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US7888765B2ActiveUtilityPatentIndex 50

Optical semiconductor device

Assignee: PANASONIC CORPPriority: Jul 30, 2007Filed: Jul 15, 2008Granted: Feb 15, 2011
Est. expiryJul 30, 2027(~1.1 yrs left)· nominal 20-yr term from priority
Inventors:TANIGUCHI MASAKIYASUKAWA HISATADAIWAI TAKAKI
H10F 30/245G11B 7/13
50
PatentIndex Score
1
Cited by
12
References
6
Claims

Abstract

An optical semiconductor device includes a phototransistor for receiving incident light. The phototransistor includes a collector layer of a first conductivity type formed on a semiconductor substrate, a base layer of a second conductivity type formed on the collector layer, and an emitter layer of a first conductivity type formed on the base layer. A thickness of the emitter layer is equal to or less than an absorption length of the incident light in the semiconductor substrate.

Claims

exact text as granted — not AI-modified
1. An optical semiconductor device, comprising a phototransistor for receiving incident light,
 wherein the phototransistor includes a N-type buried layer formed on a semiconductor substrate, a collector layer of a first conductivity type formed directly on the buried layer, a base layer of a second conductivity type formed on the collector layer, an emitter layer of a first conductivity type buried in the base layer, and an insulating layer extending to the N-type buried layer from a surface of the emitter layer, and 
 a part of the base layer covering the emitter layer has a thickness equal to or larger than an absorption length of the incident light in the semiconductor substrate. 
 
     
     
       2. The optical semiconductor device according to  claim 1 , wherein the emitter layer has such a planar shape that a part of the emitter layer and a part of the base layer are alternately arranged in a main-surface direction of the semiconductor substrate. 
     
     
       3. The optical semiconductor device according to  claim 2 , wherein the emitter layer has a comb shape, a ladder shape, or a grid planar shape. 
     
     
       4. The optical semiconductor device according to  claim 1 , wherein in the part of the base layer located on the emitter layer, a concentration of impurities of a second conductivity type is reduced toward a surface. 
     
     
       5. The optical semiconductor device according to  claim 1 , the part of the base layer located on the emitter layer is made of a semiconductor material having a wider bandgap than that of the semiconductor substrate. 
     
     
       6. The optical semiconductor device according to  claim 1 , wherein the incident light is blue light.

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