Electron beam generator, image apparatus including the same and optical apparatus

Abstract

Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.

What is claimed is: 
     
       1. An electron beam generator comprising:
 a beam source supply unit configured to provide a beam source on a substrate; 
 a first laser apparatus configured to provide a first laser beam to the beam source and the substrate; 
 a first optical system having a focal point on the substrate and configured to concentrate the first laser beam on the substrate; and 
 a second laser apparatus configured to provide a second laser beam overlapping the first laser beam between the first optical system and the first laser apparatus; 
 wherein the second laser apparatus outputs the second laser beam which has a phase opposite to a phase of the first laser beam, and decreases a first spot size of an interference beam generated by a destructive interference with the first laser beam to be smaller than a wavelength of the first laser beam at the focal point. 
 
     
     
       2. The electron beam generator of  claim 1 , wherein the first laser beam and the second laser beam have a second spot size and a third spot size which are larger than the first spot size, respectively, and the second spot size is the same as the third spot size. 
     
     
       3. The electron beam generator of  claim 1 , wherein the first laser beam has a first cross-section and the second laser beam has a second cross-section having a different shape from the first cross-section. 
     
     
       4. The electron beam generator of  claim 3 , wherein when the first cross-section has a circular shape, the second cross-section has a donut or ring shape having the same diameter as the first cross-section. 
     
     
       5. The electron beam generator of  claim 1 , wherein the first optical system comprises an off-axis concave mirror. 
     
     
       6. The electron beam generator of  claim 1 , further comprising a second optical system disposed between the first optical system and the first laser apparatus, and configured to provide the second laser beam in the same direction as the direction in which the first laser beam is provided. 
     
     
       7. The electron beam generator of  claim 6 , wherein the second optical system comprises a half mirror. 
     
     
       8. The electron beam generator of  claim 1 , wherein the beam source comprises hydrogen gas. 
     
     
       9. The electron beam generator of  claim 8 , further comprising a high frequency supply apparatus configured to provide high frequency power to the hydrogen gas. 
     
     
       10. The electron beam generator of  claim 9 , wherein the high frequency supply apparatus comprises an electron cyclotron resonance unit. 
     
     
       11. The electron beam generator of  claim 8 , further comprising a third laser apparatus configured to provide a third laser beam to the hydrogen gas. 
     
     
       12. An image apparatus comprising:
 an electron beam generator configured to provide an electron beam on a substrate; 
 a detector configured to detect secondary electrons generated from the substrate using the electron beam; and 
 a control unit configured to control the electron beam generator and obtain a substrate image according to a detection signal of the detector, 
 wherein the electron beam generator comprises: 
 a source supply unit configured to provide a beam source to the substrate; 
 a first laser apparatus configured to provide a first laser beam to the beam source and the substrate; 
 a first optical system having a focal point on the substrate and configured to concentrate the first laser beam on the substrate; and 
 a second laser apparatus configured to provide a second laser beam overlapping the first laser beam between the first optical system and the first laser apparatus; 
 wherein the second laser apparatus outputs the second laser beam which has a phase opposite to a phase of the first laser beam, and decreases a first spot size of an interference beam generated by a destructive interference with the first laser beam to be smaller than a wavelength of the first laser beam at the focal point. 
 
     
     
       13. An optical apparatus comprising:
 first and second laser apparatuses configured to provide first and second laser beams to a substrate; and 
 a first optical system provided between the first and second laser apparatuses and the substrate, and configured to focus the first and second laser beams, 
 wherein the first and second laser beams are overlapped with each other to generate an interference beam, and decrease a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point of the first optical system. 
 
     
     
       14. The optical apparatus of  claim 13 , wherein the first laser beam has a first cross-section having a circular shape, and the second laser beam has a second cross-section having a donut or ring shape and the same diameter as the first cross-section. 
     
     
       15. The optical apparatus of  claim 14 , wherein the interference beam has a third cross-section having a circular shape and a smaller diameter than the first cross-section. 
     
     
       16. The optical apparatus of  claim 14 , wherein the first laser beam has an energy intensity distribution of the Gaussian distribution in the first cross-section, the second laser beam has an energy intensity distribution of a two-humped distribution in the second cross-section, and the interference beam has an energy distribution of the Gaussian distribution having a smaller width than the width of the energy intensity distribution of the first laser beam. 
     
     
       17. The optical apparatus of  claim 13 , wherein each of the first and second laser beams has the same spot size as each other. 
     
     
       18. The optical apparatus of  claim 13 , wherein each of the first and second laser beams has the same wavelength as each other. 
     
     
       19. The optical apparatus of  claim 13 , wherein each of the first and second laser beams has an inverted phase as each other. 
     
     
       20. The optical apparatus of  claim 13 , further comprising a second optical system disposed between the first and second laser apparatuses and the first optical system, and configured to allow the first and second laser beams to be overlapped each other, wherein the second optical system comprises a half mirror.