Method for manufacturing display device

Abstract

The present invention provides a display device which inhibits deterioration in display quality caused by color mixture of luminescent layers. In a case where vapor deposition particles are deposited onto a substrate, P+2Lc≧{(Ts×M+0.96×G×Wn)/(Ts−G)}+2Dm and 3 μm≦Dm ≦5 μm are satisfied, where “M” is a width of a mask opening, “Wn” is a width of an injection hole, “G” is a distance between the TFT substrate and a vapor deposition mask, “Ts” is a distance between the TFT substrate and a vapor deposition source, “P” is a width of a first pixel opening, and “Lc” is a width of a non-display region.

The invention claimed is: 
     
       1. A method for manufacturing a display device including a substrate on which a plurality of pixel openings and a non-display region are defined, the plurality of pixel openings being respective regions from which light is emitted, and the non-display region being a region which is located between any adjacent ones of the plurality of pixel openings and from which no light is emitted, a plural kinds of luminescent layers for emitting different colors of lights being provided on the substrate for the respective plurality of pixel openings, said method comprising the step of:
 depositing the plural kinds of luminescent layers on the substrate at respective locations corresponding to the plurality of pixel openings by (i) providing the substrate, a vapor deposition mask having a mask opening, and a vapor deposition source having an injection hole from which vapor deposition particles are injected, in this order and (ii) depositing the vapor deposition particles onto the substrate via the mask opening, 
 in a case where the vapor deposition particles are deposited onto the substrate in the luminescent layer depositing step so as to form (i) a first luminescent layer which corresponds to a first pixel opening that is one of the plurality of pixel openings and (ii) a second luminescent layer which (a) corresponds to a second pixel opening that is adjacent to the first pixel opening via the non-display region and (b) emits light whose color is different from a color of light emitted by the first luminescent layer, the following formulae being satisfied:
     P+ 2 Lc ={( Ts×M+ 0.96× G×Wn )/( Ts−G )}+2 Dm  
 
 
 and
   3 μm ≦ Dm≦ 5 μm
 
 
 where “M” is a width of the mask opening, “Wn” is a width of the injection hole, “G” is a distance between the substrate and the vapor deposition mask, “Ts” is a distance between the substrate and the vapor deposition source, “P” is a width of the first pixel opening, and “Lc” is a width of the non-display region. 
 
     
     
       2. The method as set forth in  claim 1 , wherein the following formulae are satisfied:
     P+ 2 Lc ={( Ts×M+ 0.96 ×G×Wn )/( Ts−G )}+2 Dm    
 and
   3 μm+ Wm≦Dm≦ 5 μm+ Wm  
 
 
 where “Wm” is a vapor deposition margin in the luminescent layer depositing step. 
 
     
     
       3. The method as set forth in  claim 1 , wherein:
 the substrate, the vapor deposition mask, and the vapor deposition source are aligned so that each of centers of the respective plurality of pixel openings, a center of the mask opening, and a center of the injection hole are arranged on one straight line in a plan view; and 
 in a direction in which the first pixel opening and the second pixel opening are arranged, the following formula is satisfied:
     P ≦{( Ts×M )−( G×Wn )}/( Ts−G ).
 
 
 
     
     
       4. The method as set forth in  claim 1 , wherein:
 the substrate, the vapor deposition mask, and the vapor deposition source are aligned so that each of centers of the respective plurality of pixel openings, a center of the mask opening, and a center of the injection hole are arranged on one straight line in a plan view; and 
 in a direction in which the first pixel opening and the second pixel opening are arranged, the following formula is satisfied:
   {( Ts×M )−( G×Wn )/( Ts−G )}≦ P ≦{( Ts×M )−(0.8 ×G×Wn )}/( Ts−G ).
 
 
 
     
     
       5. The method as set forth in  claim 2 , wherein:
 the substrate, the vapor deposition mask, and the vapor deposition source are aligned so that each of centers of the respective plurality of pixel openings, a center of the mask opening, and a center of the injection hole are arranged on one straight line in a plan view; and 
 in a direction in which the first pixel opening and the second pixel opening are arranged, the following formula is satisfied:
     P ={( Ts×M )−(0.8 ×G×Wn )}/( Ts−G )−2 Wm.  
 
 
 
     
     
       6. The method as set forth in  claim 1 , wherein:
 in a direction in which the first pixel opening and the second pixel opening are arranged, the first pixel opening having a width of P and the non-display region having a width of Lc are defined on the substrate; and 
 the width M of the mask opening, the width Wn of the injection hole, the distance G between the substrate and the vapor deposition mask, and the distance Ts between the substrate and the vapor deposition source are set in the luminescent layer depositing step so that the following formulae are satisfied:
     P +2 Lc ={( Ts×M +0.96 ×G×Wn )/( Ts−G )}+2 Dm    
 
  and
   3 μm ≦ Dm≦ 5 μm.