US8815989B2ActiveUtilityA1

Resin composition for coating material

49
Assignee: SAITO TAKAHIROPriority: Nov 13, 2009Filed: Nov 10, 2010Granted: Aug 26, 2014
Est. expiryNov 13, 2029(~3.3 yrs left)· nominal 20-yr term from priority
C09D 5/1625C08K 5/0008C09D 7/63C08K 5/3435C09D 5/1687C09D 5/1668C08L 83/04C09D 183/04C08G 77/18C08K 5/541G03F 7/0757G03F 7/0045
49
PatentIndex Score
0
Cited by
14
References
22
Claims

Abstract

The invention aims to provide a resin composition having favorable stain resistance and storage stability even in the form of a one-pack coating material. Provided is a resin composition for a coating material, including: (I) a synthetic resin emulsion; (II) a silicon compound represented by the formula (1): (R 1 O) 4-a SiR 2 a   (1) wherein R 1 s are the same or different and each represent an alkyl group having 1-10 carbon atoms, an aryl group having 6-10 carbon atoms, or an aralkyl group having 7-10 carbon atoms; R 2 s are the same or different and each represent an alkyl group having 1-10 carbon atoms, an aryl group having 6-10 carbon atoms, or an aralkyl group having 7-10 carbon atoms; and a represents an integer from 0 to 2; and/or a partial hydrolysis condensation product thereof and/or a modified product thereof; and (III) a photosensitizer.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. A resin composition for a water-based coating material, comprising:
 (I) a synthetic resin emulsion; 
 (II) a silicon compound represented by the formula (2):
   (R 3 O) 4 Si  (2)
 
 
 wherein R 3 s are the same or different and each represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms; 
 and/or a partial hydrolysis condensation product thereof and/or a modified product thereof; and 
 (III) a photosensitizer. 
 
     
     
       2. The resin composition for a water-based coating material according to  claim 1 , further comprising:
 (IV) a photoacid generator and/or (V) a photobase generator. 
 
     
     
       3. A resin composition for a water-based coating material, comprising:
 (I) a synthetic resin emulsion; 
 (II) a silicon compound represented by the formula (2):
   (R 3 O) 4 Si  (2)
 
 
 wherein R 3 s are the same or different and each represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms; 
 and/or a partial hydrolysis condensation product thereof and/or a modified product thereof; and 
 (IV) a photoacid generator and/or (V) a photobase generator. 
 
     
     
       4. The resin composition for a water-based coating material according to any one of  claims 1  to  2 ,
 wherein (II) the silicon compound and/or a partial hydrolysis condensation product thereof and/or a modified product thereof is dispersed in an aqueous medium using a nonionic surfactant and/or an anionic surfactant. 
 
     
     
       5. The resin composition for a water-based coating material according to  claim 4 ,
 wherein the surfactant used for an emulsion of (II) the silicon compound and/or a partial hydrolysis condensation product thereof and/or a modified product thereof is an alkali metal salt of an anionic surfactant. 
 
     
     
       6. The resin composition for a water-based coating material according to any one of  claims 1  to  2 ,
 wherein the synthetic resin emulsion is an acrylic resin emulsion including an alkoxysilyl group-containing monomer unit. 
 
     
     
       7. The resin composition for a water-based coating material according to any one of  claims 1  to  2 ,
 wherein a surfactant used for (I) the synthetic resin emulsion is an alkali metal salt of an anionic surfactant. 
 
     
     
       8. The resin composition for a water-based coating material according to  claim 1  or  2 ,
 wherein (III) the photosensitizer is at least one selected from the group consisting of anthracene derivatives, acetophenone derivatives, benzophenone derivatives, thioxanthone derivatives, and anthraquinone derivatives. 
 
     
     
       9. The resin composition for a water-based coating material according to  claim 8 ,
 wherein (III) the photosensitizer is a compound having a benzophenone skeleton and/or an anthracene skeleton. 
 
     
     
       10. The resin composition for a water-based coating material according to  claim 3  or  2 ,
 wherein (IV) the photoacid generator is an organic halogen compound. 
 
     
     
       11. The resin composition for a water-based coating material according to  claim 10 ,
 wherein (IV) the photoacid generator is a halogen-containing triazine compound, a vinylidene chloride copolymer, a vinyl chloride copolymer, or a chlorinated polyolefin. 
 
     
     
       12. The resin composition for a water-based coating material according to  claim 3  or  2 ,
 wherein (IV) the photoacid generator is a sulfonium salt or an iodonium salt. 
 
     
     
       13. The resin composition for a water-based coating material according to  claim 3  or  2 ,
 wherein (V) the photobase generator is at least one selected from the group consisting of cobalt amine complexes, O-acyloximes, carbamic acid derivatives, formamide derivatives, quaternary ammonium salts, tosylamines, carbamates, and amineimide compounds. 
 
     
     
       14. The resin composition for a water-based coating material according to  claim 13 ,
 wherein (V) the photobase generator is an O-acyloxime compound. 
 
     
     
       15. The resin composition for a water-based coating material according to  claim 14 ,
 wherein (V) the photobase generator is an O-acyloxime containing an aryl group represented by the formula (3): 
 
       
         
           
           
               
               
           
         
       
       wherein R 4 , R 5 , and R 6  are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, an aryl group having 1 to 10 carbon atoms, or an aralkyl group having 1 to 10 carbon atoms, and at least one of the R 4 , R 5 , and R 6  has an aryl group. 
     
     
       16. The resin composition for a water-based coating material according to any one of  claims 1  to  2 , further comprising
 (VI) an ultraviolet absorber, 
 wherein (VI) the ultraviolet absorber is a compound having at least one skeleton selected from the group consisting of a triazine skeleton, a benzophenone skeleton, a benzotriazole skeleton, a phenyl salicylate skeleton, and a phenyl benzoate skeleton. 
 
     
     
       17. The resin composition for a water-based coating material according to any one of  claims 1  to  2 , further comprising
 (VII) a hindered amine light stabilizer, 
 wherein (VII) the hindered amine light stabilizer is a compound containing a piperidine ring represented by the formula (4):
   —C(CH 3 ) 2 —N(OR′)—C(CH 3 ) 2 —  (4)
 
 
 
       wherein R′ represents an organic group having 1 to 20 carbon atoms. 
     
     
       18. The resin composition for a water-based coating material according to  claim 3  or  2 , further comprising
 (VIII) a compound capable of being activated by acid to promote hydrolysis and condensation of an alkoxysilyl group. 
 
     
     
       19. The resin composition for a water-based coating material according to  claim 18 ,
 wherein (VIII) the compound capable of being activated by acid to promote hydrolysis and condensation of an alkoxysilyl group is a salt of an acidic phosphate compound. 
 
     
     
       20. The resin composition for a water-based coating material according to any one of  claims 1  to  2 , further comprising
 (IX) an inorganic pigment. 
 
     
     
       21. A resin composition for a one-pack water-based coating material, comprising the resin composition for a water-based coating material according to any one of  claims 1  to  2 . 
     
     
       22. A coated article and a coat film obtained from the resin composition for a one-pack water-based coating material according to  claim 21 .

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