Spatially-resolved FWA spectrophotometer using micropatterned optical filters

Abstract

Provided is a system for providing spectral analysis with a spectrophotometer. The system includes an illuminator positioned adjacent to a carrier having a surface; a linear sensor positioned adjacent to the carrier; and a micropatterned optical filter is positioned between the linear sensor and the carrier. The illuminator is configured to emit light at a material disposed over the surface. The linear sensor is configured to receive the light from the illuminator.

What is claimed is: 
     
       1. A system for providing spectral analysis with a spatially-resolved spectrophotometer, the system comprising:
 an illuminator positioned adjacent to a carrier having a surface, the illuminator being configured to emit light at a material disposed over the surface; 
 a linear sensor positioned adjacent to the carrier, the linear sensor being configured to receive the light emitted from the illuminator and reflected off the material; 
 a gradient index lens disposed between the carrier and the linear sensor, such that it is positioned in an optical path of the light emitted by the illuminator and reflected off the carrier's surface; and 
 a micropatterned optical filter positioned between the linear sensor and the carrier, 
 wherein the micropatterned optical filter is disposed directly on a light receiving portion of the linear sensor, 
 wherein the micropatterned optical filter comprises a plurality of dichroic coatings stacked one over the other and disposed on a light receiving surface of the linear sensor, wherein each one of the plurality of dichroic coatings comprises a respective spectral transmittance, and 
 wherein the system is devoid of a linear variable filter. 
 
     
     
       2. The system of  claim 1 , wherein the micropatterned optical filter comprises one or more of a metal coating, one or more of a conductive coating, or combinations thereof. 
     
     
       3. The system of  claim 1 , wherein the linear sensor comprises a plurality of sensor pixels, the micropatterned optical filter comprises a plurality of individualized micropatterned filters, and at least one of plurality of individualized filters is disposed over a corresponding one of the plurality of sensor pixels. 
     
     
       4. The system of  claim 1 , further comprising a processor, wherein the processor is configured to: i) determine color performance of an image printing system based on spectral response of the material received by the linear sensor, ii) adjust color performance of the image printing system based on spectral response of the material received by the linear sensor, or iii) both i and ii. 
     
     
       5. The system of  claim 1 , further comprising a processor, wherein the processor is configured to: i) determine deposition performance of a material deposition system based on spectral response of the material received by the linear sensor, ii) adjust deposition performance of the material deposition system based on spectral response of the material received by the linear sensor, or iii) both i and ii. 
     
     
       6. The system of  claim 1 , wherein the material comprises toner or ink. 
     
     
       7. The system of  claim 1 , wherein the linear sensor is configured in a process orientation relative to the carrier, a cross-process orientation relative to the carrier, or both a process and cross-process orientation relative to the carrier. 
     
     
       8. The system of  claim 1 , wherein each of the plurality of coatings comprises apertures. 
     
     
       9. A method for providing spectral analysis with a spatially-resolved spectrophotometer, the method comprising:
 configuring an illuminator to emit a light beam at a material disposed over a surface of a carrier, the illuminator being positioned adjacent to the carrier; and 
 configuring a linear sensor to receive the light emitted from the illuminator and at least partially transmitted through a gradient index lens and a micropatterned optical filter, 
 wherein the gradient index lens is disposed in an optical path of the light reflecting off the carrier's surface and is disposed inbetween the carrier's surface and the micropatterned optical filter, 
 wherein the linear sensor is positioned adjacent to the carrier's surface, 
 wherein the micropatterned optical filter is disposed between the linear sensor and the carrier, 
 wherein the micropatterned optical filter is disposed directly on a light receiving portion of the linear sensor, 
 wherein the micropatterned optical filter comprises a plurality of dichroic coatings stacked one over the other and disposed on a light receiving surface of the linear sensor, wherein each one of the plurality of dichroic coatings comprises a respective spectral transmittance, and 
 wherein the light emitted by the illuminator and received by the sensor is not transmitted through a linear variable filter. 
 
     
     
       10. The method of  claim 9 , wherein the micropatterned optical filter comprises one or more metal coating, one or more of a conductive coating, or combinations thereof. 
     
     
       11. The method of  claim 9 , wherein the linear sensor comprises a plurality of sensor pixels, the micropatterned optical filter comprises a plurality of individualized filters, and at least one of plurality of individualized filters is disposed over a corresponding one of the plurality of sensor pixels. 
     
     
       12. The method of  claim 9 , further comprising configuring a processor, wherein the processor executes instructions to: i) determine color performance of an image printing system based on spectral response of the material received by the linear sensor, ii) adjust color performance of the image printing system based on spectral response of the material received by the linear sensor, or iii) both i and ii. 
     
     
       13. The method of  claim 9 , further comprising configuring a processor, wherein the processor executes instructions to: i) determine deposition performance of a material deposition system based on spectral response of the material received by the linear sensor, ii) adjust deposition performance of the material deposition system based on spectral response of the material received by the linear sensor, or iii) both i and ii. 
     
     
       14. The method of  claim 9 , further comprising configuring the linear sensor to receive the light emitted from the illuminator and at least partially transmitted through a gradient index lens, the gradient index lens disposed in an optical path of the light reflecting off the carrier's surface, and disposed in between the carrier's surface and a micropatterned optical filter. 
     
     
       15. The method of  claim 9 , further comprising moving the carrier in a process direction and configuring the linear sensor to receive the light in process orientation relative to the carrier, a cross-process orientation relative to the carrier, or both a process and cross-process direction. 
     
     
       16. The method of  claim 9 , wherein the material comprises toner or ink. 
     
     
       17. The method of  claim 9 , further comprising configuring a processor, wherein the processor executes instructions to adjust spatial TRCs, adjust a material jetting rate, turning one or more jets of an inkjet printhead on/off, or adjust a carrier feed rate. 
     
     
       18. The method of  claim 9 , wherein the micropatterned optical filter is positioned in an optical path of the light emitted by the illuminator and is positioned between the linear sensor and the carrier.