Fluid handling structure including gas supply and gas recovery openings, a lithographic apparatus and a device manufacturing method

Abstract

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

The invention claimed is: 
     
       1. A fluid handling structure for a lithographic apparatus, the fluid handling structure configured to confine immersion fluid to a space, the fluid handling structure comprising:
 a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; 
 a plurality of gas supply openings at least partly surrounding and outward, relative to the space, of the meniscus pinning feature; and 
 a plurality of gas recovery openings outward, relative to the space, of the gas supply opening, the plurality of gas recovery openings of an essentially same size or the same size, 
 wherein the gas supply openings and the gas recovery openings are in the bottom surface of the fluid handling structure and there is no gas supply opening in the bottom surface outward, relative to the space, of the gas recovery openings, and 
 wherein each gap between adjacent gas supply openings of the plurality of gas supply openings in a linear array has a corresponding gas recovery opening of the plurality of gas recovery openings in a linear array and the corresponding gas recovery opening is positioned such that an imaginary line passing through it toward a center, in plan, of the space configured to contain immersion fluid subsequently passes the corresponding gap between adjacent gas supply openings. 
 
     
     
       2. The fluid handling structure of  claim 1 , wherein a separation between the gas supply openings and the gas recovery openings is at least 0.2 mm and at most 1.0 mm. 
     
     
       3. The fluid handling structure of  claim 1 , further comprising a groove in an underside of the fluid handling structure extending, and being elongate, in a direction from the gas supply openings towards the gas recovery openings. 
     
     
       4. The fluid handling structure of  claim 1 , wherein the meniscus pinning feature comprises a plurality of openings in an array. 
     
     
       5. The fluid handling structure  claim 1 , wherein the plurality of gas supply openings have, in plan, a cornered shape at least partially surrounding the space. 
     
     
       6. The fluid handling structure of  claim 1 , wherein the line essentially bisects the corresponding gap between adjacent gas supply openings. 
     
     
       7. The fluid handling structure of  claim 1 , comprising a plurality of grooves in an underside of the fluid handling structure, each groove extending, and being elongate, in a direction from a gap between adjacent gas supply openings of the gas supply openings towards a corresponding gas recovery opening of the plurality of gas recovery openings. 
     
     
       8. The fluid handling structure of  claim 1 , further comprising a substantially constant separation between the meniscus pinning feature and the gas supply openings around the space. 
     
     
       9. The fluid handling structure of  claim 1 , wherein the gas supply openings each have a cross-sectional width selected from the range of about 75 microns to about 200 microns. 
     
     
       10. A fluid handling structure for a lithographic apparatus, the fluid handling structure configured to confine immersion fluid to a space, the fluid handling structure comprising:
 a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; 
 a gas supply opening at least partly surrounding and outward, relative to the space, of the meniscus pinning feature; and 
 a plurality of gas recovery openings outward, relative to the space, of the gas supply opening, the plurality of gas recovery openings arranged in a periodic pattern along a line, 
 wherein the gas supply opening and the gas recovery openings are in a bottom surface of the fluid handling structure and there is no gas supply opening in the bottom surface outward, relative to the space, of the gas recovery openings. 
 
     
     
       11. The fluid handling structure of  claim 10 , wherein the gas supply opening comprises a plurality of gas supply openings in a linear array and wherein each gap between adjacent gas supply openings of the plurality of gas supply openings in a linear array has a corresponding gas recovery opening of the plurality of gas recovery openings, the corresponding gas recovery opening positioned such that an imaginary line passing through it toward a center, in plan, of the space subsequently passes through a corresponding gap between adjacent gas supply openings. 
     
     
       12. The fluid handling structure of  claim 10 , wherein the meniscus pinning feature comprises an array of exhaust openings and the array of exhaust openings has, in plan, a cornered shape at least partially surrounding the space. 
     
     
       13. The fluid handling structure of  claim 10 , further comprising a substantially constant separation between the meniscus pinning feature and the gas supply opening around the space. 
     
     
       14. The fluid handling structure of  claim 10 , wherein a separation between the gas supply opening and the gas recovery openings is at least 0.2 mm and at most 1.0 mm. 
     
     
       15. The fluid handling structure of  claim 10 , further comprising a groove in an underside of the fluid handling structure extending, and being elongate, in a direction from the gas supply opening towards the gas recovery openings. 
     
     
       16. A fluid handling structure for a lithographic apparatus, the fluid handling structure configured to confine immersion fluid to a space, the fluid handling structure comprising:
 a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; 
 a gas supply opening at least partly surrounding and outward, relative to the space, of the meniscus pinning feature; and 
 a plurality of gas recovery openings outward, relative to the space, of the gas supply opening, the plurality of gas recovery openings equidistantly spaced apart and the plurality of gas recovery openings being the outermost openings in the bottom surface of the fluid handling structure. 
 
     
     
       17. The fluid handling structure of  claim 16 , wherein the gas supply opening comprises a plurality of gas supply openings in a linear array and wherein each gap between adjacent gas supply openings of the plurality of gas supply openings in a linear array has a corresponding gas recovery opening of the plurality of gas recovery openings, the corresponding gas recovery opening positioned such that an imaginary line passing through it toward a center, in plan, of the space subsequently passes through a corresponding gap between adjacent gas supply openings. 
     
     
       18. The fluid handling structure of  claim 16 , wherein the meniscus pinning features comprises an array of exhaust openings and the array of exhaust openings has, in plan, a cornered shape at least partially surrounding the space. 
     
     
       19. The fluid handling structure of  claim 16 , further comprising a substantially constant separation between the meniscus pinning feature and the gas supply opening around the space. 
     
     
       20. The fluid handling structure of  claim 16 , further comprising a groove in an underside of the fluid handling structure extending, and being elongate, in a direction from the gas supply opening towards the gas recovery openings.