Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device
Abstract
Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar 1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R 2 s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A photosensitive resin composition comprising:
(Component A) an oxime sulfonate compound represented by Formula (1);
(Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and
(Component C) a solvent
wherein in Formula (1) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar 1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R 2 s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.
2. The photosensitive resin composition according to claim 1 , wherein Component B above further comprises a constituent unit derived from at least one compound selected from the group consisting of a styrene derivative, a maleimide derivative, (meth)acrylic acid, and a hydroxy group-containing (meth)acrylate compound.
3. The photosensitive resin composition according to claim 1 , wherein Component B above further comprises a constituent unit having a functional group that can react with a carboxyl group or a phenolic hydroxy group to form a covalent bond.
4. The photosensitive resin composition according to claim 1 , wherein the acid-decomposable group is a group represented by Formula (Ia), Formula (Ib), Formula (IIa), or Formula (IIb)
wherein in the Formulae R 3 denotes an alkyl group or a cycloalkyl group, R 4 denotes an alkyl group, R 3 and R 4 may form a ring, R 5 denotes a tertiary alkyl group, R 5′ denotes a tertiary alkyl group or a tert-butoxycarbonyl group, Ar 2 and Ar 3 independently denote a divalent aromatic group, and a wavy line portion denotes the position of bonding to another structure.
5. The photosensitive resin composition according to claim 1 , wherein Component A above is an oxime sulfonate compound represented by Formula (2), Formula (3), or Formula (4)
wherein in Formula (2) to Formula (4) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, each R 6 independently denotes a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group, or an alkoxysulfonyl group, X denotes O or S, n denotes 1 or 2, and m denotes an integer of 0 to 6, provided that of two or more R 2 s present in the compound, at least one is an alkyl group, an aryl group, or a halogen atom.
6. The photosensitive resin composition according to claim 1 , wherein Component A above is an oxime sulfonate compound represented by any one of Formulae (5) to (10) below
wherein in Formulae (5) to (10) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, R 2 denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, each R 6 independently denotes a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group, or an alkoxysulfonyl group, R 7 denotes an alkyl group, an aryl group, or a halogen atom, R 8 denotes a hydrogen atom or a methyl group, R 9 denotes a hydrogen atom, an alkyl group, or an aryl group, X denotes O or S, and m denotes an integer of 0 to 6, provided that in Formula (6), Formula (8), and Formula (10), not all of R 2 , R 8 , and R 9 are hydrogen atoms.
7. The photosensitive resin composition according to claim 1 , wherein Component A above is an oxime sulfonate compound represented by any one of Formulae (11) to (16) below
wherein in Formulae (11) to (16) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, R 8 denotes a hydrogen atom or a methyl group, R 10 denotes a hydrogen atom or a bromine atom, R 11 denotes an unsubstituted alkyl group having 1 to 8 carbons, a halogen atom, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group, R 12 denotes a hydrogen atom, a halogen atom, a methyl group, or a methoxy group, R 13 denotes an unsubstituted alkyl group having 1 to 8 carbons, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group, and X denotes O or S.
8. The photosensitive resin composition according to claim 1 , wherein Component A above is an oxime sulfonate compound represented by any one of Formulae (17) to (22) below
wherein in Formulae (17) to (22) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, R 8 denotes a hydrogen atom or a methyl group, R 10 denotes a hydrogen atom or a bromine atom, R 11 denotes an unsubstituted alkyl group having 1 to 8 carbons, a halogen atom, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group, R 12 denotes a hydrogen atom, a halogen atom, a methyl group, or a methoxy group, and R 13 denotes an unsubstituted alkyl group having 1 to 8 carbons, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group.
9. An oxime sulfonate compound represented by Formula (2), Formula (3), or Formula (4) below
wherein in Formula (2) to Formula (4) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, each R 6 independently denotes a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group, or an alkoxysulfonyl group, X denotes O or S, n denotes 1 or 2, and m denotes an integer of 0 to 6, provided that of two or more R 2 s present in the compound, at least one is an alkyl group, an aryl group, or a halogen atom.
