P
US8431333B2ExpiredUtilityPatentIndex 40

Method for removing an uncured photosensitive composition

Assignee: KANEDA MASATOPriority: Dec 16, 2003Filed: Sep 23, 2011Granted: Apr 30, 2013
Est. expiryDec 16, 2023(expired)· nominal 20-yr term from priority
Inventors:KANEDA MASATOMIKAWA YASUHIROSHIMIZU KOJITERAO KOUICHI
G03F 7/00G03F 7/16G03F 7/32G03F 7/325G03F 7/168G03F 7/0007
40
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References
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Claims

Abstract

A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further includes an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A method for removing an uncured photosensitive composition film containing a pigment remaining at the periphery, edges, or back of a substrate or an uncured photosensitive composition containing a pigment deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate or semiconductor wafer, comprising removing the uncured photosensitive composition film or uncured photosensitive composition with a photosensitive composition remover having a composition selected from the group consisting of
 a composition of 20 to 40 percent by mass of one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule and 60 to 80 percent by mass of one or more aprotic polar solvent(s) when the remover consists essentially of one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule and one or more aprotic polar solvent(s); 
 a composition of 10 to 20 percent by mass of one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule and 80 to 90 percent by mass of one or more other solvent(s) other than aprotic polar solvents, wherein the remover comprises 30 to 60 percent by mass of propylene glycol monomethyl ether, when the remover consists essentially of one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule and one or more other solvent(s) other than aprotic polar solvents; and 
 a composition of 20 to 30 percent by mass of one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule, 3 to 20 percent by mass of one or more aprotic polar solvent(s), and 55 to 70 percent by mass of one or more other solvent(s) other than aprotic polar solvents, the aprotic polar solvent(s) being at least one selected from the group consisting of N,N-dimethylformamide and N,N-dimethylacetamide, and the other solvent(s) other than aprotic polar solvents being at least one selected from the group consisting of propylene glycol monomethyl ether acetate, cyclohexanone, methyl 3-methoxypropionate and ethyl 3-ethoxypropionate, when the remover comprises one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule, one or more aprotic polar solvent(s), and one or more other solvent(s) other than aprotic polar solvents. 
 
     
     
       2. A method for removing an uncured photosensitive composition film containing a pigment remaining at the periphery, edges, or back of a substrate or an uncured photosensitive composition containing a pigment deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate or semiconductor wafer, comprising removing the uncured photosensitive composition film or uncured photosensitive composition with a photosensitive composition remover comprising 10 to 20 percent by mass of one or more aromatic hydrocarbon(s) having 9 carbon atoms or more within the molecule and 80 to 90 percent by mass of one or more other solvent(s) other than aprotic polar solvents, wherein the remover comprises 30 to 60 percent by mass of propylene glycol monomethyl ether. 
     
     
       3. A method as set forth in  claim 2 , wherein the other solvent other than aprotic polar solvents is at least one selected from the group consisting of glycol ethers, glycol ether carboxylates, carboxylic acid esters, hydroxycarboxylic acid esters, ketones, alcohols, alkoxycarboxylic acids esters, and cyclic ethers.

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