US8193525B2ExpiredUtilityA1
Method for producing planar transporting resonance heterostructures
Est. expiryOct 12, 2024(expired)· nominal 20-yr term from priority
H10P 10/00H10D 62/8181H10D 62/53H10D 62/815H10D 8/755B82Y 10/00
31
PatentIndex Score
0
Cited by
28
References
20
Claims
Abstract
An electron transport device, including at least one transport layer in which at least one periodic dislocation and/or defect array is produced, and a mechanism for guiding electrons in the transport layer.
Claims
exact text as granted — not AI-modified1. An electron transport device, comprising:
at least one transport layer in which at least one periodic dislocation and/or defect array is produced,
wherein said transport layer includes at least one area extended in a first electron travel direction, in which the periodic array has a first period, and at least one second area extended in a second electron travel direction, different from said first electron travel direction, in which the periodic array has a second period, with the second period being different from said first period;
a first guiding device that guides electrons in a plane of said transport layer and in said first electron travel direction, said first guiding device including a first pair of pads in contact with said transport layer and means for applying voltages to said first pair of pads; and
a second guiding device that guides electrons in a plane of said transport layer and in said second electron travel direction, said second guiding device including a second pair of pads in contact with said transport layer and means for applying voltages to said second pair of pads.
2. A diode with negative differential resistance, comprising a device according to claim 1 .
3. A device for characterizing an electric and/or magnetic field, comprising a device according to claim 1 and means for detecting a variation in intensity of a current circulating in said transport layer or a voltage generated in said transport layer.
4. A device according to claim 1 , comprising at least one dislocation array, wherein at least some of dislocations are decorated by electrical charges and/or chemical species.
5. A device according to claim 1 , comprising at least one array of dislocations arranged in a square, in a rectangle or in a hexagon.
6. A device according to claim 1 , comprising at least one array of irradiation and/or implantation defects.
7. A device according to claim 1 , wherein the first guiding device and the second guiding device comprise an insulating layer on which said transport layer is placed.
8. A device according to claim 1 , further comprising means for applying and/or measuring an electrical and/or magnetic field in said transport layer.
9. A device according to claim 1 , further comprising at least one second transport layer with a dislocation and/or defect array.
10. A device according to claim 1 , wherein the transport layer is produced in the superficial layer of a SOI structure.
11. A method for producing an electron transport device, comprising:
forming at least one periodic dislocation and/or defect array in a transport layer, including bonding two crystalline materials;
forming guide means for guiding electrons in the plane of said transport layer;
forming at least one area extended in a first electron travel direction, in which the periodic array has a first period, and producing at least one second area extended in a second electron travel direction, different from the first electron travel direction, in which the periodic array has a second period, wherein the second period is different from the first period; and
forming electrical contacts on the transport layer, said electrical contacts being arranged to define the first electron travel direction and the second electron travel direction.
12. A method according to claim 11 , wherein the extended areas are produced by etching the transport layer.
13. A method according to claim 11 , further comprising forming at least one second transport layer, with a dislocation and/or defect array.
14. A method according to claim 11 , wherein the transport layer is produced in a superficial layer of a SOI structure.
15. A method according to claim 11 , wherein the array comprises at least one dislocation array, the method further comprising decorating at least some of dislocations with electrical charges and/or chemical species.
16. A method according to claim 11 , wherein the forming the array comprises irradiation and/or implantation.
17. A method according to claim 11 , further comprising forming means for electrical contact with said transport layer.
18. A method according to claim 11 , wherein the forming the guide means comprises forming an insulating layer or a relatively non-conductive layer on which said transport layer is placed.
19. A method according to claim 11 , wherein the forming the guide means comprises a thinning.
20. An electron transport device, comprising:
at least one transport layer in which at least one periodic dislocation and/or defect array is produced;
an insulating layer that guides electrons in a plane of said transport layer,
wherein said transport layer includes at least one area extended in a first electron travel direction, in which the periodic array has a first period, and at least one second area extended in a second electron travel direction, different from said first electron travel direction, in which the periodic array has a second period, with the second period being different from said first period; and
electrical contacts disposed on the transport layer, wherein the electrical contacts are arranged to define the first electron travel direction and the second electron travel direction.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.