US9735018B2ActiveUtilityA1

Extremely thin package

40
Assignee: SILEGO TECH INCPriority: Sep 20, 2012Filed: Aug 24, 2015Granted: Aug 15, 2017
Est. expirySep 20, 2032(~6.2 yrs left)· nominal 20-yr term from priority
H10W 74/00H10W 74/142H10W 72/0198H10W 46/607H10W 46/401H10W 90/726H10P 72/7422H10P 72/7416H10P 72/7402H10W 74/111H10W 74/019H10W 74/127H10W 74/47H10W 74/014H10W 70/424H10W 46/00H10P 52/00H01L 2224/16245H01L 2924/181H01L 23/49548H01L 21/568H01L 23/3142H01L 2221/6834H01L 2924/00H01L 2221/68327H01L 2223/54486H01L 23/293H01L 21/304H01L 21/561H01L 24/97H01L 23/544H01L 23/3107H01L 2223/54433H01L 21/6836
40
PatentIndex Score
0
Cited by
11
References
21
Claims

Abstract

Techniques for achieving extremely thin package structures are disclosed. In some embodiments, a device comprises an integrated circuit connected to a leadframe or substrate via connections and EMC (Epoxy Molding Compound) surrounding the integrated circuit except at a backside of the integrated circuit and connecting areas via which the integrated circuit is connected to the leadframe or substrate.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A device, comprising:
 an integrated circuit connected to a leadframe or substrate via connections; and 
 EMC (Epoxy Molding Compound) surrounding the integrated circuit except at a backside of the integrated circuit and connecting areas via which the integrated circuit is connected to the leadframe or substrate; 
 wherein the backside of the integrated circuit is left exposed and wherein during device assembly grinding is used to remove EMC from the device. 
 
     
     
       2. The device of  claim 1 , wherein during device assembly EMC between the backside of the integrated circuit and top-side of the device is removed. 
     
     
       3. The device of  claim 1 , wherein the exposed backside of the integrated circuit is polished. 
     
     
       4. The device of  claim 1 , wherein grinding comprises grinding until the backside of the integrated circuit is exposed. 
     
     
       5. The device of  claim 1 , wherein grinding comprises grinding until a desired package thickness is achieved. 
     
     
       6. The device of  claim 1 , wherein grinding comprises grinding until a desired integrated circuit thickness is achieved. 
     
     
       7. The device of  claim 1 , wherein grinding comprises grinding at least a portion of the backside of the integrated circuit. 
     
     
       8. The device of  claim 1 , wherein the backside of the integrated circuit comprises exposed silicon. 
     
     
       9. A device, comprising:
 an integrated circuit connected to a leadframe or substrate via connections; and 
 EMC (Epoxy Molding Compound) surrounding the integrated circuit except at a backside of the integrated circuit and connecting areas via which the integrated circuit is connected to the leadframe or substrate; 
 wherein the backside of the integrated circuit is left exposed and wherein the device comprises an extremely thin DFN (dual flat no-lead) or QFN (quad flat no-lead) package. 
 
     
     
       10. The device of  claim 1 , wherein the device comprises an exposed silicon extremely thin DFN (dual flat no-lead) or QFN (quad flat no-lead) package. 
     
     
       11. A method, comprising:
 molding a device comprising an integrated circuit connected to a leadframe or substrate with EMC (Epoxy Molding Compound); 
 grinding EMC to expose the integrated circuit backside; and 
 applying an adhesion film to a top-side of the device to protect the backside of the integrated circuit that is exposed. 
 
     
     
       12. The method of  claim 11 , wherein grinding comprises removing EMC between the backside of the integrated circuit and top-side of the device. 
     
     
       13. The method of  claim 11 , wherein grinding comprises grinding the device top-side until the integrated circuit backside is exposed. 
     
     
       14. The method of  claim 11 , wherein grinding comprises grinding until the backside of the integrated circuit is exposed. 
     
     
       15. The method of  claim 11 , wherein grinding comprises grinding until a desired package thickness is achieved. 
     
     
       16. The method of  claim 11 , wherein grinding comprises grinding until a desired integrated circuit thickness is achieved. 
     
     
       17. The method of  claim 11 , wherein grinding comprises grinding at least a portion of the backside of the integrated circuit. 
     
     
       18. The method of  claim 11 , wherein the backside of the integrated circuit comprises exposed silicon. 
     
     
       19. The method of  claim 11 , wherein the device comprises an extremely thin DFN (dual flat no-lead) or QFN (quad flat no-lead) package. 
     
     
       20. A device, comprising:
 an integrated circuit connected to a leadframe or substrate via connections; and 
 EMC (Epoxy Molding Compound) surrounding the integrated circuit except at a backside of the integrated circuit and connecting areas via which the integrated circuit is connected to the leadframe or substrate; 
 wherein the backside of the integrated circuit is left exposed and wherein the device comprises a light emission device. 
 
     
     
       21. The device of  claim 20 , wherein the device comprises an extremely thin DFN (dual flat no-lead) or QFN (quad flat no-lead) package.

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