Substrate support with feedthrough structure

Abstract

Apparatus for providing electrical currents and substrate supports utilizing the same are provided. In some embodiments, a feedthrough structure may include a body having a wall defining one or more openings disposed through the body from a first end to a second end; one or more first conductors and one or more second conductors each disposed in the wall from the first end to the second end; and a plurality of conductive mesh disposed in the wall, at least one conductive mesh surrounding a first region of the wall including the one or more first conductors and at least one conductive mesh surrounding a second region of the wall including the one or more second conductors, wherein the plurality of conductive mesh substantially electrically insulates the first and second regions from respective first and second external electromagnetic fields respectively disposed outside the first and second regions.

The invention claimed is: 
     
       1. A feedthrough structure for a substrate support, comprising:
 a body having a wall defining one or more openings disposed through the body from a first end of the body to a second end of the body; 
 one or more first openings disposed in the wall between the first and second end; 
 one or more second openings disposed in the wall between the first and second end; 
 one or more first conductors disposed through the wall from the first end to the second end in the one or more first openings; 
 one or more second conductors disposed through the wall from the first end to the second end in the one or more second openings; and 
 a plurality of conductive mesh disposed in the wall, wherein at least one conductive mesh surrounds a first region of the wall that includes the one or more first conductors and wherein at least one conductive mesh surrounds a second region of the wall that includes the one or more second conductors, wherein the plurality of conductive mesh substantially electrically insulates the first region from a first external electromagnetic field outside the first region and the second region from a second external electromagnetic field outside the second region. 
 
     
     
       2. The feedthrough structure of  claim 1 , further comprising:
 one or more third conductors disposed in the one or more openings wherein the plurality of conductive mesh electrically insulate the first and second regions from a third external electromagnetic field generated by a current traveling through the one or more third conductors. 
 
     
     
       3. The feedthrough structure of  claim 1 , wherein the plurality of conductive mesh further comprises:
 a first conductive mesh; 
 a second conductive mesh concentrically disposed about the first conductive mesh; and 
 a third conductive mesh concentrically disposed about the second conductive mesh, wherein the first region is formed between the second and third conductive mesh and the second region is formed between the first and second conductive mesh. 
 
     
     
       4. The feedthrough structure of  claim 1 , wherein the plurality of conductive mesh further comprises:
 a first conductive mesh that surrounds the first region; and 
 a second conductive mesh that surrounds the second region. 
 
     
     
       5. The feedthrough structure of  claim 1 , wherein the body further comprises:
 a plurality of third openings disposed in the wall between the first and second end, each third opening having one of the plurality of conductive mesh disposed therethrough. 
 
     
     
       6. The feedthrough structure of  claim 5 , wherein the one or more first openings are a plurality of first openings and wherein the one or more first conductors are a plurality of first conductors, wherein each first conductor is disposed in a corresponding first opening. 
     
     
       7. A substrate support, comprising:
 a support member having a substrate processing surface to support a substrate thereon; 
 a plurality of electrical elements disposed in the substrate support to at least one of monitor or process the substrate when disposed on the substrate processing surface; 
 a body having a wall defining one or more openings, the one or more openings disposed between a first end of the body facing the support member and an opposing second end of the body; 
 one or more first conductors disposed in the wall from the first end to the second end to provide a first electrical signal to at least a first one of the plurality of electrical elements; 
 one or more second conductors disposed in the wall and from the first end to the second end to provide a second electrical signal to at least a second one of the plurality of electrical elements, wherein the one or more first conductors, the one or more second conductors, or both, are conductive wires disposed in the wall; and 
 a plurality of conductive mesh disposed in the wall, wherein at least one conductive mesh surrounds a first region of the wall that includes the one or more first conductors and wherein at least one conductive mesh surrounds a second region of the wall that includes the one or more second conductors, wherein the plurality of conductive mesh substantially electrically insulates the first region from a first external electromagnetic field outside the first region and the second region from a second external electromagnetic field outside the second region. 
 
     
     
       8. The substrate support of  claim 7 , further comprising:
 one or more third conductors disposed in the one or more openings wherein the plurality of conductive mesh electrically insulate the first and second regions from a third external electromagnetic field generated by a current traveling through the one or more third conductors. 
 
