Oxidation hair dye composition

Abstract

An oxidation hair dye composition that provides an improved dyeing property. The oxidation hair dye composition comprises an oxidation dye, an alkaline chemical, and an oxidizing agent. The oxidation hair dye composition further comprises at least one selected from the group consisting of microbial hyaluronic acids and salts thereof.

1. An oxidation hair dye composition comprising:
 an oxidation dye, 
 an alkaline chemical, 
 an oxidizing agent, and 
 at least one component selected from the group consisting of microbial hyaluronic acids and salts thereof. 
 
     
     
       2. The oxidation hair dye composition according to  claim 1 , wherein the content of at least component one selected from the group consisting of said microbial hyaluronic acids and salts thereof in the composition is 0.00001 to 0.3 mass %. 
     
     
       3. The oxidation hair dye composition according to  claim 1 , further comprising at least one component selected from the group consisting of hydroxymethoxybenzophenonesulfonic acid, dihydroxydimethoxybenzophenonedisulfonic acid, pantetheine-S-sulfonic acid, aminoethylsulfonic acid, guaiazulenesulfonic acid, para-phenolsulfonic acid, and salts thereof. 
     
     
       4. The oxidation hair dye composition according to  claim 3 , wherein the ratio of the content of at least one component selected from the group consisting of microbial hyaluronic acids and salts thereof to the content of at least one selected from the group consisting of said hydroxymethoxybenzophenonesulfonic acid, dihydroxydimethoxybenzophenonedisulfonic acid, pantetheine-S-sulfonic acid, aminoethylsulfonic acid, guaiazulenesulfonic acid, para-phenolsulfonic acid, and salts thereof is 1:100 to 100:1. 
     
     
       5. The oxidation hair dye composition according to  claim 3 , wherein the content of at least one component selected from the group consisting of said hydroxymethoxybenzophenonesulfonic acid, dihydroxydimethoxybenzophenonedisulfonic acid, pantetheine-S-sulfonic acid, aminoethylsulfonic acid, guaiazulenesulfonic acid, para-phenolsulfonic acid, and salts in the composition is 0.000001 to 5 mass %.