Method for fabricating three-dimensional photonic crystal

Abstract

At least one exemplary embodiment is directed to a method for fabricating a three-dimensional photonic crystal. In the method for fabricating the three-dimensional photonic crystal, a plurality of layers can be defined as one unit, and the total thickness of the one unit can be controlled such that an average layer-thickness of the plurality of layers in the one unit is about equal to the ideal layer-thickness so that a photonic band-gap occurs in a desired wavelength region.

1. A method for fabricating a three-dimensional photonic crystal by stacking a plurality of layers including a refractive index periodic structure, the method comprising:
 forming a laminated structure of one unit by stacking a plurality of layers constituting a fundamental period; 
 measuring a total layer-thickness of the laminated structure of the one unit; 
 comparing the total layer-thickness of the laminated structure of the one unit with an ideal layer-thickness calculated such that a photonic band-gap occurs in a desired wavelength region in the one unit; and 
 decreasing a thickness of a top layer of the laminated structure of the one unit such that the total layer-thickness of the laminated structure of the one unit coincides with the ideal layer-thickness. 
 
     
     
       2. The method for fabricating a three-dimensional photonic crystal according to  claim 1 , wherein the number of the layers constituting the one unit is equal to an integral multiple of the number of the layers constituting a fundamental period of the three-dimensional photonic crystal. 
     
     
       3. The method for fabricating a three-dimensional photonic crystal according to  claim 1 , wherein a plurality of the laminated structure of one unit are collectively formed on a substrate. 
     
     
       4. The method for fabricating a three-dimensional photonic crystal according to  claim 1 , wherein decreasing the thickness of the top layer is performed by at least one of etching, polishing, and ablation. 
     
     
       5. A functional element comprising a three-dimensional photonic crystal fabricated by the method according to  claim 1 , wherein the three-dimensional photonic crystal comprises a linear defect part that functions as a waveguide. 
     
     
       6. A functional element comprising a three-dimensional photonic crystal fabricated by the method according to  claim 1 , wherein the three-dimensional photonic crystal comprises a point defect part that functions as a resonator. 
     
     
       7. A light-emitting element, which comprises the functional element according to  claim 6  comprising an active medium having a light-emitting function in the resonator and comprises an excitation means for exciting the active medium. 
     
     
       8. A laser comprising at least one light-emitting element according to  claim 7 . 
     
     
       9. A method for fabricating a three-dimensional photonic crystal by stacking a plurality of layers including a refractive index periodic structure, the method comprising:
 forming a laminated product of which number of layers is smaller, by one, than the number of layers in a laminated structure of one unit by stacking layers of which number is smaller, by one, than the number of a plurality of layers constituting a fundamental period; 
 measuring a total layer-thickness of the laminated product; 
 comparing the total layer-thickness of the laminated product with an ideal layer thickness calculated such that a photonic band-gap occurs in a desired wavelength region in the one unit; and 
 stacking a top layer of the laminated structure of the one unit on the laminated product such that the total layer-thickness of the laminated structure of the one unit coincides with the ideal layer-thickness, wherein the layer-thickness of the top layer is predetermined in the comparing. 
 
     
     
       10. The method for fabricating a three-dimensional photonic crystal according to  claim 9 , wherein the number of the layers constituting the one unit is equal to an integral multiple of the number of the layers constituting a fundamental period of the three-dimensional photonic crystal. 
     
     
       11. The method for fabricating a three-dimensional photonic crystal according to  claim 9 , wherein a plurality of the laminated structure of one unit are collectively formed on a substrate. 
     
     
       12. A functional element comprising a three-dimensional photonic crystal fabricated by the method according to  claim 9 , wherein the three-dimensional photonic crystal comprises a linear defect part that functions as a waveguide. 
     
     
       13. A functional element comprising a three-dimensional photonic crystal fabricated by the method according to  claim 9 , wherein the three-dimensional photonic crystal comprises a point defect part that functions as a resonator. 
     
     
       14. A light-emitting element, which comprises the functional element according to  claim 13  comprising an active medium having a light-emitting function in the resonator and comprises an excitation means for exciting the active medium. 
     
     
       15. A laser comprising at least one light-emitting element according to  claim 14 .