Electrode for plasma display panel and process for producing the same

Abstract

A process for forming an electrode pattern for a plasma display panel, the process including coating a photosensitive conductive paste on a film to form a pattern forming layer, laminating the film onto a substrate with the pattern forming layer facing the substrate, exposing the pattern forming layer from above the film through a mask, separating and removing the film and developing the pattern forming layer to remove unexposed areas, and firing the substrate to adhere the exposed areas of the pattern forming layer to the substrate, thus forming an electrode pattern thereon.

1. A process for producing an electrode pattern for a plasma display panel, comprising the steps of:
 coating a photosensitive conductive paste on a film to form a pattern forming layer on the film; 
 laminating the pattern forming layer on the film onto a substrate so that the pattern forming layer faces the substrate; 
 exposing the pattern forming layer from above the film through a mask; 
 thereafter separating and removing the film and developing the pattern forming layer to remove unexposed areas; and 
 firing the whole substrate to adhere the pattern forming layer in its exposed areas to the substrate, thereby forming an electrode pattern on the substrate. 
 
     
     
       2. The process according to  claim 1 , wherein the substrate is a glass substrate. 
     
     
       3. The process according to  claim 1 , wherein the substrate has a pattern of a transparent conductive film. 
     
     
       4. A process for producing a thick electrode pattern for a plasma display panel, comprising the steps of:
 coating a photosensitive conductive paste on a film to form a pattern forming layer; 
 laminating the pattern forming layer on the film onto a substrate so that the pattern forming layer faces the substrate; 
 separating and removing the film and exposing the pattern forming layer through a mask; 
 thereafter developing the pattern forming layer to remove unexposed areas; and 
 firing the whole substrate to adhere the pattern forming layer in its exposed areas to the substrate, thereby forming a thick electrode pattern on the substrate. 
 
     
     
       5. The process according to  claim 4 , wherein the substrate is a glass substrate. 
     
     
       6. The process according to  claim 4 , wherein the substrate has a pattern of a transparent conductive film.