Coater with a large-area assembly of rotatable magnetrons

Abstract

This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly ( 2 ) where the material to be sputtered is located on a target ( 4 ) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies ( 2 ) with rotatable, curved targets ( 4 ) positioned one beside the other.

The invention claimed is: 
     
       1. A coater for coating large-area substrates by means of cathode sputtering, said coater comprising a coating chamber and, provided therein, more than three cathode assemblies ( 2 ) where a material to be sputtered is located on a target ( 4 ) that rotates during a coating process and has a curved surface, wherein the cathode assemblies ( 2 ) with rotatable, curved targets ( 4 ) are magnetrons with magnets ( 3 ) or magnet assemblies provided inside the target ( 4 ) and the target ( 4 ) rotates around the magnets ( 3 ) or magnet assemblies and means are provided for continuously rotating the targets around the magnets or magnet assemblies during the coating process, wherein the more than three cathode assemblies ( 2 ) with rotatable, curved targets ( 4 ) are positioned one beside the other with two outer cathode assemblies in a single coating chamber for a coherent coating zone at the substrate, wherein the cathode assemblies are positioned equidistant to each other with only the two outer cathode assemblies pushed nearer to adjacent cathode assemblies, providing even coating of static large-area substrates. 
     
     
       2. The coater of  claim 1 , wherein the cathode assemblies with rotatable, curved targets ( 4 ) are supported at one end in the region of an end face. 
     
     
       3. The coater of  claim 1  or  claim 2 , wherein the magnets ( 3 ) or magnet assemblies are rotatable or slewable. 
     
     
       4. The coater of  claim 3 , wherein the magnets ( 3 ) or magnet assemblies are adapted to oscillate about a position. 
     
     
       5. The coater of  claim 1  or  2 , wherein the magnets ( 3 ) of the magnet assemblies in the outer cathode assemblies are slewed or displaced in order to enlarge a magnetic field area ( 6 ). 
     
     
       6. The coater according to  claim 1  or  2 , wherein longitudinal axes of the cathode assemblies are parallel to each other. 
     
     
       7. The coater according to  claim 3 , wherein the magnets or magnet assemblies of the cathode assemblies are oriented radially towards the coating zone, the magnets or magnet assemblies being slewable about a position at defined speeds. 
     
     
       8. The coater according to one of  claim 1  or  2 , wherein additional magnets or magnet assemblies are provided on a side facing away from the coating zone whereby additional magnets or magnet assemblies prevent re-deposition by generating a plasma during the coating process. 
     
     
       9. The coater according to  claim 1 , wherein the coating zone is planar. 
     
     
       10. The coater according to  claim 1 , wherein the target is cylindrical and the material to be sputtered is located on a lateral surface of the target. 
     
     
       11. The coater according to  claim 3 , wherein said magnets or magnet assemblies are slewable or rotatable about a longitudinal axis of the cathode assemblies. 
     
     
       12. The coater according to  claim 8 , wherein said additional magnets or magnet assemblies are provided in a vicinity of an end faces of the cathode assemblies. 
     
     
       13. A method for coating static large-area substrates by means of cathode sputtering, said coater comprising a coating chamber and, provided therein, more than three cathode assemblies ( 2 ) where a single material to be sputtered is located on a target ( 4 ) that rotates during a coating process and has a curved surface, wherein the cathode assemblies ( 2 ) with rotatable, curved targets ( 4 ) are magnetrons with magnets ( 3 ) or magnet assemblies provided inside the target ( 4 ) and the target ( 4 ) rotates around the magnets ( 3 ) or magnet assemblies and means are provided for continuously rotating the targets around the magnets or magnet assemblies during the coating process, wherein during the coating process the more than three cathode assemblies ( 2 ) with rotatable, curved targets ( 4 ) are positioned one beside the other with two outer cathode assemblies in a single coating chamber for a coherent coating zone at the substrate, wherein the cathode assemblies are positioned equidistant to each other with only the two outer cathode assemblies pushed nearer to adjacent cathode assemblies, providing even coating of static large-area substrates. 
     
     
       14. The method according to  claim 13 , wherein the magnets ( 3 ) or magnet assemblies are rotated or slewed during coating. 
     
     
       15. The method according to  claim 14 , wherein the magnets ( 3 ) or magnet assemblies are oscillated about a position during coating.