P
US7985531B2ActiveUtilityPatentIndex 63

Method of producing an ink jet head and method of producing an electronic device

Assignee: CANON KKPriority: Mar 15, 2007Filed: Mar 5, 2008Granted: Jul 26, 2011
Est. expiryMar 15, 2027(~0.7 yrs left)· nominal 20-yr term from priority
Inventors:KANRI RYOJISATO TAMAKI
B41J 2/1646B41J 2/1628B41J 2/1645B41J 2/1603B41J 2/1631B41J 2/1639B41J 2/1643B41J 2/1632B41J 2/1642
63
PatentIndex Score
4
Cited by
13
References
5
Claims

Abstract

Provided is a method of producing an ink jet head including: providing the substrate which includes a through hole which forms the supply opening, and a layer that covers an opening of the through hole on a side of the one surface of the substrate; forming a protective film so that the protective film covers a side wall of the through hole and reaches the layer; depositing a photosensitive resin on the protective film; applying light from the side of the one surface of the substrate to pattern the photosensitive resin; and removing the protective film formed on a portion of the opening of the through hole on the side of the one surface of the substrate, with the patterned photosensitive resin being used as a mask.

Claims

exact text as granted — not AI-modified
1. A method of producing an ink jet head, the ink jet head including a substrate having an element, formed on one surface thereof, for generating energy utilized for discharging an ink through a discharge port, and a supply opening, formed so as to penetrate the substrate, for supplying the ink to the discharge port, the method comprising:
 providing the substrate which includes a through hole which forms the supply opening, and a layer that covers an opening of the through-hole on a side of the one surface of the substrate; 
 forming a protective film so that the protective film covers a side wall of the through-hole and reaches the layer; 
 depositing a photosensitive resin on the protective film; 
 applying light from the side of the one surface of the substrate to pattern the photosensitive resin; and 
 removing the protective film formed on a portion of the opening of the through-hole on the side of the one surface of the substrate, with the patterned photosensitive resin being used as a mask. 
 
     
     
       2. A method of producing an ink jet head according to  claim 1 , wherein the step of applying light is performed using a photomask. 
     
     
       3. A method of producing an ink jet head according to  claim 1 , further comprising forming a light-shielding film, which becomes a mask in the step of applying light, on the one surface of the substrate in advance of the step of applying light. 
     
     
       4. A method of producing an ink jet head according to  claim 3 , wherein the light-shielding film is formed of tantalum. 
     
     
       5. A method of producing an ink jet head according to  claim 1 , wherein the protective film is formed of a parylene resin.

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