10. The oxime sulfonate compound according to claim 9 , wherein it is represented by any one of Formulae (5) to (10) below
wherein in Formulae (5) to (10) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, R 2 denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, each R 6 independently denotes a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group, or an alkoxysulfonyl group, R 7 denotes an alkyl group, an aryl group, or a halogen atom, R 8 denotes a hydrogen atom or a methyl group, R 9 denotes a hydrogen atom, an alkyl group, or an aryl group, X denotes O or S, and m denotes an integer of 0 to 6, provided that in Formula (6), Formula (8), and Formula (10) not all of R 2 , R 8 , and R 9 are hydrogen atoms.
11. The oxime sulfonate compound according to claim 10 , wherein it is represented by any one of Formulae (11) to (16) below
wherein in Formulae (11) to (16) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, R 8 denotes a hydrogen atom or a methyl group, R 10 denotes a hydrogen atom or a bromine atom, R 11 denotes an unsubstituted alkyl group having 1 to 8 carbons, a halogen atom, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group, R 12 denotes a hydrogen atom, a halogen atom, a methyl group, or a methoxy group, R 13 denotes an unsubstituted alkyl group having 1 to 8 carbons, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group, and X denotes O or S.
12. The oxime sulfonate compound according to claim 11 , wherein it is represented by any one of Formulae (17) to (22) below
wherein in Formulae (17) to (22) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, R 8 denotes a hydrogen atom or a methyl group, R 10 denotes a hydrogen atom or a bromine atom, R 11 denotes an unsubstituted alkyl group having 1 to 8 carbons, a halogen atom, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group, R 12 denotes a hydrogen atom, a halogen atom, a methyl group, or a methoxy group, and R 13 denotes an unsubstituted alkyl group having 1 to 8 carbons, a chloromethyl group, a bromomethyl group, a bromoethyl group, a methoxymethyl group, a phenyl group, or a chlorophenyl group.
13. A photosensitive resin composition comprising:
(Component A′) an oxime sulfonate compound represented by Formula (1′);
(Component B′) a (meth)acrylic copolymer comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group, and
(Component C) a solvent
wherein in Formula (1′) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, Ar denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2.
14. The photosensitive resin composition according to claim 13 , wherein Component B′ above is a (meth)acrylic copolymer comprising a constituent unit having a carboxyl group that is protected by an acetal group.
15. The photosensitive resin composition according to claim 13 , wherein Component A′ above is an oxime sulfonate compound represented by Formula (2′), Formula (3′), or Formula (4′)
wherein in Formula (2′) to Formula (4′) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a halogen atom, an alkyl group, an alkyloxy group, a sulfonic acid group, an aminosulfonyl group, or an alkoxysulfonyl group, X denotes O or S, n denotes 1 or 2, and m denotes an integer of 0 to 6.
16. The photosensitive resin composition according to claim 13 , wherein Component B′ above further comprises a constituent unit having a functional group that can react with a carboxyl group to form a covalent bond.
17. A method for forming a cured film, the method comprising:
(1) an application step of applying the photosensitive resin composition according to claim 1 onto a substrate;
(2) a solvent removal step of removing the solvent from the photosensitive resin composition that has been applied;
(3) an exposure step of exposing to actinic radiation the photosensitive resin composition that has been applied;
(4) a development step of developing the exposed photosensitive resin composition by means of an aqueous developer; and
(5) a post-baking step of thermally curing the developed photosensitive resin composition.
18. A cured film formed by applying at least one of light and heat to the photosensitive resin composition according to any one of claim 1 .
19. The cured film according to claim 18 , wherein it is an interlayer insulating film.
20. An organic EL display device comprising the cured film according to claim 18 .
21. A liquid crystal display device comprising the cured film according to claim 18 .Cited by (0)
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