US9559250B2ActiveUtilityA1
Enhanced light extraction
Est. expiryFeb 9, 2032(~5.6 yrs left)· nominal 20-yr term from priority
H10W 90/00H01L 2933/0058H01L 2924/00H01L 2924/0002H01L 33/38H01L 33/62H01L 25/0753H01L 33/58H01L 2933/0016H01L 33/06H01L 33/20H01L 33/0066H01L 33/32H01L 2933/0066H01L 33/42H01L 33/0025H01L 33/24H01L 33/0075H01L 2933/0025H01L 33/60H10H 20/856H10H 20/0364H10H 20/0363H10H 20/034H10H 20/032H10H 20/857H10H 20/855H10H 20/841H10H 20/835H10H 20/833H10H 20/831H10H 20/825H10H 20/824H10H 20/821H10H 20/819H10H 20/813H10H 20/811H10H 20/0137H10H 20/0133H10H 20/812
91
PatentIndex Score
11
Cited by
17
References
5
Claims
Abstract
There is herein described light generating electronic components with improved light extraction and a method of manufacturing said electronic components. More particularly, there is described LEDs having improved light extraction and a method of manufacturing said LEDs.
Claims
exact text as granted — not AI-modifiedThe invention claimed is:
1. A method of manufacturing a light emitting structure comprising:
providing a transparent conductive oxide (TCO) layer; a GaN layer and a sapphire layer;
providing a photoresist pattern in the areas to be defined as emitters by photolithography;
baking the photoresist pattern to allow it to reflow into a rounded form;
transferring the photoresist pattern by a dry etch technique, said techniques comprising inductively coupled plasma etch (ICP) or Reactive Ion Etching (RIE), into the TCO layer and then into the GaN layer; and
covering the light emitting structure with a thin insulating layer, said thin insulating layer comprising silicon dioxide or silicon nitride; wherein the light emitting structure is capable of emitting electromagnetic radiation and further wherein the TCO layer is located adjacent the light emitting structure through which electromagnetic radiation may be transmitted, wherein the TCO layer improves the amount of light capable of being extracted from the light emitting structure.
2. The method according to claim 1 wherein the sapphire layer is textured to enhance light extraction.
3. The method according to claim 1 wherein the sapphire layer or insulating layer is removed to enhance light extraction and further comprising the steps of: removing the sapphire layer to enhance light extraction; and
patterning the GaN surface to form a structure such as a refractive, diffractive, Fresnel or 2D photonic crystal structure.
4. The method according to claim 1 , wherein the refractive index of the integrated transparent conductive contact layer is closely matched to the GaN layer; and wherein the light emitting structure is an LED.
5. The method of claim 1 , further comprising the step of removing the sapphire layer or insulating layer to enhance light extraction.Cited by (0)
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