Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same

Abstract

Disclosed is a colored photosensitive resin composition for a color filter of a solid state imaging device using an ultra-short wavelength exposing device of 300 nm or less, a color filter and a solid state imaging device including the same. The colored photosensitive resin composition can fabricate a color filter having a micro-patterned colored pattern. The color filter can be advantageously applied to a solid state imaging device.

What is claimed is: 
     
       1. A method for fabricating a color filter for a solid state imaging device using an ultra-short wavelength exposing device, the method comprising:
 forming a coating film by coating a colored photosensitive resin composition for each of various colors on a substrate, the colored photosensitive resin composition including:
 a colorant, 
 a binder resin having an acid value between 20 and 200 mg KOH/g, 
 a photopolymerizable compound, and 
 a photoinitiator reacting at a wavelength of 300 nm or less, and 
 a solvent selected from the group consisting of ethylene glycol monoalkyl ethers, ethylene glycolalkyletheracetates, diethylene glycodialkyl ethers, alkylene glycolalkyletheracetates, aromatic hydrocarbons, ketones alcohols, cyclic esters, and combinations thereof; 
 
 exposing to light through a mask by irradiating ultra-short wavelength laser into a potential color pattern area of the coating film by an ultra-short wavelength KrF scanner having a wavelength of 248 nm; and 
 conducting a development on the coating film by removing an unexposed coating area that is not exposed to laser in the exposing step to form a colored pattern. 
 
     
     
       2. The method of  claim 1 , wherein the forming of the coating film comprises forming the coating film by coating the colored photosensitive resin composition to a thickness ranging from 0.5 μm to 1.0 μm. 
     
     
       3. The method of  claim 1 , wherein in the exposing, an exposure energy dose is 200 mJ/cm 2  or less. 
     
     
       4. A method for fabricating a color filter for a solid state imaging device using an ultra-short wavelength exposing device, the method comprising:
 forming a coating film by coating a colored photosensitive resin composition for each of various colors on a substrate, the colored photosensitive resin composition including:
 a colorant, 
 a binder resin having an acid value between 20 and 200 mg KOH/g, 
 a photopolymerizable compound, 
 a photoinitiator reacting at a wavelength of 300 nm or less, and 
 a solvent added in an amount of 50 wt % to 90 wt % a complete mass of the colored photosensitive resin composition, wherein the solvent is selected from the group consisting of ethylene glycol monoalkyl ethers, ethylene glycolalkyletheracetates, diethylene glycodialkyl ethers, alkylene glycolalkyletheracetates, aromatic hydrocarbons, ketones alcohols, cyclic esters, and combinations thereof; 
 
 exposing to light through a mask by irradiating ultra-short wavelength laser into a potential color pattern area of the coating film by an ultra-short wavelength KrF scanner having a wavelength of 248 nm; and 
 conducting a development on the coating film by removing an unexposed coating area that is not exposed to laser in the exposing step to form a colored pattern. 
 
     
     
       5. The method of  claim 4 , wherein the photoinitiator is an oxime ester photoinitiator. 
     
     
       6. The method of  claim 4 , wherein the photoinitiator is other than an oxime ester photoinitiator.