Semiconductor substrate cleansing apparatus

Abstract

A cleansing apparatus comprising: a table 3 for supporting a semiconductor substrate 30 horizontally; a high frequency solution injector 20 capable of injecting a solution to the upper surface 30 a and the side surface 30 c of the semiconductor substrate 30 supported by the table 3 with the application of vibration at high frequency; a cover 2 capable of tightly enclosing the semiconductor substrate 30 supported by the table 3 ; and pressure reducing means 18 for reducing the pressure in a space, in which the semiconductor substrate 30 is enclosed with the cover 2 . The semiconductor substrate can be cleansed efficiently at a low cost and kept in clean state after the cleansing until it is dried.

1. A cleansing apparatus comprising:
 a table for supporting a semiconductor substrate horizontally; 
 a high frequency solution injector capable of injecting a solution to an upper surface of the semiconductor substrate supported by the table with the application of vibration at high frequency and being movable; 
 a cover capable of tightly enclosing the semiconductor substrate supported by the table and being able to be located apart from the substrate during cleansing of the substrate; 
 pressure reducing means for reducing the pressure only in a space which is enclosed with the cover; and 
 an air-tight container for containing therein the table, the high frequency solution injector and the cover. 
 
   
   
     2. A cleansing apparatus as claimed in  claim 1 , further comprising injector displacing means for moving the high frequency solution injector in parallel to the table, and further, inclining the high frequency solution injector with respect to the table. 
   
   
     3. A cleansing apparatus as claimed in  claim 2 , wherein the injector displacing means comprises:
 a swing shaft for swinging the high frequency solution injector within a plane parallel to the table; and 
 an arm which is fixed at one end thereof perpendicularly to the swing shaft and has at the other end thereof the high frequency solution injector oscillatably fixed thereto. 
 
   
   
     4. A cleansing apparatus as claimed in  claim 1 , wherein an injection port of the high frequency solution injector is formed into a shape of a slit. 
   
   
     5. A cleansing apparatus as claimed in  claim 4 , wherein the opening width of the injection port of the high frequency solution injector is gradually increased along a longitudinal direction. 
   
   
     6. A cleansing apparatus as claimed in  claim 1 , wherein the high frequency solution injector has, in a horizontal direction, a plurality of vibrators for vibrating the solution. 
   
   
     7. A cleansing apparatus as claimed in  claim 1 , wherein the cover can also enclose the high frequency solution injector tightly. 
   
   
     8. A cleansing apparatus as claimed in  claim 1 , further comprising introducing means for introducing inactive gas into a space in which the semiconductor substrate is tightly enclosed with the cover. 
   
   
     9. A cleansing apparatus comprising:
 a table for supporting a semiconductor substrate horizontally; 
 a high frequency solution injector capable of injecting a solution to an upper surface of the semiconductor substrate supported by the table with the application of vibration at high frequency; 
 a cover capable of tightly enclosing the semiconductor substrate supported by the table; 
 pressure reducing means for reducing the pressure only in a space which is enclosed with the cover; 
 an air-tight container for containing therein the table, the high frequency solution injector and the cover; 
 a plurality of branch pipes for supplying a plurality of kinds of chemical solutions, respectively; 
 valves disposed in the branch pipes, respectively; 
 confluent units for allowing the chemical solutions passing through the valves to be made confluent with each other; and 
 a single main pipe passing through the container so as to connect the confluent units and the high frequency solution injector to each other. 
 
   
   
     10. A cleansing apparatus comprising:
 a table for supporting a semiconductor substrate horizontally; 
 a high frequency solution injector capable of injecting a solution to an upper surface of the semiconductor substrate supported by the table with the application of vibration at high frequency; 
 a cover capable of tightly enclosing the semiconductor substrate supported by the table, and being movable in a direction perpendicular to the table; 
 pressure reducing means for reducing the pressure only in a space which is enclosed with the cover; and 
 an air-tight container for containing therein the table, the high frequency solution injector and the cover. 
 
   
   
     11. A cleansing apparatus of  claim 10 , wherein the cover can also enclose the high frequency solution injector tightly. 
   
   
     12. A cleansing apparatus of  claim 10 , further comprising introducing means for introducing inactive gas into a space in which the semiconductor substrate is tightly enclosed with the cover.