US9280062B2ActiveUtilityA1

Exposure device

54
Assignee: LEE DUKPriority: Nov 4, 2010Filed: Nov 4, 2011Granted: Mar 8, 2016
Est. expiryNov 4, 2030(~4.3 yrs left)· nominal 20-yr term from priority
G03F 7/70208H05K 2201/09936G03F 7/70191G03F 7/70291H05K 1/0269G03F 7/7045H05K 2201/09918G03F 7/203G03F 7/70541H10P 76/204
54
PatentIndex Score
1
Cited by
10
References
23
Claims

Abstract

An exposure device can exposes a circuit pattern while information data is suitably changed. An exposure device comprises a first light source ( 20 ) for irradiating a first light including ultraviolet rays, a projection exposure unit ( 70 ) for exposing a circuit pattern drawn on a photomask on a substrate, with the first light, a substrate stage ( 60 ) for mounting the substrate, a housing ( 11 ) for arranging the substrate stage, a second light source ( 41 ) for irradiating a second light including ultraviolet rays, arranged at a position different from the first light source, a spatial light modulation unit ( 40 ) for exposing information data formed electrically using the second light on the substrate, and a spatial optical light modulation unit driving means ( 5 ) for moving the spatial light modulation unit arranged on the housing ( 11 ) in a direction parallel to a moving direction of the substrate stage.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. An exposure device comprising:
 a first light source for irradiating first light including ultraviolet rays; 
 a projection exposure unit for exposing a predetermined circuit pattern drawn on a photomask on a substrate using said first light; 
 a substrate stage for mounting said substrate; 
 a housing for mounting and arranging said substrate stage; 
 a stage drive part for moving said substrate stage with respect to said projection exposure unit; 
 a second light source for irradiating second light including ultraviolet rays, arranged at the position different from said first light source; 
 a spatial light modulation unit for exposing electrically formed information data on said substrate using said second light; and 
 a spatial light modulation unit driving means provided at either one of said substrate stage and said housing, for moving said spatial light modulation unit in a direction parallel to a moving direction of said substrate stage. 
 
     
     
       2. An exposure device according to  claim 1 , wherein while said projection exposure unit is exposing said predetermined circuit pattern, said spatial light modulation unit driving means moves said spatial light modulation unit and said light modulation unit exposes said information data. 
     
     
       3. An exposure device according to  claim 1 , wherein while said substrate stage is moving, said spatial light modulation unit driving means moves said spatial light modulation unit and said spatial light modulation unit exposes said information data. 
     
     
       4. An exposure device according to  claim 1 , wherein in a synchronism with the exposure of said projection exposure unit and movement of said substrate stage, said spatial light modulation unit driving means moves said spatial light modulation unit and said spatial optical modulation unit exposes said information data. 
     
     
       5. An exposure device according to  claim 2 , wherein said spatial light modulation unit driving means moves said spatial light modulation unit at the region not adjacent to the exposure region of said projection exposure unit. 
     
     
       6. An exposure device according to  claim 1 , wherein said spatial light modulation unit comprises a reaction suppressing means for suppressing a reaction due to acceleration or deceleration generated by the movement with said spatial light modulation unit driving means. 
     
     
       7. An exposure device according to  claim 6 , wherein said reaction suppressing means comprise a counter mass of a predetermined weight and a memory for pre-storing the moving direction and the acceleration and deceleration speed of said counter mass so as to suppress the reaction with respect to the acceleration and deceleration speed and the moving direction of said spatial light modulation unit. 
     
     
       8. An exposure device according to  claim 6 , said reaction suppressing means is mounted on said spatial light modulation unit. 
     
     
       9. An exposure device according to  claim 1 , wherein said spatial light modulation unit driving means moves said spatial light modulation unit in the X-axis direction and in the Y-axis direction by an X-axis drive device and a Y-axis drive device, respectively, for moving said spatial light modulation unit in a direction substantially parallel to a side of said substrate. 
     
     
       10. An exposure device for exposing a predetermined circuit pattern drawn on a photomask on a substrate on which photosensitive material is applied using light including ultraviolet rays; said exposure device comprising:
 a projection exposure unit for exposing said circuit pattern of said photomask with light including ultraviolet rays from a first light source; 
 a substrate stage mounting said substrate and movable with respect to said projection exposure unit; 
 a stage drive part for moving said substrate stage; 
 a spatial light modulation unit for exposing electrically formed information data on said substrate with light including ultraviolet rays from a second light source; and 
 a spatial light modulation unit drive part for moving said spatial light modulation unit in a direction substantially parallel to a side of said substrate; 
 said first light source and said second light source being mercury discharge lamps; 
 an amount of a given volume of mercury sealed in a discharge container of said second light source being larger than that of said first light source. 
 
