Liquid crystal display device with a transparent material layer and a light-shielding layer of same height and method for fabricating the same

Abstract

An LCD device and a method for fabricating the same is described, in which each of light-shielding patterns has the uniform thickness to prevent the step coverage from being generated in color filter patterns by the light-shielding patterns. The LCD device includes a substrate with pixel and light shielding regions defined, a transparent material layer formed on the substrate corresponding to the pixel regions, a light-shielding layer formed on the substrate corresponding to the light shielding regions, and a color filter layer on the transparent material layer.

What is claimed is: 
     
       1. A method for fabricating an LCD device comprising:
 forming a transparent material layer on a substrate having pixel regions and light-shielding regions; 
 selectively removing the transparent material layer from the light-shielding regions; 
 forming a light-shielding layer on the substrate in the light-shielding regions from which the transparent material layer is removed; 
 forming color filter patterns on the transparent material layer; and 
 forming a common electrode over an entire surface of the substrate including the color filter patterns, wherein the common electrode is formed between the color filter patterns and on the color patterns, 
 wherein heights of the light-shielding layer and the transparent material layer are substantially equal, and 
 wherein a thickness of the common electrode varies only in a portion of the common electrode that is on and over the light shielding layer. 
 
     
     
       2. The method of  claim 1 , wherein the step of forming the light-shielding layer includes:
 coating a light-shielding material on an entire surface of the substrate including the transparent material layer; and 
 removing the coated light-shielding material from the portions other than the light-shielding region. 
 
     
     
       3. The method of  claim 2 , wherein the step of coating the light-shielding material includes using a spin coating method or a spinless coating method. 
     
     
       4. The method of  claim 2 , wherein the step of removing the coated light-shielding material from the portions other than the light-shielding region includes scratching the light-shielding material on the transparent material layer with a structure having a blade. 
     
     
       5. The method of  claim 4 , further comprising ashing the light-shielding material. 
     
     
       6. The method of  claim 5 , wherein the step of ashing is performed with an oxygen plasma or a light-irradiation lamp. 
     
     
       7. The method of  claim 1 , wherein the step of forming the color filter patterns includes using a spinless coating method. 
     
     
       8. The method of  claim 1 , wherein the transparent material layer is formed of an acrylic resin. 
     
     
       9. The method of  claim 1 , wherein the step of forming the color filter patterns includes overlapping the color filter patterns with predetermined portions of the light-shielding layer adjacent to the transparent material layer. 
     
     
       10. A method for fabricating an LCD device comprising:
 forming a transparent material layer on a first substrate having pixel regions and light-shielding regions; 
 selectively removing the transparent material layer from the light-shielding regions; 
 forming a light-shielding layer on the first substrate of the light-shielding regions from which the transparent material layer is removed; 
 forming color filter patterns on the transparent material layer; 
 forming a common electrode over an entire surface of the substrate including the color filter patterns, wherein the common electrode is formed between the color filter patterns and on the color filter patterns; 
 forming a thin film transistor array separated from the first substrate, the thin film transistor array including thin film transistors and pixel electrodes on a second substrate; and 
 forming a liquid crystal layer between the first and second substrates, 
 wherein heights of the light-shielding layer and the transparent material layer are substantially equal, and 
 wherein a thickness of the common electrode varies only in a portion of the common electrode that is on and over the light shielding layer. 
 
     
     
       11. The method of  claim 10 , wherein the step of forming the liquid crystal layer includes injecting the liquid crystal layer between the first and second substrates after bonding the first and second substrates to each other. 
     
     
       12. The method of  claim 10 , wherein the step of forming the liquid crystal layer includes bonding the first and second substrates to each other after dispensing liquid crystal on any one of the first and second substrates. 
     
     
       13. The method of  claim 1 , wherein the acrylic resin is any combination of acrylate, methacrylate, acrylamide, acrylonitrile, acrylic acid or methacyl. 
     
     
       14. The method of  claim 8 , wherein the acrylic resin is any combination of acrylate, methacrylate, acrylamide, acrylonytrile, acrylic acid or methacryl.