US8007989B1ActiveUtility

Method and solution for forming a patterned ferroelectric layer on a substrate

84
Assignee: US NAVYPriority: Apr 11, 2008Filed: Apr 11, 2008Granted: Aug 30, 2011
Est. expiryApr 11, 2028(~1.8 yrs left)· nominal 20-yr term from priority
C23C 18/143C01G 35/00C23C 18/1216C01P 2006/40G03F 7/40G03F 7/0042C01G 29/00G03F 7/0047C01G 35/006C23C 18/1295G03F 7/027C23C 18/1279
84
PatentIndex Score
4
Cited by
7
References
3
Claims

Abstract

A method for forming a patterned ferroelectric layer, having ferroelectric electronic properties, on a substrate. A composite layer, made of ferroelectric layer producing metal acrylate compounds, a photoinitiator compound and an acrylate crosslinking compound is formed on the substrate. A photomask is formed on the composite layer. Unmasked areas of the composite layer are irradiated with ultraviolet light. A solvent removes non-irradiated areas of the composite layer from the substrate. The patterned composite layer is heated in an oxygen atmosphere to cause a chemical reaction among the ferroelectric layer producing metal acrylate compounds and oxygen, a patterned ferroelectric layer being formed on the substrate.

Claims

exact text as granted — not AI-modified
1. A method for forming a patterned ferroelectric layer on a substrate, comprising:
 (a) forming a composite layer on a substrate, the composite layer comprising bismuth methacrylate, strontium methacrylate and tantalum dimethacrylate metal acrylate compounds, a photoinitiator compound and an acrylate crosslinking compound; 
 (b) placing a photomask onto the composite layer, the photomask having areas that are transparent to ultraviolet light; 
 (c) irradiating the composite layer, through the photomask, with ultraviolet light; 
 (d) placing a solvent on the irradiated composite layer to remove non-irradiated areas of the composite layer from the substrate, a patterned composite layer being formed on the substrate; and 
 (e) heating the patterned composite layer in an oxygen atmosphere to cause a chemical reaction among the bismuth methacrylate, strontium methacrylate and tantalum dimethacrylate metal acrylate compounds and oxygen, a patterned ferroelectric layer being formed on the substrate. 
 
     
     
       2. A method for forming a patterned ferroelectric layer on a substrate, comprising:
 (a) depositing a solution onto a substrate, the solution comprising bismuth methacrylate, strontium methacrylate and tantalum dimethacrylate metal acrylate compounds, a photoinitiator compound, an acrylate crosslinking compound and a solvent; 
 (b) heating the solution and the substrate, to drive solvent from the deposited solution, a composite layer being formed on the substrate; 
 (c) placing a photomask onto the composite layer, the photomask having areas that are transparent to ultraviolet light; 
 (d) irradiating the composite layer, through the photomask, with ultraviolet light; 
 (e) placing a solvent on the irradiated composite layer to remove non-irradiated areas of the composite layer from the substrate, a patterned composite layer being formed on the substrate; and 
 (f) heating the patterned composite layer in an oxygen atmosphere to cause a chemical reaction among the bismuth methacrylate, strontium methacrylate and tantalum dimethacrylate metal acrylate compounds and oxygen, a patterned ferroelectric layer being formed on the substrate. 
 
     
     
       3. A method for forming a patterned ferroelectric layer on a substrate, comprising:
 (a) depositing a solution onto a substrate, the solution comprising bismuth methacrylate, strontium methacrylate, tantalum dimethacrylate, benzildimethylketal, triethylenglycol dimethacrylate, glyceryl tri-2-ethylhexanoate, and methoxyethoxy alcohol; 
 (b) heating the solution and the substrate, to drive solvent from the deposited solution, a composite layer being formed on the substrate; 
 (c) placing a photomask onto the composite layer, the photomask having areas that are transparent to ultraviolet light; 
 (d) irradiating the composite layer, through the photomask, with ultraviolet light; 
 (e) placing a solvent on the irradiated composite layer to remove non-irradiated areas of the composite layer from the substrate, a patterned composite layer being formed on the substrate; and 
 (f) heating the patterned composite layer in an oxygen atmosphere to cause a chemical reaction among the bismuth methacrylate, strontium methacrylate, tantalum dimethacrylate and oxygen, a patterned ferroelectric layer being formed on the substrate.

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