High speed, high efficiency optical pattern generator using rotating optical elements

Abstract

An optical pattern generator includes one or more multi-faceted rotating optical elements that introduce an offset that is rotation insensitive. The component that generates the offset is rotationally symmetric around the rotational axis of the optical element. Thus, as the optical element rotates, the effect of the offset component does not change. In addition, rotating optical elements may be designed to counteract unwanted optical effects of each other.

1. A method of compensating for relative motion between a target and an optical pattern generator, the optical pattern generator comprising a multi-faceted rotating optical element having a rotational axis and a plurality of facets that rotate around the rotational axis, the method comprising:
 moving an optical pattern generator in a lateral direction relative to the target; 
 rotating a facet of the rotating optical element of the optical pattern generator through an incident optical beam; and 
 generating a scan action from the deflection of the incident optical beam by the facet, wherein generation of the scan action compensates for motion of the optical pattern generator in a lateral direction relative to the target. 
 
     
     
       2. The method of  claim 1 , wherein moving an optical pattern generator in a lateral direction relative to the target comprises sweeping the optical pattern generator over the target. 
     
     
       3. The method of  claim 1 , wherein the scan action deflects the figure by a distance of less than 1 mm relative to the optical pattern generator. 
     
     
       4. The method of  claim 1 , wherein the target is a section of skin. 
     
     
       5. The method of  claim 1 , wherein the compensation for relative motion deflects the incident optical beam to a stationary spot on the target for a duration of the exposure of the spot. 
     
     
       6. An optical pattern generator that generates a plurality of figures on a target that is moving relative to the optical pattern generator, the pattern generator comprising:
 a first multi-sectored rotating optical element having a first rotational axis and a plurality of different sectors that rotate around the first rotational axis, 
 wherein each sector deflects an incident optical beam that compensates for a motion of the target in a lateral direction relative to the optical pattern generator in generating a figure of the plurality of figures; and 
 one or more sectors include an offset component that offsets the figure along an offset direction, wherein the offset direction is generally aligned with a radial direction of the optical element. 
 
     
     
       7. The pattern generator of  claim 6  further comprising:
 a second multi-sectored rotating optical element having a second rotational axis and a plurality of different sectors that rotate around the second rotational axis, 
 the second optical element located downstream of the first optical element, 
 wherein each sector on the first optical element has a corresponding sector on the second optical element, and 
 corresponding sectors rotate through the optical beam in synchronization and cause the optical beam to generate a figure from the plurality of figures as the corresponding sectors rotate through the optical beam. 
 
     
     
       8. The pattern generator of  claim 6  further comprising:
 a handpiece functionally coupled to the first multi-sectored rotating optical element and configured to deliver optical treatment energy to a selected region of skin. 
 
     
     
       9. The pattern generator of  claim 8  further comprising a curved contact plate configured to be placed in contact with the selected region of skin during operation of the pattern generator. 
     
     
       10. The pattern generator of  claim 6  wherein the figures in the plurality of figures are offset by uneven amounts. 
     
     
       11. The pattern generator of  claim 6  wherein the figures are generated in a non-sequential order. 
     
     
       12. The pattern generator of  claim 6  wherein each offset component comprises a lens-like optical element, and optical powers of the lens-like optical elements vary from sector to sector whereby different sectors introduce different offsets. 
     
     
       13. The pattern generator of  claim 6  wherein each of the figures is stationary on the target during exposure of the figure. 
     
     
       14. The pattern generator of  claim 6  wherein the figures in the plurality of figures are offset along a direction that is perpendicular to a direction of relative motion of the target relative to the optical pattern generator.