Exposure apparatus

Abstract

An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.

1. An exposure apparatus comprising:
 an illumination optical system for illuminating a reticle using light from a light source; and 
 a projection optical system for projecting a pattern of the reticle onto an object to be exposed, 
 wherein said illumination optical system includes: 
 an optical integrator for forming a secondary light source from the light; 
 a zooming optical system for introducing the light to the optical integrator, and for adjusting a size of the secondary light source; and 
 a condenser optical system that introduces the light from the optical integrator to the reticle, and has a plurality of optical elements, 
 wherein the zooming optical system adjusts the size of the secondary light source in accordance with an adjustment of an interval between the plurality of optical elements of the condenser optical system. 
 
   
   
     2. An exposure apparatus according to  claim 1 , wherein the adjustment of the interval between the plurality of optical elements is used to adjust telecentricity for the light to expose the object. 
   
   
     3. An exposure apparatus according to  claim 1 , wherein the condenser optical system makes a focal length and a back principal point position of the condenser optical system substantially constant, while making a front principal point position of the condenser optical system variable. 
   
   
     4. A device fabricating method comprising the steps of:
 exposing an object using an exposure apparatus according to  claim 1 ; and 
 developing the object that has been exposed.