Device and method for analyzing a materials library

Abstract

A device for analyzing a materials library includes at least one radiation source for electromagnetic radiation, which is positioned in front of the materials library, and at least two flat detectors operating in parallel, which are operable using high-sensitivity resolution and of which one is sensitive to electromagnetic radiation of a first wavelength range and the other is sensitive to electromagnetic radiation of a second wavelength range. Moreover, a method for analyzing a materials library in which the materials library is simultaneously tested using at least two methods in which electromagnetic radiation of different wavelength ranges is used. The beam is split behind the materials library as a function of wavelength and is deflected in the direction of at least two flat sensors operating using high-sensitivity resolution.

1. A device for analyzing a materials library comprising:
 at least two radiation. sources for emitting electromagnetic radiation, situated in front of the materials library, a first of the at least two radiation sources emitting electromagnetic radiation in one of (a) an infrared wavelength range and (b) a Raman wavelength range and a second of the at least two radiation sources emitting electromagnetic radiation in one of (a) a UV wavelength range and (b) VIS wavelength range; and 
 at least two flat detectors operating in parallel and operable using high-sensitivity resolution, a first of the at least two flat detectors being sensitive to electromagnetic radiation in one of (a) the infrared wavelength range and (b) the Raman wavelength range and a second of the at least two flat detectors being sensitive to electromagnetic radiation in one of (a) the UV wavelength range and (b) the VIS wavelength ranged, 
 wherein the device is capable of simultaneously analyzing a plurality of elements in the materials library. 
 
   
   
     2. The device according to  claim 1 , further comprising at least one wavelength-sensitive mirror situated behind the materials library and in front of the flat detectors. 
   
   
     3. The device according to  claim 1 , further comprising at least one optical system for bundling the radiation emitted by at least one of the at least two radiation sources, the at least one optical system being assigned to the at least one of the at least two radiation sources. 
   
   
     4. The device according to  claim 1 , further comprising at least one monochromator assigned to at least one of the at least two radiation sources. 
   
   
     5. The device according to  claim 1 , further comprising a gas source for applying a gas to the materials library. 
   
   
     6. A method for analyzing a materials library, the method comprising:
 simultaneously testing a plurality of elements in the materials library using at least two methods in which electromagnetic radiation of different wavelength ranges is used, wherein at least two radiation sources for emitting electromagnetic radiation are used, a first of the at least two radiation sources emitting electromagnetic radiation in one of (a) an infrared wavelength range and (b) a Raman wavelength range and a second of the at least two radiation sources emitting electromagnetic radiation in one of (a) a UV wavelength range and (b) VIS wavelength range; 
 performing a wavelength-dependent beam splitting behind the materials library; and 
 deflecting the radiation in a direction of at least two flat sensors operating using high-sensitivity resolution, the at least two flat sensors being sensitive to different wavelength ranges; 
 wherein a first wavelength range is in one of (a) the infrared wavelength range and (b) the Raman wavelength range and a second wavelength range is in one of (a) the UV wavelength range and (b) the VIS wavelength range.