US6786632B2ExpiredUtilityA1

Calorimeter and manufacturing method thereof

71
Assignee: SEIKO INSTR INCPriority: Jan 14, 2000Filed: Aug 26, 2003Granted: Sep 7, 2004
Est. expiryJan 14, 2020(expired)· nominal 20-yr term from priority
G01K 17/003Y10T29/49002G01J 5/20G01K 17/006
71
PatentIndex Score
14
Cited by
18
References
2
Claims

Abstract

It is an object to obtain a calorimeter characterized by excellent mechanical strength, and a manufacturing method thereof, when a plurality of calorimeters are arranged inside a single substrate. The calorimeter has an absorbent for converting energy of radioactive rays into heat and a resistor for converting heat into an electrical signal using superconductive transition are arranged on a membrane for determining thermal conductivity with the membrane being attached to a substrate, the substrate having a tri-layer structure comprising an etching layer, an etching stop layer and a support substrate, the membrane being arranged separated by the thickness of the etching stop layer and the etching layer.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
       1. A method of manufacturing a calorimeter, comprising the steps of: 
       providing a substrate having a tri-layer structure comprised of an etching layer, an etching stop layer, and a support substrate;  
       etching the etching layer to form a hollow portion in a surface of the etching layer;  
       depositing a sacrificial layer in the hollow portion of the etching layer;  
       flattening the surface of the etching layer;  
       forming an insulating film on the flattened surface of the etching layer;  
       etching the insulating film;  
       forming an absorber over the insulating film for absorbing radiation energy and converting the radiation energy into thermal energy;  
       forming a resistor between the absorber and the insulating film for converting thermal energy into an electrical signal; and  
       etching the sacrificial layer and the etching layer to form a membrane for controlling a thermal discharge from the resistor.  
     
     
       2. A method according to  claim 1 ; wherein the step of etching the sacrificial layer and the etching layer comprises removing a portion of the etching layer directly below the hollow portion completely to the etching stop layer.

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