US6869644B2ExpiredUtilityPatentIndex 97
Method of making coated articles and coated articles made thereby
Est. expiryOct 24, 2020(expired)· nominal 20-yr term from priority
C03C 17/38B32B 17/10174C03C 17/366C03C 17/3417C03C 17/3644C23C 14/5806C03C 17/42C03C 17/3652C03C 17/3681C03C 17/3639B32B 17/10761C03C 17/36B32B 17/10036G02B 5/0858C03C 17/3618C23C 14/08C03C 17/34Y10T428/24942
97
PatentIndex Score
72
Cited by
49
References
10
Claims
Abstract
A method of making a coated substrate includes providing a substrate having a functional coating with a first emissivity value; depositing a coating material having a second emissivity value over at least a portion of the functional coating prior to heating to provide a coating stack having an emissivity value greater than the emissivity value of the functional coating; and heating the coated substrate.
Claims
exact text as granted — not AI-modified1. A method of making a coated substrate, comprising:
providing a substrate having a functional coating including one or more infrared reflective films comprising a reflective metal with a first emissivity value; and
depositing a coating material comprised of 35 wt. % to 100 wt. % alumina and 0 wt. % to 65 wt. % silica having a second emissivity value over at least a portion of the functional coating to provide a coating stack having an emissivity value greater than the emissivity value of the functional coating.
2. The method of claim 1 , including heating the coated substrate.
3. The method of claim 1 , wherein the coating material comprises 75 wt. % to 85 wt. % alumina and 15 wt. % to 25 wt. % silica.
4. The method of claim 1 , wherein the coating material comprises 86 wt. % to 90 wt. % alumina and 10 wt. % to 14 wt. % silica.
5. The method of claim 1 , including depositing the coating material to a thickness in the range of 100 Å to 1.5 microns.
6. The method of claim 1 , wherein the coating material has an index of refraction substantially the same as the index of refraction of the substrate.
7. The method of claim 1 , wherein the substrate is glass and the method includes depositing the coating material to have a thickness in the range of 100 Å to 1.5 microns and a refractive index of 1.5±0.2.
8. The method of claim 1 , wherein the first emissivity value is different than the second emissivity value.
9. A method of making a coated substrate, comprising:
providing a substrate having a functional coating with a first emissivity value; and
depositing a coating material comprised of 75 wt. % to 85 wt. % alumina and 15 wt. % to 25 wt. % silica having a second emissivity value over at least a portion of the functional coating to provide a coating stack having an emissivity value greater than the emissivity value of the functional coating.
10. A method of making a coated substrate, comprising:
providing a substrate having a functional coating with a first emissivity value; and
depositing a coating material comprised of 86 wt. % to 90 wt. % alumina and 10 wt. % to 14 wt. % silica having a second emissivity value over at least a portion of the functional coating to provide a coating stack having an emissivity value greater than the emissivity value of the functional coating.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.