Coated glass article and method for manufacturing same

Abstract

A very protective coated glass article includes a glass substrate, a bond enhancing layer formed on the glass substrate and a boron carbide layer deposited on the bond enhancing layer. A method of manufacturing the coated glass article is provided.

What is claimed is: 
     
       1. A coated glass article, comprising:
 a glass substrate; 
 a bond enhancing layer formed on the glass substrate by magnetron sputtering, the bond enhancing layer having a thickness of about 10 nm to about 120 nm; 
 a boron carbide layer deposited on the bond enhancing layer; and wherein the bond enhancing layer includes a first bond enhancing layer and a second bond enhancing layer, a first surface of the first bond enhancing layer abuts against a first surface of the second bond enhancing layer, the opposite surface of the first bond enhancing layer abuts against the glass substrate, the opposite surface of the second bond enhancing layer abuts against the boron carbide layer, and the second bond enhancing layer is made of one material selected from a group consisting of nickel chromium, silver, aluminum and copper. 
 
     
     
       2. The coated glass article as claimed in  claim 1 , wherein the first bond enhancing layer is made of one material selected from a group consisting of silicon nitride, titanium nitride, titanium oxide, silicon oxide and zinc oxide. 
     
     
       3. The coated glass article as claimed in  claim 2 , wherein the boron carbide layer has a thickness of about 10 nm to about 60 nm. 
     
     
       4. The coated glass article as claimed in  claim 1 , wherein the boron carbide layer has a thickness of about 10 nm to about 60 nm. 
     
     
       5. The coated glass article as claimed in  claim 1 , wherein the boron carbide layer is deposited by magnetron sputtering. 
     
     
       6. A method for manufacturing the coated glass article of  claim 1 , comprising:
 providing a glass substrate; 
 depositing a bond enhancing layer on the glass substrate; and 
 depositing a boron carbide layer on the bond enhancing layer, wherein the boron carbide layer is deposited by magnetron sputtering process using boron as a target and acetylene gas as reaction gas. 
 
     
     
       7. The method of  claim 6 , wherein during depositing of the boron carbide layer on the bond enhancing layer, the substrate is retained in a sputtering coating chamber of a vacuum sputtering coating machine; the inside of the sputtering coating chamber is evacuated and heated to from about 100° C. to about 420° C.; acetylene gas is fed into sputtering coating chamber at a flow rate of about 60 sccm to about 125 sccm; the boron targets fixed in the sputtering coating chamber are evaporated at a power between about 1 kW to about 20 kW; the substrate is biased with a negative bias voltage of about −50 V to about −300 V; vacuum sputtering the tin layer takes about 10 min to about 60 min. 
     
     
       8. The method of  claim 6 , wherein the first bond enhancing layer made of one material selected from a group consisting of silicon nitride, titanium nitride, titanium oxide, silicon oxide and zinc oxide.