Oscillation mechanism in exposure apparatus

Abstract

An oscillation mechanism includes a measuring device for measuring a position of an object, a movable stage being arranged so as to be positioned with respect to the object, a driving mechanism for moving the stage, a control unit for controlling the driving mechanism on the basis of an output of the measuring device, an oscillation element mounted on the stage, which is arranged to be oscillated with respect to the stage, and an intermediate element having a predetermined mass, which is disposed between the stage and the oscillation element. The intermediate element is (i) connected to the oscillation element through a first spring element having a predetermined spring constant, and (ii) connected to the stage through a second spring element having a predetermined spring constant. The oscillation mechanism also includes an oscillation unit for oscillating the oscillation element by oscillating the intermediate element at a predetermined frequency.

What is claimed is:  
     
       1. An oscillation mechanism, comprising: 
       a measuring device for measuring a position of an object;  
       a movable stage being arranged so as to be positioned with respect to the object;  
       a driving mechanism for moving said stage;  
       a control unit for controlling said driving mechanism on the basis of an output of said measuring device;  
       an oscillation element mounted on said stage and being arranged to be oscillated with respect to said stage;  
       an intermediate element having a predetermined mass and being disposed between said stage and said oscillation element, wherein said intermediate element is (i) connected to said oscillation element through a first spring element having a predetermined spring constant, and (ii) connected to said stage through a second spring element having a predetermined spring constant; and  
       an oscillation unit for oscillating said oscillation element by oscillating said intermediate element at a predetermined frequency.  
     
     
       2. An oscillation mechanism according to  claim 1 , wherein said oscillating unit is operable to change the oscillating frequency continuously. 
     
     
       3. An oscillation mechanism according to claim  1 , wherein the oscillating frequency of said oscillating unit is changed continuously to determine an oscillating frequency with which vibration to be applied to said stage is minimized. 
     
     
       4. An oscillation mechanism according to  claim 1 , wherein said oscillating unit includes a piezoelectric device. 
     
     
       5. An exposure apparatus, comprising: 
       a light source;  
       a measuring device for measuring a beam from said light source;  
       a movable stage being arranged so as to be positioned with respect to the beam;  
       a driving mechanism for moving said stage;  
       a control unit for controlling said driving mechanism on the basis of an output of said measuring device;  
       an oscillation element mounted on said stage and being arranged to be oscillated with respect to said stage, said oscillation element holding an optical element;  
       an intermediate element having a predetermined mass and being disposed between said stage and said oscillation element, wherein said intermediate element is (i) connected to said oscillation element through a first spring element having a predetermined spring constant, and (ii) connected to said stage through a second spring element having a predetermined spring constant; and  
       an oscillating unit for oscillating said oscillation element by oscillating said intermediate element at a predetermined frequency.  
     
     
       6. An apparatus according to  claim 5 , wherein said light source comprises a synchrotron radiation light source. 
     
     
       7. An apparatus according to  claim 5 , wherein said optical element comprises a mirror. 
     
     
       8. An apparatus according to  claim 5 , wherein said oscillating unit is operable to change the oscillating frequency continuously. 
     
     
       9. An apparatus according to  claim 5 , wherein the oscillating frequency of said oscillating unit is changed continuously to determine an oscillating frequency with which vibration to be applied to said stage is minimized. 
     
     
       10. An apparatus according to  claim 5 , wherein said oscillating unit includes a piezoelectric device. 
     
     
       11. A device manufacturing method, comprising the steps of: 
       applying a photosensitive material to a wafer;  
       exposing the wafer by use of an exposure apparatus as recited in  claim 5 ; and  
       developing the exposed wafer.  
     
     
       12. An oscillation mechanism, comprising: 
       a stage;  
       an oscillation element mounted on said stage and being arranged to be oscillated with respect to said stage;  
       an intermediate element having a predetermined mass and being disposed between said oscillation element and said stage, wherein said intermediate element is connected to said oscillation element through a first spring element having a predetermined spring constant and said intermediate element is connected to said stage through a second spring element having a predetermined spring constant; and  
       an oscillating unit for oscillating said oscillation element by oscillating said intermediate element at a predetermined frequency.  
     
     
       13. An exposure apparatus, comprising: 
       a stage;  
       an oscillation element mounted on said stage and being arranged to be oscillated with respect to said stage;  
       an intermediate element having a predetermined mass and being disposed between said oscillation element and said stage, wherein said intermediate element is connected to said oscillation element through a first spring element having a predetermined spring constant and said intermediate element is connected to said stage through a second spring element having a predetermined spring constant; and  
       an oscillation unit for oscillating said oscillation element by oscillating said intermediate element at a predetermined frequency.  
     
     
       14. An exposure apparatus, comprising: 
       a light source;  
       a stage;  
       an oscillation element mounted on said stage and being arranged to be oscillated with respect to said stage, said oscillation element holding an optical element to deflect a light beam from said light source;  
       an intermediate element having a predetermined mass and being disposed between said oscillation element and said stage, wherein said intermediate element is connected to said oscillation element through a first spring element having a predetermined spring constant and said intermediate element is connected to said stage through a second spring element having a predetermined spring constant; and  
       an oscillating unit for oscillating said oscillation element by oscillating said intermediate element at a predetermined frequency.