Exhaust apparatus, processing apparatus, and device manufacturing method

Abstract

An exhaust apparatus includes a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a regulator configured to regulate a temperature of the structural member. The structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other. The apparatus is configured such that the vacuum pump exhausts a gas via the through hole.

What is claimed is: 
     
       1. A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust apparatus for exhausting a gas from the vacuum vessel, the exhaust apparatus comprising:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust apparatus is configured such that the vacuum pump exhausts a gas via the through hole; 
 
 a heat-radiating member arranged in the vacuum vessel so as to be separated from and so as to face the second end face; and 
 a second regulator configured to regulate a temperature of the heat-radiating member. 
 
     
     
       2. The processing apparatus according to  claim 1 , wherein the through hole is a hollow circular cylinder, and
 wherein the structural member includes a bundle of the circular cylinders. 
 
     
     
       3. The processing apparatus according to  claim 1 , wherein the structural member has a flow path for a medium, and
 wherein the first regulator is configured to cause the medium whose temperature is regulated to flow via the flow path. 
 
     
     
       4. The processing apparatus according to  claim 1 , further comprising:
 a third regulator configured to regulate a temperature of the vacuum vessel, 
 wherein a portion of the vacuum vessel and the second end face are separated from each other and face each other. 
 
     
     
       5. A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 an exhaust apparatus connected to the exhaust vessel for exhausting a gas from the vacuum vessel, the exhaust apparatus comprising:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust apparatus is configured such that the vacuum pump exhausts a gas via the through hole; 
 
 a heat-radiating member arranged in the exhaust vessel so as to be separated from and so as to face the second end face; and 
 a fourth regulator configured to regulate a temperature of the heat-radiating member. 
 
     
     
       6. A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 an exhaust apparatus connected to the exhaust vessel for exhausting a gas from the vacuum vessel, the exhaust apparatus comprising:
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust apparatus is configured such that the vacuum pump exhausts a gas via the through hole; and 
 
 a fifth regulator configured to regulate a temperature of the exhaust vessel, 
 wherein a portion of the exhaust vessel and the second end face are separated from each other and face each other. 
 
     
     
       7. A method of manufacturing a device, the method comprising:
 exposing a substrate to radiant energy to transfer a pattern to the substrate using a processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the processing apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 an exhaust apparatus connected to the exhaust vessel for exhausting a gas from the vacuum vessel, the exhaust apparatus comprising: 
 a structural member; 
 a vacuum pump configured to exhaust a gas via the structural member; and 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other, and 
 wherein the exhaust apparatus is configured such that the vacuum pump exhausts a gas via the through hole; 
 a fifth regulator configured to regulate a temperature of the exhaust vessel, 
 wherein a portion of the exhaust vessel and the second end face are separated from each other and face each other; 
 a projection system arranged in the vacuum vessel and configured to project radiant energy onto the substrate, 
 wherein the processing apparatus is configured to transfer the pattern to the substrate by the projection system in the vacuum vessel; 
 
 developing the exposed substrate; and 
 processing the developed substrate to manufacture the device. 
 
     
     
       8. A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 a structural member; 
 a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel; 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction; 
 a heat-radiating member arranged in the exhaust vessel so as to be separated from and so as to face the structural member in the second direction; and 
 a second regulator configured to regulate a temperature of the heat-radiating member. 
 
     
     
       9. The processing apparatus according to  claim 8 , further comprising a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate,
 wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel. 
 
     
     
       10. A processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 a structural member; 
 a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel; 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction; and 
 a third regulator configured to regulate a temperature of the exhaust vessel, 
 wherein a portion of the exhaust vessel and the structural member are separated from each other and face each other in the second direction. 
 
     
     
       11. The processing apparatus according to  claim 10 , further comprising a projection system arranged in the vacuum vessel and configured to project radiant energy onto a substrate,
 wherein the processing apparatus is configured to transfer a pattern to the substrate by the projection system in the vacuum vessel. 
 
     
     
       12. A method of manufacturing a device, the method comprising:
 exposing a substrate to radiant energy to transfer a pattern to the substrate using a processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 a structural member; 
 a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel; 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction; 
 a heat-radiating member arranged in the exhaust vessel so as to be separated from and so as to face the structural member in the second direction; and 
 a second regulator configured to regulate a temperature of the heat-radiating member; 
 
 developing the exposed substrate; and 
 processing the developed substrate to manufacture the device. 
 
     
     
       13. A method of manufacturing a device, the method comprising:
 exposing a substrate to radiant energy to transfer a pattern to the substrate using a processing apparatus that includes a vacuum vessel and processes an object in the vacuum vessel, the apparatus comprising:
 an exhaust vessel connected to the vacuum vessel; 
 a structural member; 
 a vacuum pump configured to exhaust a gas from the exhaust vessel via the structural member, the vacuum pump being arranged so as to be oriented in a second direction that differs from a first direction that is an exhaust direction from the vacuum vessel to the exhaust vessel; 
 a first regulator configured to regulate a temperature of the structural member, 
 wherein the structural member is configured to absorb radiation heat from the vacuum pump along the first direction and to cause a particle to pass along the second direction; and 
 a third regulator configured to regulate a temperature of the exhaust vessel, 
 wherein a portion of the exhaust vessel and the structural member are separated from each other and face each other in the second direction; 
 
 developing the exposed substrate; and 
 processing the developed substrate to manufacture the device.