     
     
       11. An exposure device for exposing a predetermined circuit pattern drawn on a photomask on a substrate on which photosensitive material is applied using light including ultraviolet rays, said exposure device comprising:
 a projection exposure unit for exposing said circuit pattern of said photomask with light including ultraviolet rays from a first light source; 
 a substrate stage mounting said substrate and movable with respect to said projection exposure unit; 
 a stage drive part for moving said substrate stage; 
 a spatial light modulation unit for exposing electrically formed information data on said substrate with light including ultraviolet rays from a second light source; and 
 a spatial light modulation unit drive part for moving said spatial light modulation unit in a direction substantially parallel to a side of said substrate; 
 said projection exposure unit comprising a magnification means for changing magnification of said circuit pattern; 
 said spatial light modulation unit correcting said information data electrically corresponding to said magnification means. 
 
     
     
       12. An exposure device according to  claim 11 , wherein said first light source is served as said second light source. 
     
     
       13. An exposure device according to  claim 11 , wherein said spatial light modulation unit rewrites said information data every time said circuit pattern is exposed on said substrate. 
     
     
       14. An exposure device according to  claim 11 , wherein said information data includes at least one of character information, graphic information and test coupon information. 
     
     
       15. An exposure device according to  claim 11 , wherein a region that said spatial light modulation unit exposes said information data is adjacent to a region that said projection exposure unit exposes the circuit pattern. 
     
     
       16. An exposure device according to  claim 11 , wherein when said projection exposure unit exposes said circuit pattern, said spatial light modulation unit drive part stops said spatial light modulation unit, and
 when said spatial light modulation unit exposes said information data, said spatial light modulation unit drive part moves said spatial light modulation unit and said stage drive part stops said substrate stage. 
 
     
     
       17. An exposure device for exposing a predetermined circuit pattern drawn on a photomask on a substrate on which a photoresist material is applied, with light including ultraviolet rays, said exposure device comprising:
 a projection exposure unit for exposing said circuit pattern of said photomask on a first surface of said substrate, with light including ultraviolet rays; 
 a spatial light modulation unit for exposing electrically formed information data on the first surface and a second surface opposite to said first surface, with light including ultraviolet rays; 
 a substrate stage for mounting said substrate, movable with respect to said projection exposure unit or said spatial light modulation unit; and 
 a stage drive part for moving said substrate stage; 
 said substrate stage including a transparent plate made of optical glass, synthetic silica, fluoride magnesium, fluoride calcium, polycarbonate, or acryl; 
 said transparent plate including an adhesive part for adhering said substrate; 
 one that is arranged below said substrate stage among said projection exposure unit and said spatial light modulation unit, including a compensation optical system for compensating an optical path length and a spherical aberration; 
 said exposure device further comprising an optical drive part for moving said compensation optical system in an optical axis depending on the thickness of said transparent plate or a kind of said transparent plate. 
 
     
     
       18. An exposure device according to  claim 17 , wherein said information data includes at least one of character information, graphic information and test coupon information. 
     
     
       19. An exposure device according to  claim 17 , wherein either one of said projection exposure unit and said spatial light modulation unit is arranged above said substrate stage, and the other one is arranged below said substrate stage. 
     
     
       20. An exposure device according to  claim 17 , further comprising a spatial light modulation unit drive device for moving said spatial light modulation unit in a direction substantially parallel to a side of said substrate; wherein
 when said projection exposure unit exposes said circuit pattern, said spatial light modulation unit drive device moves said spatial light modulation unit and said stage drive part stops said substrate stage. 
 
     
     
       21. An exposure device according to  claim 17 , further comprising a spatial light modulation unit drive device for moving said spatial light modulation unit in a direction substantially parallel to a side of said substrate; wherein
 when said spatial light modulation unit exposes said information data, said stage drive part moves said substrate stage and said spatial light modulation unit drive device stops said spatial light modulation unit. 
 
     
     
       22. An exposure device for exposing a predetermined circuit pattern drawn on a photomask on a substrate on which a photoresist material is applied, with light including ultraviolet rays; said exposure device comprising:
 a projection exposure unit for exposing said circuit pattern of said photomask on a first surface of said substrate, with light including ultraviolet rays; 
 a spatial light modulation unit for exposing electrically formed information data on the first surface and a second surface opposite to said first surface, with light including ultraviolet rays; 
 a substrate stage for mounting said substrate, movable with respect to said projection exposure unit or said spatial light modulation unit; and 
 a stage drive part for moving said substrate stage; 
 said substrate stage including a transparent plate made of optical glass, synthetic silica, fluoride magnesium, fluoride calcium, polycarbonate, or acryl; 
 said transparent plate including an adhesive part for adhering said substrate; 
 one that is arranged below said substrate stage among said projection exposure unit and said spatial light modulation unit, including an optical system for compensating a spherical aberration with respect to said transparent plate, so that a light passes through said transparent plate and focuses on said substrate. 
 
     
     
       23. An exposure device according to  claim 22 , wherein said information data includes at least one of character information, graphic information and test coupon information.

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