Manufacturing method of organic semiconductor film, organic semiconductor film, thin film transistor, active matrix device, electro-optical device, and electronic device

Abstract

A manufacturing method of an organic semiconductor film according to the invention includes applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern, applying a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent onto a region of the base material having the liquid composition applied thereto, and removing the second solvent.

What is claimed is: 
     
       1. A manufacturing method of an organic semiconductor film, comprising:
 applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern; 
 removing the first solvent; 
 applying, after the removing of the first solvent, a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent into a region of the base material having the liquid composition applied thereto; and 
 removing the second solvent. 
 
     
     
       2. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein the organic semiconductor material is a polymer. 
 
     
     
       3. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein the applying the second solvent is performed by attaching liquid droplets of the second solvent onto the base material having the liquid composition applied thereto. 
 
     
     
       4. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein the applying the second solvent is performed by exposing the base material having the liquid composition applied thereto into an atmosphere including the second solvent in a vaporized state. 
 
     
     
       5. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein a second virial coefficient of the first solvent with respect to the organic semiconductor material at 25° C. is a positive value, and a second virial coefficient of the second solvent with respect to the organic semiconductor material at 25° C. is a negative value. 
 
     
     
       6. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein an applied amount of the second solvent with respect to 1 g of the organic semiconductor material is greater than or equal to 10 g and less than or equal to 10000 g. 
 
     
     
       7. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein the organic semiconductor material is one or more selected from a group consisting of materials having a thiophene ring such as polythiophene, polyhexyl thiophene, and a fluorene-bithiophene copolymer, poly(p-phenylene vinylene), polythienylene vinylene, polyarylamine, a pyrene formaldehyde resin, an ethyl carbazole formaldehyde resin, a fluorene-arylamine copolymer, and derivatives thereof. 
 
     
     
       8. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein the first solvent is one or more selected from a group consisting of decalin, mesitylene, trimethylbenzene, cyclohexane, toluene, hexadecane, xylene (3.6), dodecane, tetralin, decane, octane, heptane, trichloroethane, tetrahydronaphthalene, chlorobenzene, and chloroform. 
 
     
     
       9. The manufacturing method of an organic semiconductor film according to  claim 1 ,
 wherein the second solvent is one or more selected from a group consisting of cyclohexanone, 1,4-dioxane, methyl naphthalene, dichlorobenzene, dichloromethane, tetrahydrofuran (THF), butane, anisole, and butyl acetate. 
 
     
     
       10. An organic semiconductor film manufactured by using the method according to  claim 1 . 
     
     
       11. An organic semiconductor film manufactured by using the method according to  claim 2 . 
     
     
       12. An organic semiconductor film manufactured by using the method according to  claim 3 . 
     
     
       13. An organic semiconductor film manufactured by using the method according to  claim 4 . 
     
     
       14. An organic semiconductor film manufactured by using the method according to  claim 5 . 
     
     
       15. A thin film transistor comprising the organic semiconductor film according to  claim 10 . 
     
     
       16. An active matrix device comprising the organic semiconductor film according to  claim 10 . 
     
     
       17. An electro-optical device comprising the organic semiconductor film according to  claim 10 . 
     
     
       18. An electronic device comprising the organic semiconductor film according To  claim 10 . 
     
     
       19. A manufacturing method of an organic semiconductor film, comprising:
 applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern; 
 applying a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent into a region of the base material having the liquid composition applied thereto; and 
 removing the second solvent, 
 wherein the applying the second solvent is performed by attaching liquid droplets of the second solvent onto the base material having the liquid composition applied thereto. 
 
     
     
       20. A manufacturing method of an organic semiconductor film, comprising:
 applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern; 
 applying a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent into a region of the base material having the liquid composition applied thereto; and 
 removing the second solvent, 
 wherein the applying the second solvent is performed by exposing the base material having the liquid composition applied thereto into an atmosphere including the second solvent in a vaporized state. 
 
     
     
       21. A manufacturing method of an organic semiconductor film, comprising:
 applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern; 
 applying a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent into a region of the base material having the liquid composition applied thereto; and 
 removing the second solvent, 
 wherein a second virial coefficient of the first solvent with respect to the organic semiconductor material at 25° C. is a positive value, and a second virial coefficient of the second solvent with respect to the organic semiconductor material at 25° C. is a negative value. 
 
     
     
       22. A manufacturing method of an organic semiconductor film, comprising:
 applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern; 
 applying a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent into a region of the base material having the liquid composition applied thereto; and 
 removing the second solvent, 
 wherein an applied amount of the second solvent with respect to 1 g of the organic semiconductor material is greater than or equal to 10 g and less than or equal to 10000 g.