     
     
       9. The substrate support of  claim 7 , wherein the plurality of conductive mesh further comprises:
 a first conductive mesh; 
 a second conductive mesh concentrically disposed about the first conductive mesh; and 
 a third conductive mesh concentrically disposed about the second conductive mesh, wherein the first region is formed between the second and third conductive mesh and the second region is formed between the first and second conductive mesh. 
 
     
     
       10. The substrate support of  claim 7 , wherein the plurality of conductive mesh further comprises:
 a first conductive mesh that surrounds the first region; and 
 a second conductive mesh that surrounds the second region. 
 
     
     
       11. The substrate support of  claim 7 , further comprising:
 one or more first openings disposed in the wall between the first and second end and having the one or more first conductors disposed therethrough; 
 one or more second openings disposed in the wall between the first and second end and having the one or more second conductors disposed therethrough; and 
 a plurality of third openings disposed in the wall between the first and second end, wherein each third opening having one of the plurality of conductive mesh disposed therethrough. 
 
     
     
       12. The substrate support of  claim 11 , wherein the one or more first openings are a plurality of first openings and wherein the one or more first conductors are a plurality of first conductors, wherein each first conductor is disposed in a corresponding first opening. 
     
     
       13. The substrate support of  claim 7 , wherein at least a first one of the plurality of electrical elements is a heater having a plurality of resistive heating elements and wherein at least a second one of the plurality of electrical elements is a plurality of temperature sensors. 
     
     
       14. The substrate support of  claim 13 , wherein the plurality of resistive heating elements are arranged into one or more heating zones. 
     
     
       15. The substrate support of  claim 7 , further comprising:
 an electrostatic chuck for securing the substrate when present on the substrate processing surface; and 
 one or more third conductors disposed through the one or more openings of the body to provide electrical power to the electrostatic chuck, wherein the plurality of conductive mesh electrically insulate the first region and the second region from a third external electromagnetic field generated by a current traveling through the one or more third conductors. 
 
     
     
       16. The substrate support of  claim 7 , further comprising:
 one or more conduits disposed through the one or more openings of the body; and 
 a vacuum apparatus coupled to the one or more conduits to provide suction via the one or more conduits to a backside of the substrate when present to secure the substrate on the substrate processing surface. 
 
     
     
       17. The substrate support of  claim 7 , further comprising:
 an electrode to provide RF energy to the substrate when present on the substrate processing surface; and 
 one or more fourth conductors disposed through the one or more openings of the body to provide electrical power to the electrode, wherein the plurality of conductive mesh electrically insulate the first region and the second region from a fourth external electromagnetic field generated by a current traveling through the one or more fourth conductors. 
 
     
     
       18. A substrate support, comprising:
 a support member having a substrate processing surface to support a substrate thereon; 
 a heater to provide heat to the substrate when present on the substrate processing surface, the heater having a plurality of resistive heating elements arranged into a plurality of heating zones; 
 a plurality of temperature sensors to monitor a temperature of the substrate when present on the substrate processing surface; 
 a body having a wall defining one or more openings, the one or more openings disposed between a first end of the body facing the support member and an opposing second end of the body; 
 a plurality of first conductors disposed in the wall from the first end to the second end, wherein each first conductor provides or receives a first electrical signal from one or more resistive heating elements; 
 a plurality of second conductors disposed in the wall from the first end to the second end, wherein each second conductor provides or receives a second electrical signal from one or more of the temperature sensors; and 
 a plurality of conductive mesh disposed in the wall, wherein at least one conductive mesh surrounds a first region of the wall that includes the plurality of first conductors and wherein at least one conductive mesh surrounds a second region of the wall that includes the plurality of second conductors, wherein the plurality of conductive mesh substantially electrically insulates the first region from a first external electromagnetic field outside the first region and the second region from a second external electromagnetic field outside the second region. 
 
     
     
       19. The substrate support of  claim 18 , wherein the body further comprises:
 a plurality of first openings disposed in the wall between the first and second end, each first opening having a corresponding first conductor disposed therethrough; 
 a plurality of second openings disposed in the wall between the first and second end, each second opening having a corresponding second conductor disposed therethrough; and 
 a plurality of third openings disposed in the wall between the first and second end, wherein each third opening having one of the plurality of conductive mesh disposed therethrough.