US6817915B2ExpiredUtilityA1

Method of transforming polymer films into carbon films

54
Assignee: CANON KKPriority: Feb 28, 2002Filed: Jan 27, 2003Granted: Nov 16, 2004
Est. expiryFeb 28, 2022(expired)· nominal 20-yr term from priority
H01J 9/027H01J 2329/00
54
PatentIndex Score
2
Cited by
24
References
6
Claims

Abstract

A process of efficiently transforming polymer films arranged on an electron source substrate into carbon films is provided. A light is irradiated onto a region of the substrate where a plurality of polymer films, associated electrodes and part of wirings are arranged so that the plurality of polymer films are simultaneously transformed into lower resistance films such as carbon films through heating by the irradiated light, wherein for the irradiating light, a light absorptance of the wirings is lower than that of the electrodes.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
       1. A method of manufacturing an electron source, comprising the steps of: 
       (A) providing a substrate on which a plurality of units and wirings are arranged, each unit comprising a pair of electrodes and a polymer film for connecting the electrodes of the pair and the wirings respectively being connected to at least one of the plurality of units;  
       (B) irradiating light onto a region of the substrate where two or more units and part of the wirings are arranged, to reduce resistivity of the polymer film in each of the two or more units;  
       (C) forming a gap in a film obtained by performing the step (B),  
       wherein for the irradiating light in step (B), a light absorptance of the wirings is lower than that of the electrodes.  
     
     
       2. A method of manufacturing an electron source according to  claim 1 , wherein the irradiation of light is performed to all the plurality of units with sequential scanning. 
     
     
       3. A method of manufacturing an electron source according to  claim 1 , wherein the light absorptance of the wirings is lower than a light absorptance of the pair of electrodes by 15% or more. 
     
     
       4. A method of manufacturing an electron source according to  claim 1 , wherein a light absorptance of the wirings is 20% or lower. 
     
     
       5. A method of manufacturing an electron source according to  claim 1 , further comprising the step of arranging a coating layer on a base layer of the wirings, for the irradiation light in the step (B), a reflectivity of the coating layer being higher than that of the base layer. 
     
     
       6. A method of manufacturing an electron source according to  claim 1 , wherein the gap is formed by flowing an electric current through the film obtained by the step (B).

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