US9087760B2ActiveUtilityPatentIndex 62
Semiconductor device and method of manufacturing the same, and electronic apparatus
Est. expiryDec 25, 2029(~3.5 yrs left)· nominal 20-yr term from priority
H10W 20/0265H10W 20/0253H10W 20/0242H10W 20/0234H10W 99/00H10W 90/792H10W 90/22H10W 80/327H10W 80/00H10W 72/07551H10W 72/5525H10W 72/50H10W 70/093H10W 42/20H10W 20/023H10W 20/20H04N 25/76H10F 39/018H10F 39/026H10F 39/199H10F 39/812H10F 39/809H10F 39/802H10F 39/811H10F 77/93H10F 39/1825H04N 5/374H01L 23/481H01L 27/14687H01L 2224/45147H01L 2924/01047H01L 2924/3011H01L 27/1464H01L 27/1469H01L 21/76898H01L 2224/48H01L 27/14647H01L 27/14634H01L 2924/01015H01L 27/14638H01L 31/02002H01L 2924/00H01L 27/14636H01L 2924/00014H01L 23/552H01L 27/14603
62
PatentIndex Score
1
Cited by
15
References
22
Claims
Abstract
A semiconductor device comprising a first semiconductor section including a first wiring layer at one side thereof, a second semiconductor section including a second wiring layer at one side thereof, the first and second semiconductor sections being secured together with the respective first and second wiring layer sides of the first and second semiconductor sections facing each other, a conductive material extending through the first semiconductor section to the second wiring layer of the second semiconductor section and by means of which the first and second wiring layers are in electrical communication.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A semiconductor device, comprising:
a first semiconductor section including at least one first wiring layer;
a second semiconductor section including at least one second wiring layer, the first and second semiconductor sections being secured together;
a plurality of first conductive materials that extend through a device layer of the first semiconductor section to a connection point in the first wiring layer of the first semiconductor section, and a plurality of second conductive materials that extend through the first semiconductor section to a connection point in the second wiring layer of the second semiconductor section, wherein the first and second conductive materials are each arranged alternately in both of a first direction and a second direction across the first semiconductor substrate, the first and second directions being orthogonal to each other.
2. The semiconductor device of claim 1 , wherein the first and second semiconductor sections are secured together with the respective first and second wiring layer sides of the first and second semiconductor sections facing each other.
3. The semiconductor device of claim 1 , wherein the first semiconductor section and the second semiconductor section are secured by plasma bonding.
4. The semiconductor device of claim 1 , wherein the first semiconductor section and the second semiconductor section are secured by an adhesive.
5. The semiconductor device of claim 1 , wherein the first semiconductor section includes a pixel array.
6. The semiconductor device of claim 5 , wherein the second semiconductor section includes a logic circuit.
7. The semiconductor device of claim 6 , wherein the pixel array and the logic circuit are electrically connected to one another.
8. The semiconductor device of claim 7 , wherein the first conductive materials connect an uppermost first wiring layer of the first semiconductor section and an uppermost second wiring layer of the second semiconductor section.
9. The semiconductor device according to claim 8 , wherein a surface of the first conductive materials or the second conductive materials is connected by a trench on the first semiconductor section.
10. The semiconductor device according to claim 9 , further comprising a pad connected to the first conductive material and the second conductive material.
11. The semiconductor device according to claim 10 , wherein the pad is exposed at an upper side of the first semiconductor section.
12. The semiconductor device according to claim 9 , wherein the trench is a Cu filled trench.
13. The semiconductor device according to claim 1 ,
the first wiring layer includes Cu,
the second wiring layer includes Cu.
14. The semiconductor device according to claim 1 , further comprising an insulating layer covering at least part of the first wiring layer or the second wiring layer.
15. The semiconductor device according to claim 14 , wherein the insulating layer is SiO.
16. The semiconductor device of claim 1 , wherein the first conductive material and the second conductive material includes one of W, Al, and Au.
17. The semiconductor device of claim 7 , wherein the pixel array includes a photodiode and a plurality of pixel transistors.
18. The semiconductor device of claim 7 , wherein the logic circuit includes a control circuit.
19. The semiconductor device of claim 1 , wherein the first conductive material and the second conductive material have substantively a same diameter.
20. The semiconductor device of claim 1 , wherein the first semiconductor section has a thickness smaller than that of the second semiconductor section.
21. A semiconductor device, comprising:
a first semiconductor section including at least a first wiring layer, wherein the first semiconductor section includes a pixel array;
a second semiconductor section including at least a second wiring layer, wherein the first and second semiconductor sections are secured to one another;
a plurality of connection wirings, wherein each connection wiring in the plurality of connection wirings includes a first connection conductor interconnected to a connection pad included in the first wiring layer, a second connection conductor interconnected to a connection pad included in the second wiring layer, and a link conductor interconnecting the first and second connection conductors, and
wherein the first connection conductors and the second connection conductors of the plurality of connection wirings are alternately arranged in horizontal and vertical directions of the pixel array.
22. A semiconductor device, comprising:
a first semiconductor section including a first wiring layer;
a second semiconductor section including a second wiring layer, the first and second semiconductor sections being secured together;
a plurality of first conductive materials that extend through a device layer of the first semiconductor section to a connection point in the first wiring layer of the first semiconductor section, and a plurality of second conductive materials that extend through the first semiconductor section to a connection point in the second wiring layer of the second semiconductor section, and a pad connected to at least the first conductive materials and at least the second conductive materials, wherein the first and second conductive materials are each arranged alternately in both of a first direction and a second direction across the first semiconductor substrate, the first and second directions being orthogonal to each other.Cited by (0)
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