US7915565B2ActiveUtilityPatentIndex 48
Apparatus and method for calibrating a laser deposition system
Est. expiryJan 25, 2027(~0.6 yrs left)· nominal 20-yr term from priority
G01F 25/14G01F 13/001B23K 26/34B23K 26/1494B23K 26/144B23K 35/0244B23K 26/702G05B 2219/49018G01F 13/006B23K 26/32B23K 26/60B23K 2103/50G01F 25/0092G05B 19/402
48
PatentIndex Score
1
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33
References
6
Claims
Abstract
A method of calibrating a high energy beam with a material source, the method comprising the steps of: using the high energy beam to provide an aperture, depositing material from the material source towards the aperture for a selected length of time and collecting the material which passes through the aperture, and adjusting the position and/or alignment of the material source relative to the high energy beam dependant on a comparison of the amount of material collected with a predetermined value.
Claims
exact text as granted — not AI-modified1. A method of calibrating a high energy beam with a material source, the method comprising the steps of:—
using the high energy beam to provide an aperture in a surface of a container,
depositing material from the material source towards the aperture for a selected length of time;
collecting the material which passes through the aperture;
comparing the amount of material collected with a predetermined value; and
adjusting the position of the material source relative to the high energy beam dependant on said comparison.
2. A method according to claim 1 , wherein the predetermined value is the calculated or determined maximum amount of material deposited by the material source in the selected length of time.
3. A method according to claim 1 , wherein the predetermined value is a previously calculated or determined amount of material from the material source passing through the aperture formed by the high energy beam in the selected length of time.
4. A method according to claim 2 , wherein the position of the material source relative to the high energy beam is adjusted if the difference the between amount of material collected and the predetermined value is greater than a threshold.
5. A method according to claim 3 , wherein the position of the material source relative to the high energy beam is adjusted if amount of material collected is less than the predetermined value, or the difference the between amount of material collected and the predetermined value is greater than a threshold.
6. A method according to claim 1 , wherein the material is a powder.Cited by (0)
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