Exposure apparatus, exposing method, device manufacturing method, program, and recording medium

Abstract

A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower surface opposing the substrate and second member disposed at a portion of exposure light optical path surrounding; driving apparatus to move the second member with respect to the first; controlling the driving apparatus so the second member's operation in the substrate first operation movement is between exposure termination and start of a first and second shot regions differently from a second member's operation in the substrate second movement period which is between exposure termination and start of a third and fourth shot regions; first and second shot regions are in the same row contrary to third and fourth shot regions.

The invention claimed is: 
     
       1. An exposure apparatus that sequentially exposes each of a plurality of shot regions of a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate while moving the substrate in a scanning direction with respect to the exposure light emitted from the emitting surface, the exposure apparatus comprising:
 a liquid immersion member that comprises a first member and a second member and that is configured to form a liquid immersion space of the liquid, the first member having a first lower surface, the second member having a second upper surface opposing the first lower surface with a gap between the second upper surface and the first lower surface, the second member having a second lower surface; 
 a driving apparatus that is configured to move the second member with respect to the first member; and 
 a controller that is configured to control the driving apparatus, wherein 
 during exposure of the substrate, the liquid immersion space is formed such that a portion of an upper surface of the substrate is covered by the liquid immersion space and such that at least a portion of a gas-liquid interface of the liquid immersion space is formed between the second lower surface of the second member and the upper surface of the substrate, 
 before or after sequential exposures of each of a plurality of shot regions, which are included in a first row on the substrate and are disposed in a direction which intersects with the scanning direction, are performed, shot regions of another row different from the first row are exposed, 
 the controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate which is between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate which is between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in a same row, the third and fourth shot regions being arranged in different rows, and 
 positions of the second member with respect to the optical member are different from each other in the direction which intersects with the scanning direction at start of the first movement period and at start of the second movement period. 
 
     
     
       2. The exposure apparatus according to  claim 1 ,
 wherein the third shot region is included in the same row as the first shot region. 
 
     
     
       3. The exposure apparatus according to  claim 1 ,
 wherein the second shot region is disposed to be adjacent to the first shot region with respect to the direction which intersects with the scanning direction. 
 
     
     
       4. The exposure apparatus according to  claim 1 ,
 wherein the row including the fourth shot region is disposed to be adjacent to the row including the third shot region with respect to the scanning direction. 
 
     
     
       5. The exposure apparatus according to  claim 1 ,
 wherein movement directions of the second member are different from each other in the first movement period and the second movement period. 
 
     
     
       6. The exposure apparatus according to  claim 5 ,
 wherein the movement directions include the direction which intersects with the scanning direction. 
 
     
     
       7. The exposure apparatus according to  claim 5 ,
 wherein the second member moves to one side with respect to the direction which intersects with the scanning direction in the first movement period, and 
 wherein the second member moves to the one side or another side with respect to the direction which intersects with the scanning direction in the second movement period. 
 
     
     
       8. The exposure apparatus according to  claim 7 ,
 wherein the substrate moves to the one side with respect to the direction which intersects with the scanning direction in the first movement period, and 
 wherein the substrate moves to the one side or the another side with respect to the direction which intersects with the scanning direction in the second movement period. 
 
     
     
       9. The exposure apparatus according to  claim 1 ,
 wherein movement distances of the second member are different from each other in the first movement period and the second movement period. 
 
     
     
       10. The exposure apparatus according to  claim 9 ,
 wherein the movement distances include a movement distance with respect to the direction which intersects with the scanning direction. 
 
     
     
       11. The exposure apparatus according to  claim 1 ,
 wherein positions of the second member with respect to the optical member are different from each other at termination of the first movement period and termination of the second movement period. 
 
     
     
       12. The exposure apparatus according to  claim 1 ,
 wherein movement speeds of the second member are different from each other in the first movement period and the second movement period. 
 
     
     
       13. The exposure apparatus according to  claim 12 ,
 wherein the movement speeds include a movement speed with respect to the direction which intersects with the scanning direction. 
 
     
     
       14. The exposure apparatus according to  claim 1 ,
 wherein accelerations of the second member are different from each other in the first movement period and the second movement period. 
 
     
     
       15. The exposure apparatus according to  claim 14 ,
 wherein the accelerations include an acceleration with respect to the direction which intersects with the scanning direction. 
 
     
     
       16. The exposure apparatus according to  claim 1 ,
 wherein the second member moves within a movable range which is determined with respect to the direction which intersects with the scanning direction. 
 
     
     
       17. The exposure apparatus according to  claim 1 ,
 wherein the second member continuously moves in the first movement period. 
 
