US8766145B2ActiveUtilityPatentIndex 46
Process for producing semiconductive porcelain composition and heater employing semiconductive porcelain composition
Est. expiryMar 19, 2028(~1.7 yrs left)· nominal 20-yr term from priority
H01C 7/025C04B 2235/663C04B 2235/3298C04B 35/46C04B 2235/5445C04B 2235/3208H01C 17/06533C04B 2235/6583C04B 2235/3227C04B 2235/3201C04B 2235/3418C04B 35/4682
46
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Claims
Abstract
To improve jump characteristic of BaTiO 3 —(Bi 1/2 Na 1/2 )TiO 3 material. There is provided a process for producing a semiconductive porcelain composition in which a part of Ba is substituted with Bi—Na, the process including a step of preparing a (BaQ)TiO 3 calcined powder (in which Q is a semiconductor dopant), a step of preparing a (BiNa)TiO 3 calcined powder, a step of mixing the (BaQ)TiO 3 calcined powder and the (BiNa)TiO 3 calcined powder, a step of molding and sintering the mixed calcined powder, and a step of heat-treating the obtained sintered body at 600° C. or lower; and a PCT heater employing the element prepared by the above steps.
Claims
exact text as granted — not AI-modifiedThe invention claimed is:
1. A process for producing a semiconductive porcelain composition provided with an electrode in which the semiconductive porcelain composition is a BaTiO 3 -based semiconductive porcelain composition free of Pb, in which a part of Ba of BaTiO 3 is substituted with Bi—Na, and having a positive temperature coefficient of resistance, the process comprising:
a step of preparing a (BaQ)TiO 3 calcined powder (wherein Q is a semiconductor dopant);
a step of preparing a (BiNa)TiO 3 calcined powder;
a step of mixing the (BaQ)TiO 3 calcined powder and the (BiNa)TiO 3 calcined powder;
a step of molding and sintering the mixed calcined powder;
a step of heat-treating said obtained sintered body at 600° C. or lower for 1 hour or more in an atmosphere containing oxygen or in the air; and
a step of forming the electrode to said obtained sintered body.
2. The process for producing a semiconductive porcelain composition according to claim 1 , wherein the step of forming the electrode to said obtained sintered body is conducted, and then the step of heat-treating said obtained sintered body is conducted.
3. The process for producing a semiconductive porcelain composition according to claim 1 , wherein sintering is conducted in the air, a reducing atmosphere or an inert gas atmosphere of low oxygen concentration at a sintering temperature of from 1,200° C. to 1,400° C.
4. The process for producing a semiconductive porcelain composition according to claim 2 , wherein sintering is conducted in the air, a reducing atmosphere or an inert gas atmosphere of low oxygen concentration at a sintering temperature of from 1,200° C. to 1,400° C.
5. A heater comprising a heating element comprising a semiconductive porcelain composition provided with an electrode, which is obtained by forming the electrode to the semiconductive porcelain composition obtained by the production process according to claim 1 .
6. A heater comprising a heating element comprising a semiconductive porcelain composition provided with an electrode, which is obtained by forming the electrode to the semiconductive porcelain composition obtained by the production process according to claim 2 .
7. A heater comprising a heating element comprising a semiconductive porcelain composition provided with an electrode, which is obtained by forming the electrode to the semiconductive porcelain composition obtained by the production process according to claim 3 .
8. A heater comprising a heating element comprising a semiconductive porcelain composition provided with an electrode, which is obtained by forming the electrode to the semiconductive porcelain composition obtained by the production process according to claim 4 .Cited by (0)
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