Circuit board and display device using the same

Abstract

A circuit board includes an insulating film extending from an active area for displaying images to a peripheral area surrounding the active area. A circumference wiring is arranged in an aperture penetrating the insulating film and extending from the aperture to the active area on the insulating film so as to cross an edge of the aperture. The shape of the edge of the aperture which the circumference wiring crosses includes at least one concave portion and one convex portion, respectively.

What is claimed is: 
     
       1. An array substrate, comprising:
 a first insulating film extending from an active area for displaying images to a peripheral area surrounding the active area; 
 a gate line formed on the first insulating film in the active area; 
 a second insulating film covering the first insulating film and the gate line; 
 a source line formed on the second insulating film in the active area; and 
 a circumference wiring arranged in an aperture penetrating the first and second insulating films and extending from the aperture to the active area on the second insulating film so as to cross an edge of the aperture in the peripheral area; 
 wherein 
 the circumference wiring is formed of the same material as the source line, and 
 the edge of the aperture which the circumference wiring crosses includes at least one concave portion and one convex portion, respectively. 
 
     
     
       2. The array substrate according to  claim 1 , wherein the edge is formed in a comb-like shape. 
     
     
       3. The array substrate according to  claim 1 , wherein the first insulating film or the second insulating film is formed of silicon-oxide or silicon-nitride, and
 an etching stopper layer formed of a semiconductor layer is arranged in a bottom portion of the aperture. 
 
     
     
       4. The array substrate according to  claim 2 , wherein the edge is formed in the comb-like shape having protrusions of a polygonal shape. 
     
     
       5. The array substrate according to  claim 4 , wherein the polygonal shape is a triangular shape. 
     
     
       6. The array substrate according to  claim 2 , wherein the comb-like shape is formed in a sine curve shape. 
     
     
       7. An array substrate, comprising:
 a first insulating film extending from an active area for displaying images to a peripheral area surrounding the active area; 
 a gate line formed on the first insulating film in the active area; 
 a second insulating film covering the first insulating film and the gate line; 
 a source line formed on the second insulating film in the active area; and 
 a circumference wiring arranged in an aperture penetrating the first and second insulating films and extending from the aperture to the active area on the second insulating film crossing an edge of the aperture in the peripheral area; 
 wherein 
 the circumference wiring is formed of the same material as the source line, and 
 the edge of the aperture which the circumference wiring crosses is formed so as to extend in a different direction from both an extending direction of the circumference wiring and a direction crossing the extending direction of the circumference wiring orthogonally. 
 
     
     
       8. The array substrate according to  claim 7 , wherein the edge of the aperture which the circumference wiring crosses is formed in an oblique shape extending in an oblique direction crossing a first direction and a second direction orthogonally crossing the first direction. 
     
     
       9. The array substrate according to  claim 7 , wherein the first insulating film or the second insulating film is formed of silicon-oxide or silicon-nitride, and
 an etching stopper layer formed of a semiconductor layer is arranged in a bottom portion of the aperture. 
 
     
     
       10. A display device, comprising:
 a circuit board including:
 a first inter-layer insulating film extending from an active area for displaying images to a peripheral area surrounding the active area, 
 a gate line formed on the first inter-layer insulating film in the active area, 
 a second inter-layer insulating film covering the first inter-layer insulating film and the gate line, 
 a source line formed on the second inter-layer insulating film in the active area, and 
 a circumference wiring arranged in an aperture penetrating the first and second inter-insulating films and extending from the aperture to the active area on the second inter-layer insulating film so as to cross an edge of the aperture, and 
 
 a counter substrate facing the circuit board and including a substrate end located in a position where the circumference wiring cross the edge of the aperture; 
 wherein the shape of the edge of the aperture which the circumference wiring crosses includes at least one concave portion and one convex portion, respectively. 
 
     
     
       11. The display device according to  claim 10 , wherein the edge is formed in a comb-like shape. 
     
     
       12. The display device according to  claim 10 , wherein the first inter-layer insulating film or the second inter-layer insulating film is formed of silicon-oxide or silicon-nitride, and
 an etching stopper layer formed of a semiconductor layer is arranged in a bottom portion of the aperture. 
 
     
     
       13. The display device according to  claim 11 , wherein the edge is formed in the comb-like shape having protrusions of a polygonal shape. 
     
     
       14. The display device according to  claim 13 , wherein the polygonal shape is a triangular shape. 
     
     
       15. The display device according to  claim 11 , wherein the comb-like shape is formed in a sine curve shape.