     
     
       18. The exposure apparatus according to  claim 17 ,
 wherein the second member continuously moves in a first exposure period and in the first movement period, the first exposure period being between exposure start and exposure termination of the first shot region. 
 
     
     
       19. The exposure apparatus according to  claim 17 ,
 wherein the second member continuously moves in the first exposure period which is between the exposure start and the exposure termination of the first shot region, in the first movement period, and in a second exposure period which is between the exposure start and the exposure termination of the second shot region. 
 
     
     
       20. The exposure apparatus according to  claim 1 ,
 wherein the second member continuously moves in the second movement period. 
 
     
     
       21. The exposure apparatus according to  claim 20 ,
 wherein the second member continuously moves in a third exposure period and in the second movement period, the third exposure period being between the exposure start and the exposure termination of the third shot region. 
 
     
     
       22. The exposure apparatus according to  claim 20 ,
 wherein the second member continuously moves in a third exposure period which is between the exposure start and the exposure termination of the third shot region, in the second movement period, and in a fourth exposure period which is between the exposure start and the exposure termination of the fourth shot region. 
 
     
     
       23. The exposure apparatus according to  claim 1 ,
 wherein the second member stops in at least a portion of the second movement period. 
 
     
     
       24. The exposure apparatus according to  claim 23 ,
 wherein the substrate moves in a direction substantially parallel to the scanning direction in at least a portion of the second movement period, and 
 wherein the second member stops in at least a portion of the period in which the substrate is moved in a direction substantially parallel to the scanning direction. 
 
     
     
       25. The exposure apparatus according to  claim 23 ,
 wherein the second member continuously moves in a third exposure period which is between the exposure start and the exposure termination of the third shot region. 
 
     
     
       26. The exposure apparatus according to  claim 23 ,
 wherein the second member continuously moves in a third exposure period which is between the exposure start and the exposure termination of the third shot region, and in a fourth exposure period which is between the exposure start and the exposure termination of the fourth shot region. 
 
     
     
       27. The exposure apparatus according to  claim 1 ,
 wherein the second movement period is longer than the first movement period. 
 
     
     
       28. The exposure apparatus according to  claim 1 ,
 wherein in the first movement period, the second member is moved at a first acceleration to one side of the direction which intersects with the scanning direction in a first state where the substrate is moving at a first speed to the one side of the direction which intersects with the scanning direction, and the second member is moved at a second acceleration to the one side of the direction which intersects with the scanning direction in a second state where the substrate is moving at a second speed to the one side of the direction which intersects with the scanning direction, the second acceleration being an acceleration lower than the first acceleration, the second speed being a speed higher than the first speed. 
 
     
     
       29. The exposure apparatus according to  claim 1 ,
 wherein in the second movement period, the second member is moved at a third acceleration to one side of the direction which intersects with the scanning direction in a third state where the substrate is moving at a third speed to the one side of the direction which intersects with the scanning direction, and the second member is moved at a fourth acceleration to the one side of the direction which intersects with the scanning direction in a fourth state where the substrate is moving at a fourth speed to the one side of the direction which intersects with the scanning direction, the fourth acceleration being an acceleration lower than the third acceleration, the fourth speed being a speed higher than the third speed. 
 
     
     
       30. The exposure apparatus according to  claim 28 ,
 wherein the second member is moved to another side of the direction which intersects with the scanning direction in a second exposure period in which the substrate is moved in the scanning direction during the exposure of the second shot region. 
 
     
     
       31. The exposure apparatus according to  claim 30 ,
 wherein the second member is moved at a constant speed to the another side of the direction which intersects with the scanning direction in at least a portion of the second exposure period. 
 
     
     
       32. The exposure apparatus according to  claim 1 ,
 wherein the second member is moved in a direction substantially perpendicular to an optical axis of the optical member. 
 
     
     
       33. The exposure apparatus according to  claim 1 ,
 wherein the second member is moved in a movement direction of the substrate in at least a portion of a period in which the substrate is moved. 
 
     
     
       34. The exposure apparatus according to  claim 1 ,
 wherein the second member is moved so that a relative speed between the second member and the substrate is decreased. 
 
     
     
       35. The exposure apparatus according to  claim 1 ,
 wherein the second member is moved so that a relative speed between the second member and the substrate becomes smaller than a relative speed between the first member and the substrate. 
 
     
     
       36. The exposure apparatus according to  claim 1 ,
 wherein the second member is moved in the direction which intersects with the scanning direction. 
 
     
     
       37. The exposure apparatus according to  claim 1 ,
 wherein the first member does not substantially move. 
 
     
     
       38. The exposure apparatus according to  claim 1 , further comprising:
 a fluid recovery part which recovers at least a portion of the liquid of the liquid immersion space. 
 
