Electronic paper device and manufacturing method thereof
Abstract
This present invention provides an electronic paper display device. The electronic paper display device includes a thin film transistor array substrate and a display panel disposed on one side of the thin film transistor array substrate. The thin film transistor array substrate comprises a first substrate, a first metal layer, a dielectric layer, a second metal layer, a channel layer, a pixel electrode layer, a protection layer, a first resin layer and a second resin layer. The display panel includes a second substrate, a transparent electrode layer disposed on the second substrate, and an electronic ink material layer between the transparent electrode layer and the thin film transistor array substrate.
Claims
exact text as granted — not AI-modified1. An electronic paper display device, comprising:
a thin film transistor array substrate, wherein the thin film transistor array substrate comprises:
a first substrate;
a first metal layer disposed on the first substrate, wherein the first metal layer includes a plurality of scan lines and a plurality of gate electrodes electrically connected to the scan lines;
a dielectric layer disposed on the first substrate and covers the first metal layer;
a second metal layer disposed on the dielectric layer, wherein the second metal layer includes a plurality of data lines, a plurality of source electrodes electrically connected to the data lines and a plurality of drain electrodes;
a channel layer disposed over the dielectric layer and among the source electrodes, the gate electrodes and the drain electrodes;
a protection layer disposed on the second metal layer and the channel layer;
a first resin layer disposed on the protection layer;
a pixel electrode layer disposed on the first resin layer, wherein the pixel electrode layer includes a plurality of pixel electrodes;
a second resin layer disposed on the pixel electrode layer; and
a display panel disposed on one side of the thin film transistor array substrate, wherein the display panel comprises:
a second substrate;
a transparent electrode layer disposed on the second substrate; and
an electronic ink material layer between the transparent electrode layer and the thin film transistor array substrate.
2. The electronic paper display device of claim 1 , wherein the data lines and the scan lines divide the first substrate into a plurality of pixels, wherein the pixel electrode layer are located within the pixels respectively.
3. The electronic paper display device of claim 1 , wherein the second resin layer is formed over the whole thin film transistor array substrate to cover the scan lines, the data lines and the pixel electrode layer.
4. The electronic paper display device of claim 1 , wherein the second layer is a matrix structure, and the second layer covers the pixel electrode layer and does not cover the scan lines and the data lines.
5. The electronic paper display device of claim 1 , wherein the second resin layer has a pattern as a Chinese character wherein the second resin layer cover the scan lines and the data lines and does not cover the pixel electrode layer.
6. The electronic paper display device of claim 1 , wherein the second resin layer includes a plurality of islands.
7. The electronic paper display device of claim 1 , wherein the second resin layer has a thickness from 0.5 um to 10 um.
8. The electronic paper display device of claim 1 , wherein the second resin layer is formed by a positive photoresist or a negative photoresist.
9. The electronic paper display device of claim 1 , wherein the second resin layer is formed by an Acrylic resin or a mixed material of resin and Silica gel.
10. The electronic paper display device of claim 1 , wherein the second resin layer is formed by an Ethylene-Vinyl Acetate copolymer, EVA.
11. The electronic paper display device of claim 1 , wherein the second resin layer is formed by a mixed material of resin and an inorganic material.
12. A method to form an electronic paper display device, comprising:
forming a thin film transistor array substrate, wherein forming the thin film transistor array substrate further comprises:
forming a first substrate;
forming a first metal layer on the first substrate, wherein the first metal layer includes a plurality of scan lines and a plurality of gate electrodes electrically connected to the scan lines;
forming a dielectric layer on the first substrate to cover the first metal layer;
forming a second metal layer on the dielectric layer, wherein the second metal layer includes a plurality of data lines, a plurality of source electrodes electrically connected to the data lines and a plurality of drain electrodes;
forming a channel layer over the dielectric layer and among the source electrodes, the gate electrodes and the drain electrodes;
forming a protection layer on the second metal layer and the channel layer;
forming a first resin layer on the protection layer;
forming a pixel electrode layer on the first resin layer, wherein the pixel electrode layer includes a plurality of pixel electrodes;
forming a second resin layer on the pixel electrode layer; and
forming a display panel on one side of the thin film transistor array substrate, wherein forming the display panel further comprises:
forming a second substrate;
forming a transparent electrode layer on the second substrate; and
forming an electronic ink material layer between the transparent electrode layer and the thin film transistor array substrate.
13. The method of claim 12 , wherein the data lines and the scan lines divide the first substrate into a plurality of pixels, wherein the pixel electrode layer are located within the pixels respectively.
14. The method of claim 12 , wherein the second resin layer covers the scan lines, the data lines and the pixel electrode layer.
15. The method of claim 12 , further comprising to pattern the second resin layer to make the second resin layer has a matrix structure to cover the pixel electrode layer and expose the scan lines and the data lines.
16. The method of claim 12 , further comprising to pattern the second resin layer to make the second resin layer has a pattern as a Chinese character , wherein the second resin layer covers the scan lines and the data lines and exposes the pixel electrode layer.
17. The method of claim 12 , further comprising to pattern the second resin layer to make the second resin layer includes a plurality of islands.
18. The method of claim 12 , wherein the second resin layer has a thickness from 0.5 um to 10 um.
19. The method of claim 12 , further comprising to form the second resin layer by a positive photoresist or a negative photoresist.
20. The method of claim 12 , further comprising to form the second resin layer by an Acrylic resin or a mixed material of resin and Silica gel.
21. The method of claim 12 , further comprising to form the second resin layer by an Ethylene-Vinyl Acetate copolymer, EVA.
22. The method of claim 12 , further comprising to form the second resin layer by a mixed material of resin and an inorganic material.Cited by (0)
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