over the exposed surface to form a gap between the slider bearing and the exposed surface;  
       a resilient mount coupled to the slider bearing; and  
       a cleaning line on the exposed surface adjacent the slider bearing, the cleaning line being subject to flow of the cleaning fluid to generate turbulence in the boundary layer, dislodging the particles from the boundary layer.  
     
     
       10. The apparatus of  claim 9  wherein the cleaning line moves over the exposed surface along a line generally perpendicular to the cleaning line. 
     
     
       11. The apparatus of  claim 9  wherein the exposed surface is a sliding surface of a microstructure device for use in a disc drive. 
     
     
       12. The apparatus of  claim 9  wherein the microstructure device comprises an array of disc drive heads on a substrate. 
     
     
       13. The apparatus of  claim 9  wherein the resilient mounting is movable from a first position over the exposed surface to a second position away from the exposed surface. 
     
     
       14. The apparatus of  claim 9  wherein the flow of the cleaning fluid is generated by relative motion between the slider bearing and the exposed surface. 
     
     
       15. The apparatus of  claim 9  wherein the cleaning fluid is air. 
     
     
       16. The apparatus of  claim 9  wherein the microstructure device comprises a silicon wafer. 
     
     
       17. The apparatus of  claim 9  wherein the microstructure device comprises a gallium arsenide wafer. 
     
     
       18. An apparatus adapted to clean an exposed surface of a microstructure device, comprising: 
       a fixture having a mounting surface adapted to secure the microstructure device;  
       a cleaning fluid covering the exposed surface;  
       a slider bearing disposed over the exposed surface;  
       a resilient mount coupled to the slider bearing; and  
       a cleaning line on the exposed surface adjacent the slider bearing, the cleaning line being subject to flow of the cleaning fluid; and  
       wherein the flow of the cleaning fluid is generated by a pressurized nozzle disposed between the slider bearing and the exposed surface.  
     
     
       19. An apparatus adapted to clean an exposed surface of a microstructure device, comprising: 
       a fixture having a mounting surface adapted to secure the microstructure device;  
       a cleaning fluid covering the exposed surface;  
       a slider bearing disposed over the exposed surface;  
       a resilient mount coupled to the slider bearing; and  
       a cleaning line on the exposed surface adjacent the slider bearing, the cleaning line being subject to flow of the cleaning fluid; and  
       wherein the cleaning fluid is a liquid subjected to a static pressure during cleaning sufficient to prevent cavitation.  
     
     
       20. An apparatus adapted to clean particles from a boundary layer on an exposed surface of a microstructure device, comprising: 
       an arrangement of a fixture mounting the microstructure device with its exposed surface covered by a cleaning fluid and a slider bearing forming a gap between the microstructure device and the slider bearing;  
       means for generating flow of the cleaning fluid along a cleaning line on the exposed surface adjacent the slider bearing to generate turbulence in the boundary layer, dislodging the particles from the boundary layer.  
     
     
       21. The apparatus of  claim 20  wherein the cleaning line moves over the exposed surface along a line generally perpendicular to the cleaning line. 
     
     
       22. The apparatus of  claim 20  wherein the exposed surface is a sliding surface of a microstructure device for use in a disc drive. 
     
     
       23. The apparatus of  claim 20  wherein the microstructure device comprises an array of disc drive heads on a substrate.