Light emitting device and method of fabricating the same
Abstract
A light-emitting device according to an exemplary embodiment of the present invention includes a first conductivity-type semiconductor layer disposed on a substrate; an active layer disposed on the first conductivity-type semiconductor layer; a second conductivity-type semiconductor layer disposed on the active layer; and an irregular convex-concave pattern disposed on a surface of the first conductivity-type semiconductor layer. The irregular convex-concave pattern includes convex portions and concave portions, and the convex portions have irregular heights and the concave portions have irregular depths. The first conductivity-type semiconductor layer including the irregular convex-concave pattern is exposed from the active layer and the second conductivity-type semiconductor layer.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A light-emitting device, comprising:
a first conductivity-type semiconductor layer disposed on a substrate;
an active layer disposed on the first conductivity-type semiconductor layer;
a second conductivity-type semiconductor layer disposed on the active layer;
an irregular convex-concave pattern disposed on a surface of the first conductivity-type semiconductor layer; and
a first electrode pad,
wherein the irregular convex-concave pattern comprises convex portions and concave portions, the convex portions comprising irregular heights, the concave portions comprising irregular depths,
wherein the first conductivity-type semiconductor layer comprising the irregular convex-concave pattern is exposed from the active layer and the second conductivity-type semiconductor layer,
wherein the irregular convex-concave pattern is disposed between the first electrode pad and the second conductivity-type semiconductor layer,
wherein the first conductivity-type semiconductor layer comprises first, second, and third N-GaN layers, the first and third N-GaN layers being doped with a higher density of n-type impurities than the second N-GaN layer, and
wherein a first part of the concave portions of the irregular convex-concave pattern extend to a portion of the second N-GaN layer or over an entire region of the second N-GaN layer, or extend to an upper region of the first N-GaN layer.
2. The light-emitting device of claim 1 , wherein the third N-GaN layer is in ohmic contact with the first electrode pad, and the irregular convex-concave pattern is disposed on the third N-GaN layer.
3. The light-emitting device of claim 1 , wherein the irregular convex-concave pattern is disposed below the active layer.
4. The light-emitting device of claim 1 , further comprising:
a first electrode pad disposed on the exposed surface of the first conductivity-type semiconductor layer; and
first electrode legs extending from the first electrode pad,
wherein the irregular convex-concave pattern is disposed under the first electrode pad and under the first electrode legs.
5. The light-emitting device of claim 1 , further comprising:
a first electrode pad disposed on the exposed surface of the first conductivity-type semiconductor layer,
wherein an upper portion of the first conductivity-type semiconductor layer contacting the first electrode pad comprises a flat surface.
6. The light-emitting device of claim 5 , wherein each of the convex portions of the irregular convex-concave pattern comprises a first end disposed coplanar with the flat surface or below the flat surface.
7. The light-emitting device of claim 5 , wherein each of the convex portions of the irregular convex-concave pattern comprises a first end disposed coplanar with the flat surface or above the flat surface.
8. The light-emitting device of claim 5 , further comprising:
a second electrode pad disposed on the second conductivity-type semiconductor layer; and
a transparent conductive layer disposed between the second conductivity-type semiconductor layer and the second electrode pad,
wherein a lateral distance between the first electrode pad and the transparent conductive layer is in a range from 5 μm to 50 μm.
9. The light-emitting device of claim 5 , further comprising:
first electrode legs extending from the first electrode pad;
a second electrode pad disposed on the second conductivity-type semiconductor layer; and
second electrode legs extending from the second electrode pad and alternating with the first electrode legs to be disposed parallel to the first electrode legs,
wherein the irregular convex-concave pattern comprises a first irregular convex-concave pattern overlapping the first electrode legs to be disposed parallel thereto, a second irregular convex-concave pattern extending from the first irregular convex-concave pattern towards the second electrode legs, and a third irregular convex-concave pattern disposed in an edge region of the light-emitting device.
10. The light-emitting device according to claim 5 , further comprising:
a second electrode pad disposed on the second conductivity-type semiconductor layer, the first and second electrode pads comprising a dome structure.
11. The light-emitting device of claim 1 , wherein the first conductivity-type semiconductor layer is exposed along an edge region of the light-emitting device, and the irregular convex-concave pattern is disposed on the exposed surface of the first conductivity-type semiconductor layer along the edge region.
12. The light-emitting device of claim 11 , wherein the edge region comprises a corner region and a lateral region, the corner region comprising a greater width than the lateral region.
13. The light-emitting device of claim 1 , wherein the irregular convex-concave pattern in the first conductivity-type semiconductor layer comprises a height lower than that of the first conductivity-type semiconductor layer under the irregular convex-concave pattern.
14. The light-emitting device of claim 1 , wherein the irregular convex-concave pattern comprises a height in a range from 160 nm to 3 μm.Cited by (0)
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