Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus includes a plurality of chambers which respectively have openings and are connected to each other to be able to communicate with each other through the openings, and a suppressing system which suppresses a gas from flowing into at least one of the plurality of chambers through the openings after disconnection of the plurality of chambers. The one of the plurality of chambers has a projection, another one of the plurality of chambers has a recess, and the one chamber and the other chamber are connected to each other as the projection is fitted in the recess.

1. An exposure apparatus comprising:
 a plurality of chambers which respectively have openings and are connected to each other to be able to communicate with each other through the openings; and 
 a suppressing system which suppresses a gas from flowing into at least one of said plurality of chambers through the opening after disconnection of said plurality of chambers, 
 wherein one of said plurality of chambers has a projection, another one of said plurality of chambers has a recess, and said one chamber and said another chamber are connected to each other as the projection is fitted in the recess. 
 
   
   
     2. An apparatus according to  claim 1 , wherein said suppressing system is provided with respect to each of said plurality of chambers. 
   
   
     3. An apparatus according to  claim 1 , wherein said suppressing system comprises a sealing lid which seals the opening. 
   
   
     4. An apparatus according to  claim 1 , wherein said suppressing system has a supply system which supplies a gas into at least one of said plurality of chambers. 
   
   
     5. An apparatus according to  claim 4 , wherein the gas comprises at least one of an inert gas and dry air. 
   
   
     6. An apparatus according to  claim 1 , wherein said one chamber has a seal member around the projection. 
   
   
     7. An apparatus according to  claim 6 , wherein said another chamber has a seal member around the recess. 
   
   
     8. A device manufacturing method comprising steps of:
 transferring a pattern to an object using an exposure apparatus as defined in  claim 1 ; and 
 developing the object to which the pattern has been transferred. 
 
   
   
     9. An exposure apparatus which has a projection optical system and projects a pattern of an original held by an original stage onto a substrate held by a substrate stage using exposure light through the projection optical system, said apparatus comprising:
 a first chamber which accommodates the original stage; 
 a second chamber which accommodates the projection optical system; and 
 a third chamber which accommodates the substrate stage, 
 
     wherein said first, second and third chambers are connected to one another and respectively have openings through which the exposure light passes and wherein one of said plurality of chambers has a projection, another one of said plurality of chambers has a recess, and said one chamber and said another chamber are connected to each other as the projection is fitted in the recess, and 
     said exposure apparatus further comprises a suppressing system which suppresses a gas from flowing into at least one of said first, second and third chambers through the opening after disconnection of said first, second and third chambers. 
   
   
     10. An apparatus according to  claim 9 , wherein said suppressing system is provided with respect to each of said first, second and third chambers.