Display device and method of fabricating the same

Abstract

The present invention provides a display device and a method of fabricating the same. The display device includes a substrate, a transflective layer including first diffusive layers and second diffusive layers alternately arranged on the substrate, the first diffusive layers including a first diffusive material having a first refractive index, and the second diffusive layers including a second diffusive material having a second refractive index different from the first refractive index, a plurality of via holes formed in the transflective layer, and a light-emitting layer disposed on the substrate.

1. A display device, comprising:
 a substrate; 
 a transflective layer comprising first diffusive layers and second diffusive layers alternately arranged, the first diffusive layers comprising a first diffusive material having a first refractive index, and the second diffusive layers comprising a second diffusive material having a second refractive index different from the first refractive index; 
 a plurality of via holes formed in the transflective layer; and 
 a light-emitting layer arranged on the substrate and configured to generate a light. 
 
     
     
       2. The display device of  claim 1 , wherein the first diffusive material comprises silicon oxide, and the second diffusive material comprises silicon nitride. 
     
     
       3. The display device of  claim 1 , further comprising a third diffusive material filling the via holes and having a third refractive index different from the first refractive index and the second refractive index. 
     
     
       4. The display device of  claim 3 , wherein the via holes each comprise a hexagonal prism shape, and the via holes are spaced apart from each other to form regular triangles. 
     
     
       5. The display device of  claim 3 , wherein the via holes correspond to external areas comprising a hexagonal prism shape comprising periodically appearing regular triangles spaced apart from each other. 
     
     
       6. The display device of  claim 3 , wherein the via holes comprise a rectangular prism shape, and the via holes are spaced apart from one another such that the first diffusive layers and the via holes or the second diffusive layers and the via holes comprise periodically appearing stripe shapes. 
     
     
       7. The display device of  claim 1 , wherein the transflective layer comprises:
 at least one of the first diffusive layers and at least one of the second diffusive layers arranged on a pair of the first diffusive layers and the second diffusive layers; and 
 the via holes comprise first via holes formed in the first diffusive layers, and second via holes formed in the second diffusive layers, 
 wherein a first inner diameter of each of first via holes or a second inner diameter of each of second via holes increases as a distance between each of the diffusive layers and the substrate increases. 
 
     
     
       8. The display device of  claim 1 , wherein the transflective layer comprises at least one of the first diffusive layers and at least one of the second diffusive layers arranged on a pair of the first diffusive layers and the second diffusive layers; and a second inner diameter of each of second via holes formed in the second diffusive layers is larger than a first inner diameter of each of first via holes formed in the first diffusive layers. 
     
     
       9. The display device of  claim 1 , wherein the transflective layer comprises at least one of the first diffusive layers and at least one of the second diffusive layers arranged on a pair of the first diffusive layers and the second diffusive layers; and a second inner diameter of each of second via holes formed in the second diffusive layers is the same as a first inner diameter of each of first via holes formed in the first diffusive layers. 
     
     
       10. The display device of  claim 1 , further comprising a color filter layer arranged directly on a topmost diffusive layer and comprising a color organic material having a third refractive index different from the first refractive index and the second refractive index. 
     
     
       11. The display device of  claim 10 , wherein the color organic material fills the via holes. 
     
     
       12. The display device of  claim 1 , further comprising an overcoat layer arranged on a topmost diffusive layer and comprising a color organic material having a fourth refractive index different from the first refractive index and the second refractive index. 
     
     
       13. The display device of  claim 12 , wherein the color organic material fills the via holes. 
     
     
       14. The display device of  claim 1 , further comprising a refraction layer comprising first refractive layers arranged on the transflective layer and a second refractive layer arranged on the transflective layer, the first refractive layers and the second refractive layer being alternately arranged, the first refractive layers having a third refractive index and comprising a first thickness, and a second refractive layer having a fourth refractive index different from the third refractive index and comprising a second thickness different from the first thickness. 
     
     
       15. A method of fabricating a display device, the method comprising:
 forming a transflective layer comprising first diffusive layers and second diffusive layers alternately arranged on a substrate, the first diffusive layers comprising a first diffusive material having a first refractive index, and the second diffusive layers comprising a second diffusive material having a second refractive index different from the first refractive index; 
 forming a plurality of via holes in the transflective layer; and 
 arranging a light-emitting layer on the substrate, 
 wherein the light-emitting layer is configured to generate a light. 
 
     
     
       16. The method of  claim 15 , wherein forming the plurality of via holes comprises alternately etching the first diffusive layers using a first etching gas and etching the second diffusive layers using a second etching gas, the second etching gas comprising a different type of gas from the first etching gas. 
     
     
       17. The method of  claim 16 , wherein the via holes each comprise a plurality of first via holes formed in the first diffusive layers, respectively, and a plurality of second via holes formed in the second diffusive layers, respectively, a topmost transflective layer is the first diffusive layer, and etching the second diffusive layer using the second etching gas comprises overetching the second diffusive layers such that second inner diameters of the second via holes become larger than first inner diameters of the first via holes. 
     
     
       18. The method of  claim 16 , wherein the first diffusive material comprises silicon oxide, the second diffusive material comprises silicon nitride, the first etching gas comprises C 4 H 8 +H 2 , and the second etching gas comprises CF 4 +O 2 . 
     
     
       19. The method of  claim 15 , wherein forming the plurality of via holes comprises alternately etching the first diffusive layers and the second diffusive layers using an etching gas. 
     
     
       20. The method of  claim 15 , after forming the via holes, further comprising forming an overcoat layer on a topmost diffusive layer using a color organic material having a fourth refractive index different from the first refractive index and the second refractive index.