Deposition source and deposition apparatus including the same

Abstract

A deposition source including: a dopant vaporization source; a first host vaporization source including a first vaporization source unit on a side of the dopant vaporization source and a second vaporization source unit on another side of the dopant vaporization source; and a second host vaporization source including a third vaporization source unit on the side of the dopant vaporization source and arranged in parallel with the first vaporization source unit, and a fourth vaporization source unit on the another side of the dopant vaporization source and arranged in parallel with the second vaporization source unit.

What is claimed is: 
     
       1. A method for manufacturing an organic light emitting display (OLED), the method including depositing materials on a substrate using a deposition source, the deposition source comprising:
 a dopant vaporization source; 
 a first host vaporization source comprising a first crucible of a first vaporization source unit on a side of the dopant vaporization source and a second crucible of a second vaporization source unit on another side of the dopant vaporization source; wherein the first vaporization source unit and the second vaporization source unit comprise linear vaporization sources; 
 wherein each of the first vaporization source unit and the second vaporization source unit each comprises a plurality of nozzles next to each other arranged in a same direction as a direction in which the first vaporization source unit and the second vaporization source unit are arranged; and 
 a second host vaporization source comprising, a third vaporization source unit on the side of the dopant vaporization source and arranged in parallel with the first vaporization source unit, and a fourth vaporization source unit on the another side of the dopant vaporization source and arranged in parallel with the second vaporization source unit. 
 
     
     
       2. The method of  claim 1 , wherein the dopant vaporization source comprises a linear vaporization source. 
     
     
       3. The method of  claim 2 , wherein a direction in which a plurality of nozzles of the linear vaporization source of the dopant vaporization source are arranged and a direction in which the first vaporization source unit and the second vaporization source unit are arranged cross each other. 
     
     
       4. The method of  claim 3 , wherein the direction in which the plurality of nozzles of the linear vaporization source of the dopant vaporization source are arranged and the direction in which the first vaporization source unit and the second vaporization source unit are arranged are perpendicular to each other. 
     
     
       5. The method of  claim 1 , wherein the dopant vaporization source comprises a point source. 
     
     
       6. The method of  claim 1 , wherein the dopant vaporization source comprises:
 a first point source between the first vaporization source unit and the second vaporization source unit; and 
 a second point source between the third vaporization source unit and the fourth vaporization source unit. 
 
     
     
       7. The method of  claim 1 , wherein the first vaporization source unit and the second vaporization source unit are symmetrical to each other with respect to the dopant vaporization source. 
     
     
       8. The method of  claim 1 , wherein the third vaporization source unit and the fourth vaporization source unit are symmetrical to each other with respect to the dopant vaporization source. 
     
     
       9. The of  claim 1 , wherein each of the third vaporization source unit and the fourth vaporization source unit comprises a plurality of nozzles arranged in a same direction as a direction in which the third vaporization source unit and the fourth vaporization source unit are arranged. 
     
     
       10. The method of  claim 1 , wherein a direction in which the first vaporization source unit and the second vaporization source unit are arranged and a direction in which the third vaporization source unit and the fourth vaporization source unit are arranged are parallel to each other. 
     
     
       11. The method of  claim 1 , wherein the first vaporization source unit and the second vaporization source unit have a same size and shape. 
     
     
       12. The method of  claim 1 , wherein the third vaporization source unit and the fourth vaporization source unit have a same size and shape. 
     
     
       13. The method of  claim 1 , wherein the first host vaporization source further comprises a first heating unit surrounding the first crucible of the first vaporization source unit and the second crucible of the second vaporization source unit, the first heating unit being configured to heat the first crucible and the second crucible. 
     
     
       14. The method of  claim 13 , wherein the second host vaporization source further comprises a second heating unit surrounding a third crucible of the third vaporization source unit and a fourth crucible of the fourth vaporization source unit, the second heating unit being configured to heat the third crucible and the fourth crucible. 
     
     
       15. The method of  claim 1 , wherein the first host vaporization source further comprises a first heating unit surrounding the first crucible of the first vaporization source unit and being configured to heat the first crucible, and a second heating unit surrounding the second crucible of the second vaporization source unit and being configured to heat the second crucible. 
     
     
       16. The method of  claim 15 , wherein the second host vaporization source further comprises a third heating unit surrounding a third crucible of the third vaporization source unit and being configured to heat the third crucible, and a fourth heating unit surrounding a fourth crucible of the fourth vaporization source unit and being configured to heat the fourth crucible.