Method of performing ion implantation

Abstract

A method of performing an ion implantation is provided. A workpiece is installed in the ion implanter. A wafer is provided in a receiving space within an ion implanter. An ion beam is generated by an ion source of the ion implanter. The bombard of the ion beam is blocked and particles generated during or after conducting the step of generating the ion beam are collected by the workpiece.

1. A method of performing an ion implantation, comprising:
 installing a workpiece in an ion implanter; 
 providing a wafer in a receiving space within the ion implanter; 
 generating an ion beam by an ion source of the ion implanter; and 
 blocking a bombard of the ion beam and collecting particles generated during or after conducting the step of generating the ion beam through a plurality of particles attached regions on one surface of the workpiece to collect the particles, 
 wherein the workpiece is an ion beam blocking component comprising:
 a front plate, having a plurality of openings at the same level, wherein a plurality of grooves serving as the particles attached regions is formed on one surface of the front plate facing the ion beam; 
 a back plate, comprising a plurality of grooves serving as the particles attached regions formed on one surface of the back plate facing the front plate; and 
 a plurality of side plates, connected between the front plate and the back plate, wherein the receiving space is formed between the front plate, the back plate, and the side plates. 
 
 
     
     
       2. The method as claimed in  claim 1 , wherein the grooves on the back plate are arranged in a horizontal direction. 
     
     
       3. The method as claimed in  claim 1 , wherein the grooves on the front plate are arranged in a horizontal direction. 
     
     
       4. The method as claimed in  claim 3 , wherein a depth of each of grooves on the back plate is larger than a depth of each of the grooves on the front plate. 
     
     
       5. The method as claimed in  claim 3 , wherein the surfaces with the grooves of the back plate and the front plate are rough surfaces. 
     
     
       6. The method as claimed in  claim 1 , wherein the surfaces with the particles attached region of workpiece are rough surfaces. 
     
     
       7. The method as claimed in  claim 1 , wherein the front plate is made of a high-adhesive material. 
     
     
       8. The method as claimed in  claim 7 , wherein the material of the front plate comprises graphite, or metal coated with graphite. 
     
     
       9. The method as claimed in  claim 1 , wherein the back plate is made of a high hardness material. 
     
     
       10. The method as claimed in  claim 9 , wherein the material of the back plate comprises graphite, or metal coated with graphite. 
     
     
       11. The method as claimed in  claim 1 , wherein the front plate and the side plates are integrally formed. 
     
     
       12. The method as claimed in  claim 11 , wherein the front plate and the side plates are fixed on the back plate by locking or adhering. 
     
     
       13. The method as claimed in  claim 1 , wherein the step of the generating the ion beam is conducting a calibration mode of the ion implanter. 
     
     
       14. The method as claimed in  claim 1 , wherein the workpiece is an ion beam blocking device comprising a plurality of ion beam blocking components connected to an axle and rotating with the axle, each ion beam blocking component comprises:
 a front plate, having at least one opening; 
 a back plate, comprising a plurality of grooves serving as the particles attached regions formed on one surface of the back plate facing the front plate; and 
 a plurality of side plates, connected between the front plate and the back plate, wherein the receiving space is formed between the front plate, the back plate, and the side plates. 
 
     
     
       15. The method as claimed in  claim 14 , wherein the ion beam blocking components form a polyhedron structure around the axle. 
     
     
       16. The method as claimed in  claim 14 , wherein the ion beam blocking components are arranged in a roulette-shape structure with an axle. 
     
     
       17. The method as claimed in  claim 14 , further comprising when one of the ion beam blocking components cannot be used any longer, rotating another ion beam blocking component around the axle to block a bombard of the ion beam.