US7151385B2ExpiredUtilityPatentIndex 91
Contact probe, method of manufacturing the contact probe, and device and method for inspection
Assignee: SUMITOMO ELECTRIC INDUSTRIESPriority: Jan 29, 2001Filed: Jan 22, 2002Granted: Dec 19, 2006
Est. expiryJan 29, 2021(expired)· nominal 20-yr term from priority
H10P 74/00G01R 1/06733G01R 1/06738G01R 3/00G01R 1/06755Y10T29/49204Y10T29/49117
91
PatentIndex Score
19
Cited by
25
References
9
Claims
Abstract
A method of manufacturing a contact probe includes an electroforming step of, using a resist film ( 522 ) arranged on a substrate ( 521 ) as a pattern frame having a shape corresponding to a contact probe, performing electroforming to fill a gap in the resist film ( 522 ) to form a metal layer ( 526 ), a tip end shaping step of obliquely removing and sharpening that part of the metal layer ( 526 ) which serves as a tip end portion of the contact probe, and a take-out step of taking out only the metal layer ( 526 ) from the pattern frame.
Claims
exact text as granted — not AI-modified1. A method of manufacturing a contact probe, comprising:
an electroforming step that comprises, using a pattern frame having a shape corresponding to a contact probe and arranged on a substrate, performing electroforming to fill a gap of said pattern frame to form a metal layer;
a tip end shaping step that comprises obliquely removing and sharpening a tip end of said metal layer that is to serve as a tip end portion of said contact probe, comprising cutting said tip end of said metal layer by electrical discharge machining; and
a take-out step of taking out only said metal layer from said pattern frame.
2. The method of manufacturing a contact probe according to claim 1 , wherein said tip end shaping step includes a step of providing a projection using an electrical discharge machining mark on a machined surface formed by said electrical discharge machining.
3. The method of manufacturing a contact probe according to claim 2 , wherein said machined surface is covered with a metal having a hardness higher than that of a surface of said machined surface and having an electric resistance smaller than that of a material forming the surface of said machined surface.
4. The method of manufacturing a contact probe according to claim 1 , wherein said pattern frame is formed by forming a pattern by lithography on a resist film formed on said substrate.
5. The method of manufacturing a contact probe according to claim 1 , wherein said pattern frame is made of a resin molded using a metal die.
6. A method of manufacturing a contact probe, comprising:
an electroforming step that comprises, using a pattern frame having a shape corresponding to a contact probe and arranged on a substrate, performing electroforming to fill a gap of said pattern frame to form a metal layer;
a tip end shaping step that comprises obliquely removing and sharpening a tip end of said metal layer that is to serve as a tip end portion of said contact probe, comprising a cutting process selected from the group consisting of: cutting said tip end of said metal layer by electrical discharge machining, or cutting a boundary between said pattern frame and said metal layer along said tip end using a rotary cutting edge having an outer edge that is V-shaped in cross section; and
a take-out step of taking out only said metal layer from said pattern frame.
7. The method of manufacturing a contact probe according to claim 6 , wherein said cutting process comprises said cutting of said boundary using said rotary cutting edge.
8. The method of manufacturing a contact probe according to claim 7 , wherein said pattern frame is formed by forming a pattern by lithography on a resist film formed on said substrate.
9. The method of manufacturing a contact probe according to claim 7 , wherein said pattern frame is made of a resin molded using a metal die.Cited by (0)
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