US7323151B2ExpiredUtilityA1
Process for the selective removal of sulphur compounds from synthesis gas
Est. expiryFeb 18, 2022(expired)· nominal 20-yr term from priority
C01B 3/58B01D 2257/304B01D 53/02B01D 2257/308C01B 2203/0435C01B 2203/0495C01B 2203/0485Y10S502/517
50
PatentIndex Score
4
Cited by
11
References
3
Claims
Abstract
A process for the selective removal of sulphur compounds from synthesis gas being rich in carbon monoxide and containing hydrogen, carbon monoxide and containing hydrogen, carbon dioxide and steam comprising contacting the synthesis gas at a maximum contact temperature of 100° C. with an absorbent comprising Cu/ZnO compounds and being prepared by thermal decomposition of a corresponding carbonate and activation of the thermal decomposed carbonate with a reducing gas.
Claims
exact text as granted — not AI-modified1. A process for the selective removal of sulphur compounds from synthesis gas containing at least 5% carbon monoxide, at least 5% hydrogen, at least 0.5% carbon dioxide and water at a pressure of at least 15 bar comprising contacting the synthesis gas at a maximum contact temperature of 100° C. with an absorbent comprising Cu/ZnO compounds which has been activated with a reducing gas.
2. The process of claim 1 , wherein the sulphur compounds comprise H 2 S and COS.
3. The process of claim 1 , wherein the synthesis gas contains H 2 S in an amount effective for suppression of metal dusting of metals in contact with the synthesis gas within a temperature range between 300° C. to Boudouard temperature of the synthesis gas.Cited by (0)
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