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US9840645B2ActiveUtilityPatentIndex 69

Underfill material and method for manufacturing semiconductor device using the same

Assignee: DEXERIALS CORPPriority: Sep 11, 2013Filed: Sep 10, 2014Granted: Dec 12, 2017
Est. expirySep 11, 2033(~7.2 yrs left)· nominal 20-yr term from priority
Inventors:KOYAMA TAICHI
H10W 99/00H10W 72/0198H10W 90/00H10W 72/07338H10W 72/07332H10W 72/073H10W 72/07236H10W 72/07232H10W 72/072H10W 72/241H10W 72/353H10W 72/325H10W 72/354H10W 72/013H10W 72/01304H10W 90/724H10W 90/722H10W 72/252H10W 72/244H10W 90/734H10W 90/732H10W 74/15H10P 72/7438H10P 72/7416H10P 72/7402H10W 74/40H10W 74/47H10W 74/012H01L 2224/29291H01L 2224/94H01L 2924/0102H01L 21/563H01L 24/27H01L 25/0657H01L 2224/13147H01L 2224/9212H01L 2224/16146H01L 24/73H01L 2224/81191H01L 2224/2919H01L 2224/29387H01L 21/78H01L 25/50H01L 24/29H01L 2924/01083H01L 23/293H01L 24/16H01L 2224/81815H01L 2924/186C08G 59/4215H01L 2224/81H01L 2924/01006H01L 24/13C08L 63/00H01L 2924/0532H01L 2224/271H01L 2924/01047H01L 2224/27003H01L 2221/68377C08L 33/16H01L 2924/05341H01L 2224/83862C09D 133/066H01L 2224/81193H01L 2224/73104H01L 2224/11H01L 2924/0635H01L 24/32H01L 24/92H01L 24/81H01L 2224/13111H01L 2224/32145C09J 133/20H01L 2924/00012H01L 2225/06513H01L 2924/01029H01L 2224/83204H01L 2224/27H01L 2224/81204H01L 2924/05442H01L 2224/16238H01L 2224/13025H01L 2924/0544H01L 2224/32225H01L 2924/0549H01L 2224/83H01L 2924/00014H01L 2224/92H01L 2224/2929H01L 2224/81203H01L 2924/01082H01L 2224/83191H01L 2224/16227H01L 2224/29191C09J 163/00H01L 24/83H01L 21/6836H01L 2924/0665H01L 2224/9211H01L 2924/01012H01L 2221/68327H01L 2924/01051H01L 2225/06517H01L 24/94H10W 72/851H10W 72/30H10W 72/20C09J 2203/326C09J 7/00C09J 2301/312
69
PatentIndex Score
2
Cited by
10
References
12
Claims

Abstract

An underfill film material and a method for manufacturing a semiconductor device using the same which enables voidless mounting and favorable solder bonding properties are provided. An underfill material is used which contains an epoxy resin, an acid anhydride, an acrylic resin and an organic peroxide, the underfill material exhibits non-Bingham fluidity at a temperature ranging from 60° C. to 100° C., a storage modulus G′ measured by dynamic viscosity measurement has an inflection point in an angular frequency region below 10E+02 rad/s, and the storage modulus G′ in the angular frequency below the inflection point is 10E+05 Pa or more and 10E+06 Pa or less. This enables voidless packaging and excellent solder connection properties.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. An underfill material applied to a semiconductor chip having a solder-tipped electrode formed thereon before mounting the semiconductor chip onto an electronic component having a counter electrode facing the solder-tipped electrode, wherein
 the underfill material comprises an epoxy resin, a curing agent, an acrylic resin, and an organic peroxide, 
 a ratio of the total mass of acrylic resin and organic peroxide to the total mass of epoxy resin and curing agent is in a range of 7:3 to 4:6, 
 the underfill material exhibits non-Bingham fluidity at a temperature ranging from 60° C. to 100° C., and 
 a storage modulus G′ measured by dynamic viscosity measurement has an inflection point in an angular frequency region below 10E+02 rad/s and the storage modulus G′ in the angular frequency below the inflection point is 10E+05 Pa or more and 10E+06 Pa or less. 
 
     
     
       2. The underfill material according to  claim 1 , wherein
 a dynamic viscosity η′ measured by dynamic viscosity measurement is inversely proportional to the angular frequency below the inflection point with a gradient of 10 raised to the power of 1. 
 
     
     
       3. The underfill material according to  claim 2 , wherein the storage modulus G′ in the angular frequency below the inflection point is constant. 
     
     
       4. The underfill material according to  claim 1 , wherein
 the storage modulus G′ in the angular frequency below the inflection point is constant. 
 
     
     
       5. The underfill material according to  claim 1 , wherein
 the epoxy resin is a glycidylether epoxy resin, and 
 the curing agent is an alicyclic acid anhydride. 
 
     
     
       6. The underfill material according to  claim 2 , wherein
 the acrylic resin is a fluorene acrylate, and 
 the organic peroxide is a peroxy ketal. 
 
     
     
       7. The underfill material according to  claim 4 , wherein
 the epoxy resin is a glycidylether epoxy resin, and 
 the curing agent is an alicyclic acid anhydride. 
 
     
     
       8. The underfill material according to  claim 1 , wherein
 the acrylic resin is a fluorene acrylate, and 
 the organic peroxide is a peroxy ketal. 
 
     
     
       9. The underfill material according to  claim 2 , wherein
 the epoxy resin is a glycidylether epoxy resin, and 
 the curing agent is an alicyclic acid anhydride. 
 
     
     
       10. The underfill material according to  claim 4 , wherein
 the acrylic resin is a fluorene acrylate, and 
 the organic peroxide is a peroxy ketal. 
 
     
     
       11. The underfill material according to  claim 5 , wherein
 the acrylic resin is a fluorene acrylate, and 
 the organic peroxide is a peroxy ketal. 
 
     
     
       12. A method for manufacturing a semiconductor device comprising:
 a mounting step of mounting a semiconductor chip onto an electronic component, the semiconductor chip having a solder-tipped electrode formed thereon and an underfill material applied to the surface of the electrode, and the electronic component having a counter electrode facing the electrode, and 
 a thermocompression bonding step of thermally compressing the semiconductor chip and the electronic component, wherein 
 the underfill material comprises an epoxy resin, a curing agent, an acrylic resin, and an organic peroxide, a ratio of the total mass of acrylic resin and organic peroxide to the total mass of epoxy resin and curing agent is in a range of 7:3 to 4:6, the underfill material exhibits non-Bingham fluidity at a temperature ranging from 60° C. to 100° C., a storage modulus G′ measured by dynamic viscosity measurement has an inflection point in an angular frequency region below 10E+02 rad/s, and the storage modulus G′ in the angular frequency below the inflection point is 10E+05 Pa or more and 10E+06 Pa or less.

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