     
     
       39. The exposure apparatus according to  claim 38 ,
 wherein at least a portion of the fluid recovery part is arranged opposite to the substrate. 
 
     
     
       40. The exposure apparatus according to  claim 38 ,
 wherein the fluid recovery part is disposed at the second member. 
 
     
     
       41. The exposure apparatus according to  claim 38 ,
 wherein the fluid recovery part is disposed adjacent to at least a portion of a periphery of the second lower surface. 
 
     
     
       42. The exposure apparatus according to  claim 38 ,
 wherein the fluid recovery part recovers the liquid via holes of a porous member. 
 
     
     
       43. The exposure apparatus according to  claim 1 , further comprising:
 a supply part which supplies the liquid to form the liquid immersion space. 
 
     
     
       44. The exposure apparatus according to  claim 43 ,
 wherein the supply part is disposed at the first member. 
 
     
     
       45. The exposure apparatus according to  claim 43 ,
 wherein at least a portion of the liquid from the supply part is supplied to a first space between the first lower surface and the second upper surface, and a liquid recovery part which faces the first space and recovers the liquid of the first space is provided. 
 
     
     
       46. The exposure apparatus according to  claim 45 ,
 wherein the liquid recovery part is disposed at the first member. 
 
     
     
       47. The exposure apparatus according to  claim 1 ,
 wherein the first member comprises a first opening through which the exposure light can pass, and 
 wherein the second member comprises a second opening through which the exposure light can pass. 
 
     
     
       48. The exposure apparatus according to  claim 47 ,
 wherein the first opening is larger than the second opening. 
 
     
     
       49. A method of manufacturing a device, comprising:
 exposing the substrate using the exposure apparatus according to  claim 1 ; and 
 developing the exposed substrate. 
 
     
     
       50. An exposing method that sequentially exposes each of a plurality of shot regions of a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate while moving the substrate in a scanning direction with respect to the exposure light emitted from the emitting surface, the exposing method comprising:
 forming a liquid immersion space of the liquid by using a liquid immersion member that comprises a first member and a second member, the first member having a first lower surface, the second member having a second upper surface opposing the first lower surface with a gap between the second upper surface and the first lower surface, the second member having a second lower surface; 
 sequentially exposing each of a plurality of shot regions by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space, the plurality of shot regions being included in first row on the substrate and being disposed in a direction which intersects with the scanning direction; 
 exposing shot regions of another row different from the first row via the liquid of the liquid immersion space before or after exposing the shot regions included in the first row; and 
 moving the second member with respect to the first member in at least a portion of an exposure of the substrate so that a first operation of the second member in a first movement period of the substrate which is between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate which is between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in a same row, the third and fourth shot regions being arranged in different rows, wherein 
 during the exposure of the substrate, the liquid immersion space is formed such that a portion of an upper surface of the substrate is covered by the liquid immersion space and such that at least a portion of a gas-liquid interface of the liquid immersion space is formed between the second lower surface of the second member and the upper surface of the substrate, and 
 positions of the second member with respect to the optical member are different from each other in the direction which intersects with the scanning direction at start of the first movement period and at start of the second movement period. 
 
     
     
       51. A method of manufacturing a device comprising: exposing the substrate using the exposing method according to  claim 50 ; and developing the exposed substrate. 
     
     
       52. A non-transitory computer-readable medium on which a program is recorded, the program causing a computer to execute a control of an exposure apparatus which sequentially exposes each of a plurality of shot regions of a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate while moving the substrate in a scanning direction with respect to the exposure light emitted from the emitting surface, the control comprising:
 forming a liquid immersion space of the liquid by using a liquid immersion member that comprises a first member and a second member, the first member having a first lower surface, the second member having a second upper surface opposing the first lower surface with a gap between the second upper surface and the first lower surface, the second member having a second lower surface; 
 sequentially exposing each of a plurality of shot regions by the exposure light emitted from the emitting surface via the liquid of the liquid immersion space, the plurality of shot regions being included in first row on the substrate and being disposed in a direction which intersects with the scanning direction; 
 exposing shot regions of another row different from the first row via the liquid of the liquid immersion space before or after exposing the shot regions included in the first row; and 
 moving the second member with respect to the first member in at least a portion of an exposure of the substrate so that a first operation of the second member in a first movement period of the substrate which is between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate which is between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in a same row, the third and fourth shot regions being arranged in different rows, wherein 
 during the exposure of the substrate, the liquid immersion is formed such that a portion of an upper surface of the substrate is covered by the liquid immersion space and such that at least a portion of a gas-liquid interface of the liquid immersion space is formed between the second lower surface of the second member and the upper surface of the substrate, and 
 positions of the second member with respect to the optical member are different from each other in the direction which intersects with the scanning direction at start of the first movement period and at start of the second movement period.