Organic light emitting diode display having improved strength by preventing the exfoliation of a sealant

Abstract

An organic light emitting diode (OLED) display. The OLED display includes a first substrate member, a first conductive wire having a contact region and formed over the first substrate member, an insulating layer including a plurality of wire contact holes exposing a part of the contact region of the first conductive wire and formed over the first conductive wire, a second conductive wire formed over the first conductive wire and connected to the first conductive wire through the plurality of wire contact holes of the insulating layer, a sealant formed over the second conductive wire, a sealing member formed over the sealant, and a fill-up layer disposed above or under the contact region of the first conductive wire.

What is claimed is: 
     
       1. An organic light emitting diode (OLED) display device, comprising:
 a first substrate member; 
 a first conductive wire having a contact region and formed over the first substrate member; 
 an insulating layer including a plurality of wire contact holes exposing a part of the contact region of the first conductive wire and formed over the first conductive wire; 
 a second conductive wire formed over the first conductive wire and connected to the first conductive wire through the plurality of wire contact holes of the insulating layer; 
 a sealant formed over the second conductive wire; 
 a sealing member formed over the sealant; and 
 a fill-up layer disposed over the first conductive wire, the sealant being comprised of frit and including one side that contacts the sealing member and another side that contacts a substantially flat structure. 
 
     
     
       2. The OLED display device of  claim 1 , wherein the insulating layer disposed over the contact region having the plurality of wire contact holes is thinner than an average thickness of the insulating layer. 
     
     
       3. The OLED display device of  claim 2 , wherein the first conductive wire is broken at regular intervals. 
     
     
       4. The OLED display device of  claim 3 , wherein the first conductive wire includes at least one metal of chromium (Cr), molybdenum (Mo), titanium (Ti), and tantalum (Ta). 
     
     
       5. The OLED display device of  claim 2 , wherein the first conductive wire and the second conductive wire are formed to be flat. 
     
     
       6. The OLED display device of  claim 1 , further comprising a thin film transistor, an organic light emitting diode, and a planarization layer disposed between the thin film transistor and the organic light emitting diode, wherein the fill-up layer is formed of the same material as that of the planarization layer through the same manufacturing process. 
     
     
       7. The OLED display device of  claim 1 , further comprising an organic light emitting diode having a first electrode, an organic emission layer formed over the first electrode, and a second electrode formed over the organic emission layer, wherein the fill-up layer is formed of the same material as that of the first electrode of the organic light emitting diode through the same manufacturing process. 
     
     
       8. The OLED display device of  claim 3 , comprised of the regular intervals of the first conductive wire terminating at one of a plurality of contact regions, the regular intervals being electrically connected to each other by a second conductive wire. 
     
     
       9. An organic light emitting diode (OLED) display device, comprising:
 a first substrate member; 
 a buffer layer arranged over the first substrate; 
 a first conductive wire having a contact region and arranged over the first substrate member; 
 an insulating layer including a plurality of wire contact holes exposing a part of the contact region of the first conductive wire and arranged over the first conductive wire; 
 a second conductive wire arranged over the first conductive wire and connected to the first conductive wire through the plurality of wire contact holes of the insulating layer; 
 a sealant arranged over the second conductive wire; 
 a sealing member arranged over the sealant; and 
 a fill-up layer arranged on the buffer layer and disposed over the first conductive wire, wherein the insulating layer disposed over the contact region having the plurality of wire contact holes has a first thickness t 1  that is greater than zero but less than a second thickness t 2  of the insulating layer external to the contact region, and wherein the fill-up layer is only within the contact region. 
 
     
     
       10. The OLED display device of  claim 9 , comprised of the first conductive wire and the second conductive wire being used for image quality test and an aging process during a fabrication of the OLED display and are not elements for driving the OLED display. 
     
     
       11. The OLED display device of  claim 9 , comprised of the fill-up layer being arranged between the second conductive wire and the sealant. 
     
     
       12. The OLED display device of  claim 11 , comprised of the fill-up layer being comprised of a material selected from a group consisting of a polyacrylate resin, an epoxy resins, a phenolic resin, a polyamide resin, a polyimide resin, an unsaturated polyesters resin, a polyphenylenether resin, a polyphenylenesulfide resin, and benzocyclobutene (BCB). 
     
     
       13. The OLED display device of  claim 11 , comprised of the fill-up layer being comprised of a material selected from a group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), or indium oxide (In 2 O 3 ), lithium (Li), calcium (Ca), lithium/calcium fluoride (LiF/Ca), lithium/aluminum fluoride (LiF/Al), aluminum (Al), silver (Ag), magnesium (Mg) and gold (Au). 
     
     
       14. The OLED display device of  claim 1 , comprised of the sealant being comprised of frit and including one side that contacts the sealing member and another side that contacts a substantially flat structure caused by the fill-up layer canceling out the step difference of the insulating layer.