Printing substrate for liquid crystal display, and manufacturing method thereof

Abstract

The present invention relates to the implementation of minute patterns and thus improving pattern resolution and transcription property. Provided is a printing substrate for a liquid crystal display comprising a transparent insulating substrate, and a material layer for dry etching formed on an upper surface of the transparent insulating substrate, the material layer for dry etching constituting a printing pattern, and a manufacturing method of a printing substrate for a liquid crystal display comprising forming a material layer on a transparent insulating substrate, applying a photo resist along a printing pattern on the upper side of the material layer, dry-etching the material layer along the printing pattern using the photo resist as an etching mask, and striping the photo resist.

What is claimed is: 
     
       1. A manufacturing method of a printing substrate for a liquid crystal display comprising:
 depositing a material layer on an upper surface of a transparent insulating substrate, wherein the material layer is formed of at least one of a-Si, SiNx, and SiOx; 
 depositing a support layer of the same material and the same thickness as the material layer directly on a lower surface of the transparent insulating substrate in order to configure the transparent insulating substrate having the same material of the same thickness on both surfaces so as to reduce a bending of the transparent insulating substrate during a printing process; 
 applying a photo resist directly on the upper side of the material layer, without an intervening metal layer; 
 dry-etching the material layer to form a printing pattern using the photo resist as an etching mask; 
 stripping the photo resist; and 
 forming a transcription layer of a metal or metal oxide on the dry-etched material layer, 
 wherein the printing pattern is more than about 4 μm and less than about 10 μm in width. 
 
     
     
       2. The manufacturing method of the printing substrate for the liquid crystal display of  claim 1 , wherein the printing pattern is more than about 20 μm and less than about 30 μm in depth.